JPH0416104B2 - - Google Patents

Info

Publication number
JPH0416104B2
JPH0416104B2 JP11359684A JP11359684A JPH0416104B2 JP H0416104 B2 JPH0416104 B2 JP H0416104B2 JP 11359684 A JP11359684 A JP 11359684A JP 11359684 A JP11359684 A JP 11359684A JP H0416104 B2 JPH0416104 B2 JP H0416104B2
Authority
JP
Japan
Prior art keywords
group
compound
photosensitive material
salts
active halogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11359684A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60257444A (ja
Inventor
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP11359684A priority Critical patent/JPS60257444A/ja
Publication of JPS60257444A publication Critical patent/JPS60257444A/ja
Publication of JPH0416104B2 publication Critical patent/JPH0416104B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP11359684A 1984-06-01 1984-06-01 光架橋性感光材料 Granted JPS60257444A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11359684A JPS60257444A (ja) 1984-06-01 1984-06-01 光架橋性感光材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11359684A JPS60257444A (ja) 1984-06-01 1984-06-01 光架橋性感光材料

Publications (2)

Publication Number Publication Date
JPS60257444A JPS60257444A (ja) 1985-12-19
JPH0416104B2 true JPH0416104B2 (mo) 1992-03-23

Family

ID=14616213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11359684A Granted JPS60257444A (ja) 1984-06-01 1984-06-01 光架橋性感光材料

Country Status (1)

Country Link
JP (1) JPS60257444A (mo)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH063546B2 (ja) * 1986-02-04 1994-01-12 東洋紡績株式会社 光重合性組成物
JPH0816783B2 (ja) * 1989-09-11 1996-02-21 工業技術院物質工学工業技術研究所長 可視光記録材料
JPH0816784B2 (ja) * 1989-09-27 1996-02-21 工業技術院物質工学工業技術研究所長 感可視光樹脂組成物
JPH04181944A (ja) * 1990-11-16 1992-06-29 Toyo Ink Mfg Co Ltd 可視光感光性組成物
AT412427B (de) * 1999-12-21 2005-02-25 Ciba Sc Holding Ag Strahlungsempfindliche zusammensetzung
JP2024038756A (ja) * 2022-09-08 2024-03-21 日東電工株式会社 光硬化性樹脂シート

Also Published As

Publication number Publication date
JPS60257444A (ja) 1985-12-19

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term