JPH0159734B2 - - Google Patents

Info

Publication number
JPH0159734B2
JPH0159734B2 JP56135825A JP13582581A JPH0159734B2 JP H0159734 B2 JPH0159734 B2 JP H0159734B2 JP 56135825 A JP56135825 A JP 56135825A JP 13582581 A JP13582581 A JP 13582581A JP H0159734 B2 JPH0159734 B2 JP H0159734B2
Authority
JP
Japan
Prior art keywords
electrode
gas
plasma etching
etching
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56135825A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5837924A (ja
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13582581A priority Critical patent/JPS5837924A/ja
Publication of JPS5837924A publication Critical patent/JPS5837924A/ja
Publication of JPH0159734B2 publication Critical patent/JPH0159734B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP13582581A 1981-08-28 1981-08-28 プラズマエッチング装置 Granted JPS5837924A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13582581A JPS5837924A (ja) 1981-08-28 1981-08-28 プラズマエッチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13582581A JPS5837924A (ja) 1981-08-28 1981-08-28 プラズマエッチング装置

Publications (2)

Publication Number Publication Date
JPS5837924A JPS5837924A (ja) 1983-03-05
JPH0159734B2 true JPH0159734B2 (mo) 1989-12-19

Family

ID=15160667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13582581A Granted JPS5837924A (ja) 1981-08-28 1981-08-28 プラズマエッチング装置

Country Status (1)

Country Link
JP (1) JPS5837924A (mo)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56118208A (en) * 1980-02-22 1981-09-17 Furukawa Electric Co Ltd Aerial transmission line
JPH0810689B2 (ja) * 1986-12-22 1996-01-31 東京エレクトロン株式会社 アッシング処理装置
JP2894658B2 (ja) * 1992-01-17 1999-05-24 株式会社東芝 ドライエッチング方法およびその装置
JP2009241862A (ja) * 2008-03-31 2009-10-22 Sumitomo (Shi) Construction Machinery Co Ltd 建設機械の熱交換装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6053751B2 (ja) * 1979-12-10 1985-11-27 松下電子工業株式会社 プラズマ処理装置

Also Published As

Publication number Publication date
JPS5837924A (ja) 1983-03-05

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