HK76895A - Radiation-sensitive composition with acid cleavable compounds - Google Patents

Radiation-sensitive composition with acid cleavable compounds

Info

Publication number
HK76895A
HK76895A HK76895A HK76895A HK76895A HK 76895 A HK76895 A HK 76895A HK 76895 A HK76895 A HK 76895A HK 76895 A HK76895 A HK 76895A HK 76895 A HK76895 A HK 76895A
Authority
HK
Hong Kong
Prior art keywords
radiation
group
benzol
acid
sensitive composition
Prior art date
Application number
HK76895A
Other languages
German (de)
English (en)
Inventor
Arnold Dr. Dipl.-Chem. Schneller
Walter Dr.Dipl.-Chem Herwig
Kurt Erbes
Original Assignee
Hoechst Aktiengesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6228854&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK76895(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hoechst Aktiengesellschaft filed Critical Hoechst Aktiengesellschaft
Publication of HK76895A publication Critical patent/HK76895A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Golf Clubs (AREA)
  • Prostheses (AREA)
  • Steroid Compounds (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)

Claims (11)

1. Composition sensible aux radiations, contenant en tant que composants essentiels
a) un liant polymère insoluble dans l'eau, soluble dans des solutions aqueuses alcalines,
b) un composé formant un acide fort sous l'effet d'un rayonnement actinique, et
c) un composé comportant au moins une liaison C-O-C pouvant être rompue par un acide, dont la solubilité dans un révélateur liquide est accrue sous l'effet d'un acide,
caractérisé en ce que le liant est un polymère qui contient des motifs alcénylphénol.
2. Composition sensible aux radiations selon la revendication 1, caractérisée en ce que le polymère contient des motifs de formule générale 1 dans laquelle
R est un atome d'hydrogène ou un groupe cyano, alkyle ou phényle,
R1 représente un atome d'hydrogène ou d'halogène, un groupe cyano ou alkyle,
RZ, R3 et R4 représentent des atomes d'hydrogène ou d'halogène, ou des groupes alkykle ou alcoxy, et
x est un nombre allant de 1 à 3.
3. Composition sensible aux radiations selon la revendication 2, caractérisée en ce que le polymère est un copolymère à base de motifs de formule 1 et de motifs d'autres composés vinyliques.
4. Composition sensible aux radiations selon la revendication 3, caractérisée en ce que les motifs des autres composés vinyliques correspondent à la formule générale Il dans laquelle
R5 est un atome d'hydrogène ou d'halogène ou un groupe alkyle,
R6 est un groupe alkyle, alcoxy, alkyloxycarbonyle, acyle, acyloxy, aryle, formyle, cyano, carboxy, hydroxy ou aminocarbonyle, et
R7 est un atome d'hydrogène ou un groupe carboxy qui peut être lié à R6, lorsque celui-ci est un groupe carboxy, pour donner un anhydride d'acide.
5. Composition sensible aux radiations selon la revendication 2, caractérisée en ce que le polymère contient des motifs de formule générale dans lesquels x = 1.
6. Composition sensible aux radiations selon la revendication 1, caractérisée en ce que le composé (c) est un composé comportant au moins un groupement ester d'acide orthocarboxylique, acétal de carboxamide, acétal, énol-éther ou acyliminocarbonate.
7. Composition sensible aux radiations selon la revendication 1, caractérisée en ce qu'elle contient de 30 à 90% en poids du liant polymère (a), de 0,1 à 10% en poids du composé (b) générateur d'acide, et de 5 à 70% en poids du composé (c) dissociable par un acide.
8. Matériau de reprographie sensible aux radiations, comportant un support de couche et une couche de reprographie, caractérisé en ce qu'il contient la composition sensible aux radiations selon la revendication 1.
9. Matériau de reprographie sensible aux radiations selon la revendication 8, caractérisé en ce que le support de couche est une feuille de matière plastique flexible transparente et en ce que l'autre surface de la couche de reprographie est recouverte par une feuille de recouvrement dont l'adhérence à la couche de reprographie est plus faible que celle du support de couche.
10. Procédé pour la production d'images en relief, dans lequel on irradie selon l'image un matériau de reprographie sensible aux radiations selon la revendication 8, avec un rayonnement actinique à une dose telle que la solubilité dans une solution aqueuse alcaline de développement augmente, et on élimine à l'aide d'une solution aqueuse alcaline les zones irradiées de la couche.
11. Procédé selon la revendication 10, caractérisé en ce que l'on utilise le matériau de reprographie selon les revendications 8 et 9, en ce que l'on sépare la feuille de recouvrement de la couche de reprographie, on applique par pelliculage le matériau de reprographie restant, avec la face mise à nu de la couche de reprographie, sous pression et avec chauffage, sur un support de couche final, on expose selon l'image la couche de reprographie et après enlèvement du support de couche transparent, on développe la couche de reprographie.
HK76895A 1984-02-25 1995-05-18 Radiation-sensitive composition with acid cleavable compounds HK76895A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843406927 DE3406927A1 (de) 1984-02-25 1984-02-25 Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen

Publications (1)

Publication Number Publication Date
HK76895A true HK76895A (en) 1995-05-26

Family

ID=6228854

Family Applications (1)

Application Number Title Priority Date Filing Date
HK76895A HK76895A (en) 1984-02-25 1995-05-18 Radiation-sensitive composition with acid cleavable compounds

Country Status (14)

Country Link
US (1) US4678737A (fr)
EP (1) EP0153682B1 (fr)
JP (1) JP2653374B2 (fr)
KR (1) KR910006542B1 (fr)
CN (1) CN85101459A (fr)
AT (1) ATE53917T1 (fr)
AU (1) AU577830B2 (fr)
BR (1) BR8500785A (fr)
CA (1) CA1273521A (fr)
DE (2) DE3406927A1 (fr)
ES (1) ES8607575A1 (fr)
FI (1) FI80155C (fr)
HK (1) HK76895A (fr)
ZA (1) ZA851110B (fr)

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DE2829512A1 (de) * 1978-07-05 1980-01-17 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
DE3038605A1 (de) * 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
DE3039926A1 (de) * 1980-10-23 1982-05-27 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS5865430A (ja) * 1981-05-27 1983-04-19 Konishiroku Photo Ind Co Ltd 感光性印刷版用感光性組成物
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
JPS58114030A (ja) * 1981-12-28 1983-07-07 Fujitsu Ltd ポジ型レジスト材料
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
EP0153682A2 (fr) 1985-09-04
FI80155B (fi) 1989-12-29
ZA851110B (en) 1985-09-25
EP0153682B1 (fr) 1990-05-02
JP2653374B2 (ja) 1997-09-17
ES8607575A1 (es) 1986-06-01
KR910006542B1 (ko) 1991-08-27
BR8500785A (pt) 1985-10-08
CN85101459A (zh) 1987-01-17
FI850719A0 (fi) 1985-02-21
DE3406927A1 (de) 1985-08-29
JPS60205444A (ja) 1985-10-17
EP0153682A3 (en) 1987-04-22
FI850719L (fi) 1985-08-26
ES540587A0 (es) 1986-06-01
ATE53917T1 (de) 1990-06-15
AU577830B2 (en) 1988-10-06
DE3577484D1 (de) 1990-06-07
US4678737A (en) 1987-07-07
CA1273521A (fr) 1990-09-04
FI80155C (fi) 1990-04-10
KR850006232A (ko) 1985-10-02
AU3918485A (en) 1985-09-05

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