JPS60190392A - 原版印刷版用アルミニウム支持体の製造方法 - Google Patents

原版印刷版用アルミニウム支持体の製造方法

Info

Publication number: JPS60190392A
Authority: JP; Japan
Prior art keywords: pit; aluminum; depth; plate; acid
Prior art date: 1984-03-13
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP4773084A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0472719B2 (fr

Inventor

Haruo Nakanishi

治雄中西

Hirokazu Sakaki

榊　博和

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Holdings Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-03-13

Filing date

1984-03-13

Publication date

1985-09-27

1984-03-13 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

1984-03-13 Priority to JP4773084A priority Critical patent/JPS60190392A/ja

1985-09-27 Publication of JPS60190392A publication Critical patent/JPS60190392A/ja

1992-11-18 Publication of JPH0472719B2 publication Critical patent/JPH0472719B2/ja

Status Granted legal-status Critical Current

Links

229910052782 aluminium Inorganic materials 0.000 title claims abstract description 42
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 42
238000004519 manufacturing process Methods 0.000 title claims description 7
238000000034 method Methods 0.000 claims abstract description 30
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 26
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 16
229910017604 nitric acid Inorganic materials 0.000 claims abstract description 16
238000011282 treatment Methods 0.000 claims description 41
239000011148 porous material Substances 0.000 claims description 16
239000008151 electrolyte solution Substances 0.000 claims description 11
239000007788 liquid Substances 0.000 abstract description 6
230000015572 biosynthetic process Effects 0.000 abstract description 4
238000007788 roughening Methods 0.000 description 30
239000003792 electrolyte Substances 0.000 description 14
229920005989 resin Polymers 0.000 description 14
239000011347 resin Substances 0.000 description 14
239000007864 aqueous solution Substances 0.000 description 13
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 10
239000010410 layer Substances 0.000 description 9
239000000203 mixture Substances 0.000 description 8
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
238000005530 etching Methods 0.000 description 6
239000000243 solution Substances 0.000 description 6
229910000147 aluminium phosphate Inorganic materials 0.000 description 5
KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 5
150000008049 diazo compounds Chemical class 0.000 description 5
AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 5
LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
239000002253 acid Substances 0.000 description 4
150000001875 compounds Chemical class 0.000 description 4
229920001577 copolymer Polymers 0.000 description 4
238000011161 development Methods 0.000 description 4
238000007654 immersion Methods 0.000 description 4
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
238000007743 anodising Methods 0.000 description 3
239000007795 chemical reaction product Substances 0.000 description 3
239000003795 chemical substances by application Substances 0.000 description 3
230000000052 comparative effect Effects 0.000 description 3
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
230000005611 electricity Effects 0.000 description 3
238000005868 electrolysis reaction Methods 0.000 description 3
150000002148 esters Chemical class 0.000 description 3
-1 hexafluorophosphate Chemical compound 0.000 description 3
239000003112 inhibitor Substances 0.000 description 3
239000002356 single layer Substances 0.000 description 3
239000000758 substrate Substances 0.000 description 3
230000003746 surface roughness Effects 0.000 description 3
KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
229910000838 Al alloy Inorganic materials 0.000 description 2
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
239000004115 Sodium Silicate Substances 0.000 description 2
150000007513 acids Chemical class 0.000 description 2
239000003513 alkali Substances 0.000 description 2
229910045601 alloy Inorganic materials 0.000 description 2
239000000956 alloy Substances 0.000 description 2
239000011230 binding agent Substances 0.000 description 2
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
239000004327 boric acid Substances 0.000 description 2
229940114081 cinnamate Drugs 0.000 description 2
239000011248 coating agent Substances 0.000 description 2
238000000576 coating method Methods 0.000 description 2
238000005260 corrosion Methods 0.000 description 2
230000007797 corrosion Effects 0.000 description 2
238000005238 degreasing Methods 0.000 description 2
239000012954 diazonium Substances 0.000 description 2
125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
229910001507 metal halide Inorganic materials 0.000 description 2
150000005309 metal halides Chemical class 0.000 description 2
230000003647 oxidation Effects 0.000 description 2
238000007254 oxidation reaction Methods 0.000 description 2
229920001568 phenolic resin Polymers 0.000 description 2
238000006116 polymerization reaction Methods 0.000 description 2
238000012545 processing Methods 0.000 description 2
150000003839 salts Chemical class 0.000 description 2
