JPS603626A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number: JPS603626A
Authority: JP; Japan
Prior art keywords: acid; photosensitive; compd; hiro; compound
Prior art date: 1983-06-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP58112482A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0342462B2 (fr

Inventor

Akira Nagashima

彰永島

Teruo Nagano

長野　照男

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Holdings Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1983-06-22

Filing date

1983-06-22

Publication date

1985-01-10

1983-06-22 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

1983-06-22 Priority to JP58112482A priority Critical patent/JPS603626A/ja

1985-01-10 Publication of JPS603626A publication Critical patent/JPS603626A/ja

1991-06-27 Publication of JPH0342462B2 publication Critical patent/JPH0342462B2/ja

Status Granted legal-status Critical Current

Links

239000000203 mixture Substances 0.000 title claims description 72
125000000217 alkyl group Chemical group 0.000 claims abstract description 6
229910052801 chlorine Inorganic materials 0.000 claims abstract description 4
229910052731 fluorine Inorganic materials 0.000 claims abstract description 3
150000001875 compounds Chemical class 0.000 claims description 50
-1 oxadiazole compound Chemical class 0.000 claims description 37
238000006303 photolysis reaction Methods 0.000 claims description 8
WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 3
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
125000001309 chloro group Chemical group Cl* 0.000 claims description 2
125000001153 fluoro group Chemical group F* 0.000 claims description 2
239000002253 acid Substances 0.000 abstract description 20
239000000178 monomer Substances 0.000 abstract description 8
238000011161 development Methods 0.000 abstract description 6
125000003118 aryl group Chemical group 0.000 abstract description 5
DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 abstract description 4
BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 abstract description 3
AFDXODALSZRGIH-QPJJXVBHSA-N (E)-3-(4-methoxyphenyl)prop-2-enoic acid Chemical compound COC1=CC=C(\C=C\C(O)=O)C=C1 AFDXODALSZRGIH-QPJJXVBHSA-N 0.000 abstract description 2
AFDXODALSZRGIH-UHFFFAOYSA-N p-coumaric acid methyl ether Natural products COC1=CC=C(C=CC(O)=O)C=C1 AFDXODALSZRGIH-UHFFFAOYSA-N 0.000 abstract description 2
ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 abstract 2
239000007858 starting material Substances 0.000 abstract 1
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical group ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 39
150000003254 radicals Chemical class 0.000 description 31
239000003795 chemical substances by application Substances 0.000 description 30
239000000243 solution Substances 0.000 description 29
238000006243 chemical reaction Methods 0.000 description 25
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
239000011230 binding agent Substances 0.000 description 17
230000015572 biosynthetic process Effects 0.000 description 17
238000003786 synthesis reaction Methods 0.000 description 17
229920005989 resin Polymers 0.000 description 16
239000011347 resin Substances 0.000 description 16
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
229910052782 aluminium Inorganic materials 0.000 description 12
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
229920000642 polymer Polymers 0.000 description 11
239000000975 dye Substances 0.000 description 9
238000000034 method Methods 0.000 description 9
238000010992 reflux Methods 0.000 description 9
238000003756 stirring Methods 0.000 description 9
239000000126 substance Substances 0.000 description 9
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 8
XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 8
239000002244 precipitate Substances 0.000 description 8
239000000047 product Substances 0.000 description 7
230000035945 sensitivity Effects 0.000 description 7
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 6
239000007864 aqueous solution Substances 0.000 description 6
238000001816 cooling Methods 0.000 description 6
229920001577 copolymer Polymers 0.000 description 6
230000003287 optical effect Effects 0.000 description 6
