JPH04500241A - 真空中で支持体へ皮膜を蒸着するための方法と装置 - Google Patents

真空中で支持体へ皮膜を蒸着するための方法と装置

Info

Publication number: JPH04500241A
Authority: JP; Japan
Prior art keywords: flow; support; channel; cross; section
Prior art date: 1988-08-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP1509077A

Other languages

English (en)

Japanese (ja)

Inventor

フーメンベルガー，ヨーゼフ

Original Assignee

ハインツル　インドゥストリージステーメ　ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-08-29

Filing date

1989-08-29

Publication date

1992-01-16

1989-08-29 Application filed by ハインツル　インドゥストリージステーメ　ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング filed Critical ハインツル　インドゥストリージステーメ　ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング

1992-01-16 Publication of JPH04500241A publication Critical patent/JPH04500241A/ja

Status Pending legal-status Critical Current

Links

238000000576 coating method Methods 0.000 title claims description 18
238000000034 method Methods 0.000 title claims description 11
238000000151 deposition Methods 0.000 title claims description 6
239000000463 material Substances 0.000 claims description 23
230000008020 evaporation Effects 0.000 claims description 18
238000001704 evaporation Methods 0.000 claims description 18
239000011248 coating agent Substances 0.000 claims description 15
238000010438 heat treatment Methods 0.000 claims description 7
239000000758 substrate Substances 0.000 claims description 4
238000009833 condensation Methods 0.000 claims description 3
230000005494 condensation Effects 0.000 claims description 3
238000009826 distribution Methods 0.000 description 4
239000002245 particle Substances 0.000 description 3
229910052793 cadmium Inorganic materials 0.000 description 2
BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
239000004020 conductor Substances 0.000 description 2
230000000694 effects Effects 0.000 description 2
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
239000010931 gold Substances 0.000 description 2
229910052737 gold Inorganic materials 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
239000010453 quartz Substances 0.000 description 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
229910052714 tellurium Inorganic materials 0.000 description 2
PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
WJCRZORJJRCRAW-UHFFFAOYSA-N cadmium gold Chemical compound [Cd].[Au] WJCRZORJJRCRAW-UHFFFAOYSA-N 0.000 description 1
238000005253 cladding Methods 0.000 description 1
230000008021 deposition Effects 0.000 description 1
230000002349 favourable effect Effects 0.000 description 1
239000012530 fluid Substances 0.000 description 1
230000001771 impaired effect Effects 0.000 description 1
229910052744 lithium Inorganic materials 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
238000005259 measurement Methods 0.000 description 1
238000000691 measurement method Methods 0.000 description 1
239000012528 membrane Substances 0.000 description 1
229910052750 molybdenum Inorganic materials 0.000 description 1
239000011733 molybdenum Substances 0.000 description 1
238000005457 optimization Methods 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
238000010025 steaming Methods 0.000 description 1
239000002470 thermal conductor Substances 0.000 description 1
238000009827 uniform distribution Methods 0.000 description 1
239000012808 vapor phase Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

JP1509077A 1988-08-29 1989-08-29 真空中で支持体へ皮膜を蒸着するための方法と装置 Pending JPH04500241A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
AT211088A AT392486B (de)	1988-08-29	1988-08-29	Verfahren und vorrichtung zum aufdampfen einer beschichtung auf einem traeger im vakuum
AT2110/88		1988-08-29

Publications (1)

Publication Number	Publication Date
JPH04500241A true JPH04500241A (ja)	1992-01-16

Family

ID=3527991

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP1509077A Pending JPH04500241A (ja)	1988-08-29	1989-08-29	真空中で支持体へ皮膜を蒸着するための方法と装置

Country Status (4)

Country	Link
EP (1)	EP0431021A1 (de)
JP (1)	JPH04500241A (de)
AT (1)	AT392486B (de)
WO (1)	WO1990002214A1 (de)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3361591A (en) *	1964-04-15	1968-01-02	Hughes Aircraft Co	Production of thin films of cadmium sulfide, cadmium telluride or cadmium selenide
CH626407A5 (de) *	1977-07-08	1981-11-13	Balzers Hochvakuum
DE3204337A1 (de) *	1981-02-10	1982-11-04	Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa	Verfahren und vorrichtung zum bilden eines duennen films
US4700660A (en) *	1984-06-12	1987-10-20	Kievsky Politekhnichesky Institut	Evaporator for depositing films in a vacuum

1988
- 1988-08-29 AT AT211088A patent/AT392486B/de not_active IP Right Cessation
1989
- 1989-08-29 EP EP19890909676 patent/EP0431021A1/de not_active Withdrawn
- 1989-08-29 JP JP1509077A patent/JPH04500241A/ja active Pending
- 1989-08-29 WO PCT/AT1989/000077 patent/WO1990002214A1/de not_active Ceased

Also Published As

Publication number	Publication date
AT392486B (de)	1991-04-10
ATA211088A (de)	1990-09-15
EP0431021A1 (de)	1991-06-12
WO1990002214A1 (de)	1990-03-08

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