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
229910052911 sodium silicate Inorganic materials 0.000 description 2
239000003381 stabilizer Substances 0.000 description 2
229920002554 vinyl polymer Polymers 0.000 description 2
AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
AIMOGYBQVOZZCZ-UHFFFAOYSA-N 2-methylprop-2-enoic acid 3-phenylprop-2-enoic acid Chemical compound C(C(=C)C)(=O)O.C(C=CC1=CC=CC=C1)(=O)O AIMOGYBQVOZZCZ-UHFFFAOYSA-N 0.000 description 1
ASLOMEPLDWVVRG-UHFFFAOYSA-N 3-phenylprop-2-enoic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=CC1=CC=CC=C1 ASLOMEPLDWVVRG-UHFFFAOYSA-N 0.000 description 1
LZDOYVMSNJBLIM-UHFFFAOYSA-N 4-tert-butylphenol;formaldehyde Chemical compound O=C.CC(C)(C)C1=CC=C(O)C=C1 LZDOYVMSNJBLIM-UHFFFAOYSA-N 0.000 description 1
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
ZZAGLMPBQOKGGT-UHFFFAOYSA-N [4-[4-(4-prop-2-enoyloxybutoxy)benzoyl]oxyphenyl] 4-(4-prop-2-enoyloxybutoxy)benzoate Chemical compound C1=CC(OCCCCOC(=O)C=C)=CC=C1C(=O)OC(C=C1)=CC=C1OC(=O)C1=CC=C(OCCCCOC(=O)C=C)C=C1 ZZAGLMPBQOKGGT-UHFFFAOYSA-N 0.000 description 1
ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
239000003929 acidic solution Substances 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
150000007824 aliphatic compounds Chemical class 0.000 description 1
238000002048 anodisation reaction Methods 0.000 description 1
150000001491 aromatic compounds Chemical class 0.000 description 1
HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 1
SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
229940092714 benzenesulfonic acid Drugs 0.000 description 1
229910052797 bismuth Inorganic materials 0.000 description 1
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
210000000988 bone and bone Anatomy 0.000 description 1
125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
239000001768 carboxy methyl cellulose Substances 0.000 description 1
235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
239000008112 carboxymethyl-cellulose Substances 0.000 description 1
239000001913 cellulose Substances 0.000 description 1
229920002678 cellulose Polymers 0.000 description 1
150000001805 chlorine compounds Chemical class 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
238000004140 cleaning Methods 0.000 description 1
239000007859 condensation product Substances 0.000 description 1
239000000470 constituent Substances 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
238000012937 correction Methods 0.000 description 1
150000001989 diazonium salts Chemical class 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000002848 electrochemical method Methods 0.000 description 1
238000006056 electrooxidation reaction Methods 0.000 description 1
KBEBGUQPQBELIU-UHFFFAOYSA-N ethyl 3-phenylprop-2-enoate Chemical compound CCOC(=O)C=CC1=CC=CC=C1 KBEBGUQPQBELIU-UHFFFAOYSA-N 0.000 description 1
125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
239000003999 initiator Substances 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
239000011133 lead Substances 0.000 description 1
229910052749 magnesium Inorganic materials 0.000 description 1
239000011777 magnesium Substances 0.000 description 1
WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
239000000463 material Substances 0.000 description 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
229910052753 mercury Inorganic materials 0.000 description 1
AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
229910052914 metal silicate Inorganic materials 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
150000002823 nitrates Chemical class 0.000 description 1
GTTYPHLDORACJW-UHFFFAOYSA-N nitric acid;sodium Chemical compound [Na].O[N+]([O-])=O GTTYPHLDORACJW-UHFFFAOYSA-N 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
235000006408 oxalic acid Nutrition 0.000 description 1
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
239000011574 phosphorus Substances 0.000 description 1
229910052698 phosphorus Inorganic materials 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
229920001225 polyester resin Polymers 0.000 description 1
239000004645 polyester resin Substances 0.000 description 1
QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical group C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
238000011160 research Methods 0.000 description 1
239000010731 rolling oil Substances 0.000 description 1
239000004576 sand Substances 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1
239000002904 solvent Substances 0.000 description 1
238000004528 spin coating Methods 0.000 description 1
150000005846 sugar alcohols Polymers 0.000 description 1
125000000542 sulfonic acid group Chemical group 0.000 description 1
239000004094 surface-active agent Substances 0.000 description 1
230000002522 swelling effect Effects 0.000 description 1
238000012719 thermal polymerization Methods 0.000 description 1
WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
238000005406 washing Methods 0.000 description 1
229910052724 xenon Inorganic materials 0.000 description 1
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1
239000004246 zinc acetate Substances 0.000 description 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Printing Plates And Materials Therefor (AREA)