239000000049 pigment Substances 0.000 description 6
150000003839 salts Chemical class 0.000 description 6
FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 6
238000005406 washing Methods 0.000 description 6
LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 5
239000005457 ice water Substances 0.000 description 5
239000000463 material Substances 0.000 description 5
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
229920000728 polyester Polymers 0.000 description 5
229920002554 vinyl polymer Polymers 0.000 description 5
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
206010034972 Photosensitivity reaction Diseases 0.000 description 4
150000001408 amides Chemical group 0.000 description 4
ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 4
229920002678 cellulose Polymers 0.000 description 4
235000010980 cellulose Nutrition 0.000 description 4
239000013078 crystal Substances 0.000 description 4
ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 4
JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
238000001035 drying Methods 0.000 description 4
230000000694 effects Effects 0.000 description 4
125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
239000012046 mixed solvent Substances 0.000 description 4
229920001568 phenolic resin Polymers 0.000 description 4
229920002120 photoresistant polymer Polymers 0.000 description 4
230000036211 photosensitivity Effects 0.000 description 4
239000004014 plasticizer Substances 0.000 description 4
239000007787 solid Substances 0.000 description 4
WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 3
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
239000004115 Sodium Silicate Substances 0.000 description 3
ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
150000007513 acids Chemical class 0.000 description 3
239000000654 additive Substances 0.000 description 3
229910000147 aluminium phosphate Inorganic materials 0.000 description 3
150000004982 aromatic amines Chemical class 0.000 description 3
IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 3
239000001913 cellulose Substances 0.000 description 3
239000011248 coating agent Substances 0.000 description 3
238000000576 coating method Methods 0.000 description 3
229910052802 copper Inorganic materials 0.000 description 3
239000010949 copper Substances 0.000 description 3
MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
150000002148 esters Chemical class 0.000 description 3
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
229910052736 halogen Inorganic materials 0.000 description 3
150000002367 halogens Chemical class 0.000 description 3
239000007788 liquid Substances 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
238000002844 melting Methods 0.000 description 3
230000008018 melting Effects 0.000 description 3
229910052751 metal Inorganic materials 0.000 description 3
239000002184 metal Substances 0.000 description 3
229940008139 methylenedioxycinnamic acid Drugs 0.000 description 3
150000007524 organic acids Chemical class 0.000 description 3
150000002989 phenols Chemical class 0.000 description 3
229920000139 polyethylene terephthalate Polymers 0.000 description 3
239000005020 polyethylene terephthalate Substances 0.000 description 3
229910052911 sodium silicate Inorganic materials 0.000 description 3
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
239000003381 stabilizer Substances 0.000 description 3
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 2
XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
REKQLYUAUXYJSZ-UHFFFAOYSA-N 4-methoxybenzohydrazide Chemical compound COC1=CC=C(C(=O)NN)C=C1 REKQLYUAUXYJSZ-UHFFFAOYSA-N 0.000 description 2
LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 2
IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
229910000838 Al alloy Inorganic materials 0.000 description 2
PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
229920000742 Cotton Polymers 0.000 description 2
DOJXGHGHTWFZHK-UHFFFAOYSA-N Hexachloroacetone Chemical compound ClC(Cl)(Cl)C(=O)C(Cl)(Cl)Cl DOJXGHGHTWFZHK-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
229930192627 Naphthoquinone Natural products 0.000 description 2
YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
