JPH0194459U - - Google Patents
Info
- Publication number
- JPH0194459U JPH0194459U JP19148887U JP19148887U JPH0194459U JP H0194459 U JPH0194459 U JP H0194459U JP 19148887 U JP19148887 U JP 19148887U JP 19148887 U JP19148887 U JP 19148887U JP H0194459 U JPH0194459 U JP H0194459U
- Authority
- JP
- Japan
- Prior art keywords
- plates
- magnetic fluid
- vacuum
- organic film
- introduce
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011553 magnetic fluid Substances 0.000 claims description 5
- 238000001771 vacuum deposition Methods 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は従来のフイルムコンデンサー用有機膜
真空蒸着装置の断面概念図、第２図は本考案によ
るフイルムコンデンサー用有機膜真空蒸着装置の
断面概念図、第３図は磁性流体使用部分の断面拡
大図である。１…真空室、２…真空ポンプ排気、
３…真空蒸着源、４…真空蒸着物、５…有機膜供
給ロール、６…有機膜巻取ロール、７…有機膜、
８…定速送り、９ａ，９ｂ…真空室の壁、１０ａ
，１０ｂ…磁界を発生させる永久磁石または電磁
石、１１ａ，１１ｂ…磁性流体、１２ａ…供給側
磁性流体使用部分、１２ｂ…巻取側磁性流体使用
部分。
Figure 1 is a cross-sectional conceptual diagram of a conventional organic film vacuum evaporation apparatus for film capacitors, Figure 2 is a cross-sectional conceptual diagram of an organic film vacuum evaporation apparatus for film capacitors according to the present invention, and Figure 3 is an enlarged cross-sectional view of the part where magnetic fluid is used. It is a diagram. 1...Vacuum chamber, 2...Vacuum pump exhaust,
3... Vacuum deposition source, 4... Vacuum deposit, 5... Organic film supply roll, 6... Organic film take-up roll, 7... Organic film,
8...Constant speed feed, 9a, 9b...Wall of vacuum chamber, 10a
, 10b... Permanent magnet or electromagnet that generates a magnetic field, 11a, 11b... Magnetic fluid, 12a... Supply side magnetic fluid usage part, 12b... Winding side magnetic fluid usage part.
Claims (1)
ラスチツク板または、半導体ウエハーを真空室内
で真空蒸着または、プラズマボンバード等の処理
を施すために磁性流体の中を通過させ、連続的に
真空室内に真空を保持したまま導入及び、排出す
るロードロツク機能を持つた連続真空シール。 Organic films, glass plates, metal plates, ceramic plates, plastic plates, or semiconductor wafers are passed through a magnetic fluid for vacuum deposition or plasma bombardment, etc. Continuous vacuum seal with load lock function to introduce and discharge while retaining.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19148887U JPH0194459U (en) | 1987-12-16 | 1987-12-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19148887U JPH0194459U (en) | 1987-12-16 | 1987-12-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0194459U true JPH0194459U (en) | 1989-06-21 |
Family
ID=31482395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19148887U Pending JPH0194459U (en) | 1987-12-16 | 1987-12-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0194459U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012241265A (en) * | 2011-05-24 | 2012-12-10 | Hitachi Zosen Corp | Continuous vacuum evaporator |
-
1987
- 1987-12-16 JP JP19148887U patent/JPH0194459U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012241265A (en) * | 2011-05-24 | 2012-12-10 | Hitachi Zosen Corp | Continuous vacuum evaporator |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4867859A (en) | Apparatus for forming a thin film | |
| ATE240585T1 (en) | PLASMA DEVICE HAVING A METAL PART CONNECTED TO A VOLTAGE SOURCE PLACED BETWEEN A RF PLASMA EXCITATION SOURCE AND THE PLASMA | |
| JPH0194459U (en) | ||
| JPH0641733A (en) | Reactive sputtering equipment | |
| JPS63307270A (en) | Sputtering device | |
| CA2022359A1 (en) | Process for Preparing Superconducting Thin Films | |
| JPH02106459U (en) | ||
| JPH047184Y2 (en) | ||
| JPS6378068U (en) | ||
| JP3290697B2 (en) | Vacuum exhaust device | |
| JPH06232043A (en) | Plasma device | |
| JPS62166627U (en) | ||
| JPS6319565U (en) | ||
| JPH0415831U (en) | ||
| JPH0334059U (en) | ||
| JPH03232958A (en) | Production of laminated member coated with thin ti-type film | |
| JPS6384866U (en) | ||
| JPS6475669A (en) | Sputtering device | |
| JPS6426367U (en) | ||
| JPS59142749A (en) | Manufacturing device for magnetic recording medium | |
| JPH0238463U (en) | ||
| JPH03120559U (en) | ||
| JPH02102461U (en) | ||
| JPH02102460U (en) | ||
| JPS63170938U (en) |