JPS5386580A - Treating method of semiconductor complex - Google Patents

Treating method of semiconductor complex

Info

Publication number
JPS5386580A
JPS5386580A JP80877A JP80877A JPS5386580A JP S5386580 A JPS5386580 A JP S5386580A JP 80877 A JP80877 A JP 80877A JP 80877 A JP80877 A JP 80877A JP S5386580 A JPS5386580 A JP S5386580A
Authority
JP
Japan
Prior art keywords
treating method
semiconductor complex
semiconductor
complex
maintaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP80877A
Other languages
Japanese (ja)
Inventor
Komei Yatsuno
Yoshiaki Okajima
Toshio Tokue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP80877A priority Critical patent/JPS5386580A/en
Publication of JPS5386580A publication Critical patent/JPS5386580A/en
Pending legal-status Critical Current

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  • Weting (AREA)

Abstract

PURPOSE: To provide high-reliability elements of superior reverse characteristics by maintaining a specified potential difference between a semiconductor complex and an etching solution and performing etching.
COPYRIGHT: (C)1978,JPO&Japio
JP80877A 1977-01-10 1977-01-10 Treating method of semiconductor complex Pending JPS5386580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP80877A JPS5386580A (en) 1977-01-10 1977-01-10 Treating method of semiconductor complex

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP80877A JPS5386580A (en) 1977-01-10 1977-01-10 Treating method of semiconductor complex

Publications (1)

Publication Number Publication Date
JPS5386580A true JPS5386580A (en) 1978-07-31

Family

ID=11483971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP80877A Pending JPS5386580A (en) 1977-01-10 1977-01-10 Treating method of semiconductor complex

Country Status (1)

Country Link
JP (1) JPS5386580A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6582578B1 (en) 1999-04-08 2003-06-24 Applied Materials, Inc. Method and associated apparatus for tilting a substrate upon entry for metal deposition
US6911136B2 (en) 2002-04-29 2005-06-28 Applied Materials, Inc. Method for regulating the electrical power applied to a substrate during an immersion process

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48101084A (en) * 1972-03-31 1973-12-20

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48101084A (en) * 1972-03-31 1973-12-20

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6582578B1 (en) 1999-04-08 2003-06-24 Applied Materials, Inc. Method and associated apparatus for tilting a substrate upon entry for metal deposition
US6911136B2 (en) 2002-04-29 2005-06-28 Applied Materials, Inc. Method for regulating the electrical power applied to a substrate during an immersion process

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