150000005215 alkyl ethers Chemical class 0.000 description 2
HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
125000004432 carbon atom Chemical group C* 0.000 description 2
239000007795 chemical reaction product Substances 0.000 description 2
MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
150000008049 diazo compounds Chemical class 0.000 description 2
DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 2
RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
150000002334 glycols Chemical class 0.000 description 2
238000010438 heat treatment Methods 0.000 description 2
229920001519 homopolymer Polymers 0.000 description 2
IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 2
239000003112 inhibitor Substances 0.000 description 2
OKJPEAGHQZHRQV-UHFFFAOYSA-N iodoform Chemical compound IC(I)I OKJPEAGHQZHRQV-UHFFFAOYSA-N 0.000 description 2
229910052742 iron Inorganic materials 0.000 description 2
RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
229910001507 metal halide Inorganic materials 0.000 description 2
150000005309 metal halides Chemical class 0.000 description 2
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
DDIZAANNODHTRB-UHFFFAOYSA-N methyl p-anisate Chemical compound COC(=O)C1=CC=C(OC)C=C1 DDIZAANNODHTRB-UHFFFAOYSA-N 0.000 description 2
SHXOKQKTZJXHHR-UHFFFAOYSA-N n,n-diethyl-5-iminobenzo[a]phenoxazin-9-amine;hydrochloride Chemical compound [Cl-].C1=CC=C2C3=NC4=CC=C(N(CC)CC)C=C4OC3=CC(=[NH2+])C2=C1 SHXOKQKTZJXHHR-UHFFFAOYSA-N 0.000 description 2
150000002791 naphthoquinones Chemical class 0.000 description 2
229920003986 novolac Polymers 0.000 description 2
RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 2
RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
239000005011 phenolic resin Substances 0.000 description 2
KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
230000015843 photosynthesis, light reaction Effects 0.000 description 2
230000000704 physical effect Effects 0.000 description 2
229920002451 polyvinyl alcohol Polymers 0.000 description 2
238000012545 processing Methods 0.000 description 2
WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 2
235000019795 sodium metasilicate Nutrition 0.000 description 2
229940124530 sulfonamide Drugs 0.000 description 2
150000003456 sulfonamides Chemical group 0.000 description 2
150000003464 sulfur compounds Chemical class 0.000 description 2
HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 2
JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
PNVPNXKRAUBJGW-UHFFFAOYSA-N (2-chloroacetyl) 2-chloroacetate Chemical compound ClCC(=O)OC(=O)CCl PNVPNXKRAUBJGW-UHFFFAOYSA-N 0.000 description 1
JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
DHBXNPKRAUYBTH-UHFFFAOYSA-N 1,1-ethanedithiol Chemical compound CC(S)S DHBXNPKRAUYBTH-UHFFFAOYSA-N 0.000 description 1
BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
UOFGSWVZMUXXIY-UHFFFAOYSA-N 1,5-Diphenyl-3-thiocarbazone Chemical compound C=1C=CC=CC=1N=NC(=S)NNC1=CC=CC=C1 UOFGSWVZMUXXIY-UHFFFAOYSA-N 0.000 description 1
ONBQEOIKXPHGMB-VBSBHUPXSA-N 1-[2-[(2s,3r,4s,5r)-3,4-dihydroxy-5-(hydroxymethyl)oxolan-2-yl]oxy-4,6-dihydroxyphenyl]-3-(4-hydroxyphenyl)propan-1-one Chemical compound O[C@@H]1[C@H](O)[C@@H](CO)O[C@H]1OC1=CC(O)=CC(O)=C1C(=O)CCC1=CC=C(O)C=C1 ONBQEOIKXPHGMB-VBSBHUPXSA-N 0.000 description 1
FRQZJHWONNOZNB-UHFFFAOYSA-N 1-hydroxy-6-methylcyclohexa-2,4-diene-1-carbaldehyde Chemical compound OC1(C(C=CC=C1)C)C=O FRQZJHWONNOZNB-UHFFFAOYSA-N 0.000 description 1
PVRZMTHMPKVOBP-UHFFFAOYSA-N 1-n,4-n-dimethylbenzene-1,4-diamine Chemical compound CNC1=CC=C(NC)C=C1 PVRZMTHMPKVOBP-UHFFFAOYSA-N 0.000 description 1
RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
WHTZQYDVDPHTAM-UHFFFAOYSA-N 2,2,2-tribromo-1-phenylethanone Chemical compound BrC(Br)(Br)C(=O)C1=CC=CC=C1 WHTZQYDVDPHTAM-UHFFFAOYSA-N 0.000 description 1
VFDMCQVWSAENIU-UHFFFAOYSA-N 2,2,2-tribromoacetyl bromide Chemical compound BrC(=O)C(Br)(Br)Br VFDMCQVWSAENIU-UHFFFAOYSA-N 0.000 description 1
RSZXXBTXZJGELH-UHFFFAOYSA-N 2,3,4-tri(propan-2-yl)naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(C(C)C)C(C(C)C)=C(C(C)C)C(S(O)(=O)=O)=C21 RSZXXBTXZJGELH-UHFFFAOYSA-N 0.000 description 1
BNLLOWWVYZWIGN-UHFFFAOYSA-N 2,3-dimethoxybenzohydrazide Chemical compound COC1=CC=CC(C(=O)NN)=C1OC BNLLOWWVYZWIGN-UHFFFAOYSA-N 0.000 description 1
