JPH02120831U - - Google Patents

Info

Publication number
JPH02120831U
JPH02120831U JP1989029637U JP2963789U JPH02120831U JP H02120831 U JPH02120831 U JP H02120831U JP 1989029637 U JP1989029637 U JP 1989029637U JP 2963789 U JP2963789 U JP 2963789U JP H02120831 U JPH02120831 U JP H02120831U
Authority
JP
Japan
Prior art keywords
electrostatic adsorption
groove
heat transfer
plate
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1989029637U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989029637U priority Critical patent/JPH02120831U/ja
Publication of JPH02120831U publication Critical patent/JPH02120831U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】
第１図は本考案の一実施例を示す断面概略図、
第２図は該実施例に於ける板状絶縁物の平面図、
第３図は第２図のＡ矢視図、第４図は該実施例に
於ける吸着力減少状態を示す線図、第５図は従来
例を示す断面概略図である。 １は真空容器、４はウエーハ、８は直流電源、
１１は板状絶縁物、１５は熱授受手段、１６，１
８は溝、１７はヘリウム供給装置、１９はシール
溝を示す。

Claims (1)

    【実用新案登録請求の範囲】
  1. ドライエツチング及びＣＶＤ等の処理装置に用
    いられる静電吸着装置に於いて、真空容器内に配
    設され、所要の熱授受手段で熱授受が行われる板
    状絶縁物に静電吸着用電極を埋設し、該静電吸着
    用電極に直流電源を接続し、前記板状絶縁物の被
    処理基板載置面に該被処理基板によつて閉塞され
    る溝を刻設し、該溝にヘリウムガスを供給するヘ
    リウムガス供給装置を連通したことを特徴とする
    静電吸着装置。
JP1989029637U 1989-03-15 1989-03-15 Pending JPH02120831U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989029637U JPH02120831U (ja) 1989-03-15 1989-03-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989029637U JPH02120831U (ja) 1989-03-15 1989-03-15

Publications (1)

Publication Number Publication Date
JPH02120831U true JPH02120831U (ja) 1990-09-28

Family

ID=31254019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989029637U Pending JPH02120831U (ja) 1989-03-15 1989-03-15

Country Status (1)

Country Link
JP (1) JPH02120831U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007258615A (ja) * 2006-03-24 2007-10-04 Ngk Insulators Ltd 静電チャック

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6015226A (ja) * 1983-07-07 1985-01-25 Fuji Heavy Ind Ltd ４輪駆動車
JPS63156321A (ja) * 1986-12-20 1988-06-29 Fujitsu Ltd プラズマ処理装置
JPS63229716A (ja) * 1987-03-19 1988-09-26 Fujitsu Ltd ドライエツチング方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6015226A (ja) * 1983-07-07 1985-01-25 Fuji Heavy Ind Ltd ４輪駆動車
JPS63156321A (ja) * 1986-12-20 1988-06-29 Fujitsu Ltd プラズマ処理装置
JPS63229716A (ja) * 1987-03-19 1988-09-26 Fujitsu Ltd ドライエツチング方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007258615A (ja) * 2006-03-24 2007-10-04 Ngk Insulators Ltd 静電チャック

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