JPS51111090A - Semiconductor device manufacturing process - Google Patents

Semiconductor device manufacturing process

Info

Publication number
JPS51111090A
JPS51111090A JP3558375A JP3558375A JPS51111090A JP S51111090 A JPS51111090 A JP S51111090A JP 3558375 A JP3558375 A JP 3558375A JP 3558375 A JP3558375 A JP 3558375A JP S51111090 A JPS51111090 A JP S51111090A
Authority
JP
Japan
Prior art keywords
semiconductor device
manufacturing process
device manufacturing
high polymer
insulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3558375A
Other languages
Japanese (ja)
Inventor
Yoshio Honma
Takeshi Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3558375A priority Critical patent/JPS51111090A/en
Publication of JPS51111090A publication Critical patent/JPS51111090A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To increase the adhesion of the high polymer plastic membrane and the wiring layer. The pertans to the manufacture of semiconductor devices with multilayer wiring using high polymer insulation membranes such as polymide as insulation between the wiring layers.
COPYRIGHT: (C)1976,JPO&Japio
JP3558375A 1975-03-26 1975-03-26 Semiconductor device manufacturing process Pending JPS51111090A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3558375A JPS51111090A (en) 1975-03-26 1975-03-26 Semiconductor device manufacturing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3558375A JPS51111090A (en) 1975-03-26 1975-03-26 Semiconductor device manufacturing process

Publications (1)

Publication Number Publication Date
JPS51111090A true JPS51111090A (en) 1976-10-01

Family

ID=12445777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3558375A Pending JPS51111090A (en) 1975-03-26 1975-03-26 Semiconductor device manufacturing process

Country Status (1)

Country Link
JP (1) JPS51111090A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5373075A (en) * 1976-12-13 1978-06-29 Fujitsu Ltd Treatment method for wafer surface
JPS5745922A (en) * 1980-09-02 1982-03-16 Fujitsu Ltd Forming method for semiconductor single crystalline layer by energy beam irradiation
JPS63202043A (en) * 1987-02-17 1988-08-22 Mitsubishi Electric Corp Manufacture of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5373075A (en) * 1976-12-13 1978-06-29 Fujitsu Ltd Treatment method for wafer surface
JPS5745922A (en) * 1980-09-02 1982-03-16 Fujitsu Ltd Forming method for semiconductor single crystalline layer by energy beam irradiation
JPS63202043A (en) * 1987-02-17 1988-08-22 Mitsubishi Electric Corp Manufacture of semiconductor device

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