ZGZUIGVCZUSCRV-UHFFFAOYSA-N 2-(1-cyclopropylethyl)-4-methylpyrazol-3-amine Chemical compound N1=CC(C)=C(N)N1C(C)C1CC1 ZGZUIGVCZUSCRV-UHFFFAOYSA-N 0.000 description 1
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
BLPUXJIIRIWMSQ-QPJJXVBHSA-N 2-[(e)-3-phenylprop-2-enylidene]propanedioic acid Chemical compound OC(=O)C(C(O)=O)=C\C=C\C1=CC=CC=C1 BLPUXJIIRIWMSQ-QPJJXVBHSA-N 0.000 description 1
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239000003960 organic solvent Substances 0.000 description 1
WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
235000006408 oxalic acid Nutrition 0.000 description 1
230000001590 oxidative effect Effects 0.000 description 1
QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
229920002866 paraformaldehyde Polymers 0.000 description 1
WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
150000002978 peroxides Chemical class 0.000 description 1
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
235000021317 phosphate Nutrition 0.000 description 1
150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
229910052698 phosphorus Inorganic materials 0.000 description 1
239000011574 phosphorus Substances 0.000 description 1
239000000906 photoactive agent Substances 0.000 description 1
XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
229920003023 plastic Polymers 0.000 description 1
239000004033 plastic Substances 0.000 description 1
239000002985 plastic film Substances 0.000 description 1
229920006255 plastic film Polymers 0.000 description 1
229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
239000004584 polyacrylic acid Substances 0.000 description 1
229920000515 polycarbonate Polymers 0.000 description 1
239000004417 polycarbonate Substances 0.000 description 1
229920005862 polyol Polymers 0.000 description 1
150000003077 polyols Chemical class 0.000 description 1
229920006324 polyoxymethylene Polymers 0.000 description 1
235000013824 polyphenols Nutrition 0.000 description 1
229920005749 polyurethane resin Polymers 0.000 description 1
229920002689 polyvinyl acetate Polymers 0.000 description 1
239000011118 polyvinyl acetate Substances 0.000 description 1
235000019422 polyvinyl alcohol Nutrition 0.000 description 1
150000003142 primary aromatic amines Chemical class 0.000 description 1
125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 1
229940079877 pyrogallol Drugs 0.000 description 1
230000005855 radiation Effects 0.000 description 1
239000002994 raw material Substances 0.000 description 1
239000011541 reaction mixture Substances 0.000 description 1
238000011160 research Methods 0.000 description 1
229940043267 rhodamine b Drugs 0.000 description 1
RAPZEAPATHNIPO-UHFFFAOYSA-N risperidone Chemical compound FC1=CC=C2C(C3CCN(CC3)CCC=3C(=O)N4CCCCC4=NC=3C)=NOC2=C1 RAPZEAPATHNIPO-UHFFFAOYSA-N 0.000 description 1
229940081623 rose bengal Drugs 0.000 description 1
229930187593 rose bengal Natural products 0.000 description 1
STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
150000003336 secondary aromatic amines Chemical class 0.000 description 1
238000002791 soaking Methods 0.000 description 1
239000002904 solvent Substances 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
239000008107 starch Substances 0.000 description 1
235000019698 starch Nutrition 0.000 description 1
125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
150000003459 sulfonic acid esters Chemical class 0.000 description 1
150000003460 sulfonic acids Chemical class 0.000 description 1
125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
238000012719 thermal polymerization Methods 0.000 description 1
229930192474 thiophene Natural products 0.000 description 1
PRZSXZWFJHEZBJ-UHFFFAOYSA-N thymol blue Chemical compound C1=C(O)C(C(C)C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C(=CC(O)=C(C(C)C)C=2)C)=C1C PRZSXZWFJHEZBJ-UHFFFAOYSA-N 0.000 description 1
230000001256 tonic effect Effects 0.000 description 1
DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical class [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
229940075420 xanthine Drugs 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1
239000011787 zinc oxide Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

