JPS5831077A - マスク構造体 - Google Patents

マスク構造体

Info

Publication number
JPS5831077A
JPS5831077A JP12779081A JP12779081A JPS5831077A JP S5831077 A JPS5831077 A JP S5831077A JP 12779081 A JP12779081 A JP 12779081A JP 12779081 A JP12779081 A JP 12779081A JP S5831077 A JPS5831077 A JP S5831077A
Authority
JP
Japan
Prior art keywords
mask
ring
frame
mask structure
tension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12779081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6157903B2 (de
Inventor
Minoru Tanaka
稔 田中
Hitoshi Kubota
仁志 窪田
Susumu Aiuchi
進 相内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12779081A priority Critical patent/JPS5831077A/ja
Publication of JPS5831077A publication Critical patent/JPS5831077A/ja
Publication of JPS6157903B2 publication Critical patent/JPS6157903B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP12779081A 1981-08-17 1981-08-17 マスク構造体 Granted JPS5831077A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12779081A JPS5831077A (ja) 1981-08-17 1981-08-17 マスク構造体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12779081A JPS5831077A (ja) 1981-08-17 1981-08-17 マスク構造体

Publications (2)

Publication Number Publication Date
JPS5831077A true JPS5831077A (ja) 1983-02-23
JPS6157903B2 JPS6157903B2 (de) 1986-12-09

Family

ID=14968737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12779081A Granted JPS5831077A (ja) 1981-08-17 1981-08-17 マスク構造体

Country Status (1)

Country Link
JP (1) JPS5831077A (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003004719A1 (de) * 2001-07-04 2003-01-16 Aixtron Ag Masken- und substrathalteranordnung
KR20040037286A (ko) * 2002-10-28 2004-05-07 주식회사 엘리아테크 유기 전계 발광 디스플레이용 섀도우 마스크 고정용마스크 프레임
US20080000420A1 (en) * 2006-06-30 2008-01-03 Lg Philips Lcd Co., Ltd. Shadow mask and deposition device having the same
CN104099561A (zh) * 2013-04-09 2014-10-15 三星显示有限公司 沉积装置和应用于沉积装置的掩模组件
CN112662994A (zh) * 2020-12-04 2021-04-16 合肥维信诺科技有限公司 掩膜版及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS525956U (de) * 1975-07-01 1977-01-17
JPS5441157U (de) * 1977-08-26 1979-03-19

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS525956U (de) * 1975-07-01 1977-01-17
JPS5441157U (de) * 1977-08-26 1979-03-19

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003004719A1 (de) * 2001-07-04 2003-01-16 Aixtron Ag Masken- und substrathalteranordnung
KR20040037286A (ko) * 2002-10-28 2004-05-07 주식회사 엘리아테크 유기 전계 발광 디스플레이용 섀도우 마스크 고정용마스크 프레임
US20080000420A1 (en) * 2006-06-30 2008-01-03 Lg Philips Lcd Co., Ltd. Shadow mask and deposition device having the same
CN104099561A (zh) * 2013-04-09 2014-10-15 三星显示有限公司 沉积装置和应用于沉积装置的掩模组件
JP2014201832A (ja) * 2013-04-09 2014-10-27 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 蒸着装置及びそれに適用するマスク組立体
CN104099561B (zh) * 2013-04-09 2018-12-14 三星显示有限公司 沉积装置和应用于沉积装置的掩模组件
CN112662994A (zh) * 2020-12-04 2021-04-16 合肥维信诺科技有限公司 掩膜版及其制备方法
CN112662994B (zh) * 2020-12-04 2023-04-25 合肥维信诺科技有限公司 掩膜版及其制备方法

Also Published As

Publication number Publication date
JPS6157903B2 (de) 1986-12-09

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