JP4773084A 1984-03-13 1984-03-13 原版印刷版用アルミニウム支持体の製造方法 Granted JPS60190392A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP4773084A JPS60190392A (ja)	1984-03-13	1984-03-13	原版印刷版用アルミニウム支持体の製造方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP4773084A JPS60190392A (ja)	1984-03-13	1984-03-13	原版印刷版用アルミニウム支持体の製造方法

Publications (2)

Publication Number	Publication Date
JPS60190392A true JPS60190392A (ja)	1985-09-27
JPH0472719B2 JPH0472719B2 (fr)	1992-11-18

Family

ID=12783454

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP4773084A Granted JPS60190392A (ja)	1984-03-13	1984-03-13	原版印刷版用アルミニウム支持体の製造方法

Country Status (1)

Country	Link
JP (1)	JPS60190392A (fr)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH01297295A (ja) *	1988-05-26	1989-11-30	Fuji Photo Film Co Ltd	平版印刷版用アルミニウム支持体の製造方法
EP0645260A1 (fr) *	1993-08-31	1995-03-29	Fuji Photo Film Co., Ltd.	Procédé pour la production d'un support pour plaques d'impression planographique
EP1712368A1 (fr)	2005-04-13	2006-10-18	Fuji Photo Film Co., Ltd.	Procédé de fabrication d'un substrat pour plaque lithographique
EP2100677A1 (fr)	2008-03-06	2009-09-16	Fujifilm Corporation	Procédé de fabrication d'une plaque en alliage d'aluminium pour une plaque d'impression lithographique, plaque en alliage d'aluminium pour plaque d'impression lithographique obtenue selon ce procédé et support de plaque d'impression lithographique
WO2010150810A1 (fr)	2009-06-26	2010-12-29	富士フイルム株式会社	Substrat réfléchissant la lumière et son procédé de fabrication
WO2011037005A1 (fr)	2009-09-24	2011-03-31	富士フイルム株式会社	Plaque originale d'impression lithographique
EP2384100A2 (fr)	2010-04-28	2011-11-02	Fujifilm Corporation	Substrat à réflexion lumineuse isolée
EP2586621A1 (fr)	2011-10-28	2013-05-01	Fujifilm Corporation	Procédé et appareil de fabrication d'un support de plaque d'impression planographique
WO2018235659A1 (fr)	2017-06-21	2018-12-27	富士フイルム株式会社	Matériau composite en aluminium
US10957491B2 (en)	2016-09-16	2021-03-23	Japan Capacitor Industrial Co., Ltd.	Electrolytic capacitor-specific electrode member and electrolytic capacitor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5442282A (en) *	1977-09-10	1979-04-04	Mitsubishi Heavy Ind Ltd	Apparatus having forming means for attaching disc having inner ring
JPS5485802A (en) *	1977-12-19	1979-07-07	Nippon Keikinzoku Sougou Kenki	Preparation of aluminium roughened surface plate for offset printing block
JPS6019593A (ja) *	1983-07-14	1985-01-31	Fuji Photo Film Co Ltd	平版印刷版用支持体の製造方法