JP58112482A 1983-06-22 1983-06-22 感光性組成物 Granted JPS603626A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP58112482A JPS603626A (ja)	1983-06-22	1983-06-22	感光性組成物

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP58112482A JPS603626A (ja)	1983-06-22	1983-06-22	感光性組成物

Publications (2)

Publication Number	Publication Date
JPS603626A true JPS603626A (ja)	1985-01-10
JPH0342462B2 JPH0342462B2 (fr)	1991-06-27

Family

ID=14587742

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP58112482A Granted JPS603626A (ja)	1983-06-22	1983-06-22	感光性組成物

Country Status (1)

Country	Link
JP (1)	JPS603626A (fr)

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS62175735A (ja) *	1986-01-30	1987-08-01	Fuji Photo Film Co Ltd	感光性組成物
JPS6477051A (en) *	1987-06-03	1989-03-23	Konishiroku Photo Ind	Photosensitive composition and photosensitive planographic printing plate
JPH0296755A (ja) *	1988-10-03	1990-04-09	Konica Corp	感光性組成物
EP0565006A2 (fr)	1992-04-06	1993-10-13	Fuji Photo Film Co., Ltd.	Méthode pour la préparation d'une plaque présensibilisée
EP1627732A1 (fr)	2004-08-18	2006-02-22	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1640173A1 (fr)	2004-09-27	2006-03-29	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1690685A2 (fr)	2005-02-09	2006-08-16	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1705004A1 (fr)	2005-03-22	2006-09-27	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
WO2007136005A1 (fr)	2006-05-18	2007-11-29	Fujifilm Corporation	ProcÉdÉ et appareil pour le sÉchage d'une substance
EP1872943A2 (fr)	1999-05-21	2008-01-02	FUJIFILM Corporation	Composition photosensible et base de plaque d'impression planographique correspondant
EP1925447A1 (fr)	2002-09-17	2008-05-28	FUJIFILM Corporation	Matériau pour l'enregistrement d'images
EP2036721A1 (fr)	2000-11-30	2009-03-18	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042305A2 (fr)	2007-09-28	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042340A2 (fr)	2007-09-27	2009-04-01	Fujifilm Corporation	Plaque d'impression lithographique, agent de protection de surface et procédé de clichage pour une plaque d'impression lithographique
EP2042310A2 (fr)	2007-09-27	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042306A2 (fr)	2007-09-28	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique et procédé de production d'un copolymère utilisé avec celui-ci
EP2042308A2 (fr)	2007-09-27	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
WO2009063824A1 (fr)	2007-11-14	2009-05-22	Fujifilm Corporation	Procédé de séchage de film de revêtement et procédé pour produire un précurseur de plaque d'impression lithographique
EP2105690A2 (fr)	2008-03-26	2009-09-30	Fujifilm Corporation	Procédé et appareil de séchage
EP2106907A2 (fr)	2008-04-02	2009-10-07	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2161129A2 (fr)	2008-09-09	2010-03-10	Fujifilm Corporation	Précurseur de plaque d'impression lithographique photosensible pour laser à infrarouges
EP2236293A2 (fr)	2009-03-31	2010-10-06	FUJIFILM Corporation	Précurseur de plaque d'impression lithographique
WO2011037005A1 (fr)	2009-09-24	2011-03-31	富士フイルム株式会社	Plaque originale d'impression lithographique
EP2354854A1 (fr)	2002-09-20	2011-08-10	FUJIFILM Corporation	Méthode pour la production d'une plaque d'impression lithographique
EP2357530A2 (fr)	2010-02-17	2011-08-17	Fujifilm Corporation	Procédé de fabrication de plaque d'impression planographique
WO2011102485A1 (fr)	2010-02-19	2011-08-25	富士フイルム株式会社	Procédé de fabrication d'une plaque d'impression lithographique
WO2011125913A1 (fr)	2010-03-31	2011-10-13	富士フイルム株式会社	Révélateur permettant de traiter un précurseur de plaque d'impression planographique, procédé de préparation d'une plaque d'impression planographique en utilisant le révélateur, et procédé d'impression
EP2641738A2 (fr)	2012-03-23	2013-09-25	Fujifilm Corporation	Procédé de production de plaque dýimpression planographique et plaque dýimpression planographique
EP2644379A1 (fr)	2012-03-30	2013-10-02	FUJIFILM Corporation	Procédé de fabrication de plaque dýimpression planographique