1984
- 1984-03-13 JP JP4773084A patent/JPS60190392A/ja active Granted

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5442282A (en) *	1977-09-10	1979-04-04	Mitsubishi Heavy Ind Ltd	Apparatus having forming means for attaching disc having inner ring
JPS5485802A (en) *	1977-12-19	1979-07-07	Nippon Keikinzoku Sougou Kenki	Preparation of aluminium roughened surface plate for offset printing block
JPS6019593A (ja) *	1983-07-14	1985-01-31	Fuji Photo Film Co Ltd	平版印刷版用支持体の製造方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH01297295A (ja) *	1988-05-26	1989-11-30	Fuji Photo Film Co Ltd	平版印刷版用アルミニウム支持体の製造方法
EP0645260A1 (fr) *	1993-08-31	1995-03-29	Fuji Photo Film Co., Ltd.	Procédé pour la production d'un support pour plaques d'impression planographique
EP1712368A1 (fr)	2005-04-13	2006-10-18	Fuji Photo Film Co., Ltd.	Procédé de fabrication d'un substrat pour plaque lithographique
EP2100677A1 (fr)	2008-03-06	2009-09-16	Fujifilm Corporation	Procédé de fabrication d'une plaque en alliage d'aluminium pour une plaque d'impression lithographique, plaque en alliage d'aluminium pour plaque d'impression lithographique obtenue selon ce procédé et support de plaque d'impression lithographique
WO2010150810A1 (fr)	2009-06-26	2010-12-29	富士フイルム株式会社	Substrat réfléchissant la lumière et son procédé de fabrication
WO2011037005A1 (fr)	2009-09-24	2011-03-31	富士フイルム株式会社	Plaque originale d'impression lithographique
EP2384100A2 (fr)	2010-04-28	2011-11-02	Fujifilm Corporation	Substrat à réflexion lumineuse isolée
EP2586621A1 (fr)	2011-10-28	2013-05-01	Fujifilm Corporation	Procédé et appareil de fabrication d'un support de plaque d'impression planographique
US10957491B2 (en)	2016-09-16	2021-03-23	Japan Capacitor Industrial Co., Ltd.	Electrolytic capacitor-specific electrode member and electrolytic capacitor
WO2018235659A1 (fr)	2017-06-21	2018-12-27	富士フイルム株式会社	Matériau composite en aluminium

Also Published As

Publication number	Publication date
JPH0472719B2 (fr)	1992-11-18

Legal Events

Date	Code	Title	Description
2003-11-18	LAPS	Cancellation because of no payment of annual fees

Publication	Publication Date	Title
JPS59227494A (ja)	1984-12-20	平版印刷版用支持体の製造方法
US4824757A (en)	1989-04-25	Process for preparing positive-acting photosensitive lithographic aluminum printing plate precursor using nitric acid electrokyte for graining
EP0141254B1 (fr)	1988-03-16	Procédé de fabrication d'un support en aluminium pour plaques d'impression lithographiques
JPS60190392A (ja)	1985-09-27	原版印刷版用アルミニウム支持体の製造方法
JPH0346316B2 (fr)	1991-07-15
JPH028918B2 (fr)	1990-02-27
JPH062436B2 (ja)	1994-01-12	平版印刷版用支持体
JPS6282089A (ja)	1987-04-15	平版印刷版用支持体の製造方法
JPH01154797A (ja)	1989-06-16	平版印刷版用アルミニウム支持体の電解粗面化処理方法
JP2975487B2 (ja)	1999-11-10	平版印刷版用支持体の製造方法
JPH03104694A (ja)	1991-05-01	感光性平版印刷版用支持体の製造方法
JPS608091A (ja)	1985-01-16	ネガ型感光性平版印刷版の製造方法
JPH062435B2 (ja)	1994-01-12	平版印刷版用支持体
JPH062434B2 (ja)	1994-01-12	平版印刷版用支持体
JPH01178496A (ja)	1989-07-14	平版印刷版支持体の製造方法
JPH11174663A (ja)	1999-07-02	平版印刷版用支持体とその製造方法
JPH0635215B2 (ja)	1994-05-11	平版印刷版用支持体の製造方法
JPH0347196B2 (fr)	1991-07-18
JPH0214187A (ja)	1990-01-18	平版印刷版用アルミニウム支持体の製造方法
JPH08132749A (ja)	1996-05-28	感光性平版印刷版
JPS6151396A (ja)	1986-03-13	平版印刷版用支持体の製造方法
JPH01237197A (ja)	1989-09-21	平版印刷版支持体の製造方法
JPH05229275A (ja)	1993-09-07	平版印刷版用アルミニウム支持体の製造方法
JPH0212759B2 (fr)	1990-03-26
JPH0214188A (ja)	1990-01-18	平版印刷版用支持体の製造方法

JPS60190392A - 原版印刷版用アルミニウム支持体の製造方法 - Google Patents

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