1983
- 1983-06-22 JP JP58112482A patent/JPS603626A/ja active Granted

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS62175735A (ja) *	1986-01-30	1987-08-01	Fuji Photo Film Co Ltd	感光性組成物
JPS6477051A (en) *	1987-06-03	1989-03-23	Konishiroku Photo Ind	Photosensitive composition and photosensitive planographic printing plate
JPH0296755A (ja) *	1988-10-03	1990-04-09	Konica Corp	感光性組成物
EP0565006A2 (fr)	1992-04-06	1993-10-13	Fuji Photo Film Co., Ltd.	Méthode pour la préparation d'une plaque présensibilisée
EP1872943A2 (fr)	1999-05-21	2008-01-02	FUJIFILM Corporation	Composition photosensible et base de plaque d'impression planographique correspondant
EP2036721A1 (fr)	2000-11-30	2009-03-18	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP1925447A1 (fr)	2002-09-17	2008-05-28	FUJIFILM Corporation	Matériau pour l'enregistrement d'images
EP2354854A1 (fr)	2002-09-20	2011-08-10	FUJIFILM Corporation	Méthode pour la production d'une plaque d'impression lithographique
EP1627732A1 (fr)	2004-08-18	2006-02-22	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1640173A1 (fr)	2004-09-27	2006-03-29	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1690685A2 (fr)	2005-02-09	2006-08-16	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1705004A1 (fr)	2005-03-22	2006-09-27	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
WO2007136005A1 (fr)	2006-05-18	2007-11-29	Fujifilm Corporation	ProcÉdÉ et appareil pour le sÉchage d'une substance
EP2042310A2 (fr)	2007-09-27	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042308A2 (fr)	2007-09-27	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042340A2 (fr)	2007-09-27	2009-04-01	Fujifilm Corporation	Plaque d'impression lithographique, agent de protection de surface et procédé de clichage pour une plaque d'impression lithographique
EP2042305A2 (fr)	2007-09-28	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042306A2 (fr)	2007-09-28	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique et procédé de production d'un copolymère utilisé avec celui-ci
WO2009063824A1 (fr)	2007-11-14	2009-05-22	Fujifilm Corporation	Procédé de séchage de film de revêtement et procédé pour produire un précurseur de plaque d'impression lithographique
EP2105690A2 (fr)	2008-03-26	2009-09-30	Fujifilm Corporation	Procédé et appareil de séchage
EP2106907A2 (fr)	2008-04-02	2009-10-07	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2161129A2 (fr)	2008-09-09	2010-03-10	Fujifilm Corporation	Précurseur de plaque d'impression lithographique photosensible pour laser à infrarouges
EP2236293A2 (fr)	2009-03-31	2010-10-06	FUJIFILM Corporation	Précurseur de plaque d'impression lithographique
WO2011037005A1 (fr)	2009-09-24	2011-03-31	富士フイルム株式会社	Plaque originale d'impression lithographique
EP2357530A2 (fr)	2010-02-17	2011-08-17	Fujifilm Corporation	Procédé de fabrication de plaque d'impression planographique
WO2011102485A1 (fr)	2010-02-19	2011-08-25	富士フイルム株式会社	Procédé de fabrication d'une plaque d'impression lithographique
WO2011125913A1 (fr)	2010-03-31	2011-10-13	富士フイルム株式会社	Révélateur permettant de traiter un précurseur de plaque d'impression planographique, procédé de préparation d'une plaque d'impression planographique en utilisant le révélateur, et procédé d'impression
EP2641738A2 (fr)	2012-03-23	2013-09-25	Fujifilm Corporation	Procédé de production de plaque dýimpression planographique et plaque dýimpression planographique
EP2644379A1 (fr)	2012-03-30	2013-10-02	FUJIFILM Corporation	Procédé de fabrication de plaque dýimpression planographique

Also Published As

Publication number	Publication date
JPH0342462B2 (fr)	1991-06-27

Publication	Publication Date	Title
JPS603626A (ja)	1985-01-10	感光性組成物
US4232106A (en)	1980-11-04	Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors
US4279982A (en)	1981-07-21	Photosensitive compositions
US4511645A (en)	1985-04-16	Photosensitive plate for lithographic printing plate
US4772534A (en)	1988-09-20	Light sensitive composition containing a light sensitive s-triazine compound
US5480994A (en)	1996-01-02	Aminoketone sensitizers for aqueous soluble photopolymer compositions
JPS61143748A (ja)	1986-07-01	感光性組成物
US5064741A (en)	1991-11-12	Positive working light-sensitive composition containing a free radical generator and a discoloring agent
JPH0444737B2 (fr)	1992-07-22
JPS61151644A (ja)	1986-07-10	感光性組成物
US5922508A (en)	1999-07-13	Photopolymerizable recording material
GB2029428A (en)	1980-03-19	Photosensitive resin composition giving print-out images
JPS63298339A (ja)	1988-12-06	感光性組成物
US4701399A (en)	1987-10-20	Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole
GB2132212A (en)	1984-07-04	Photopolymerizable composition
JPH03205404A (ja)	1991-09-06	光重合性組成物
US5096799A (en)	1992-03-17	Photopolymerizable composition
JPH0157777B2 (fr)	1989-12-07
US5723260A (en)	1998-03-03	Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate
JPH0284647A (ja)	1990-03-26	感光性記録材料、その応用及びそれに適した新規のロイコ化合物
JPH0652425B2 (ja)	1994-07-06	感光性組成物
JPH0693117B2 (ja)	1994-11-16	感光性組成物
JP2565331B2 (ja)	1996-12-18	感光性組成物
JPS6224242A (ja)	1987-02-02	感光性組成物
JPH0627659A (ja)	1994-02-04	感光性組成物

JPS603626A - 感光性組成物 - Google Patents

Info

Links

Classifications

Landscapes

Priority Applications (1)

Applications Claiming Priority (1)

Publications (2)

Family

ID=14587742

Family Applications (1)

Country Status (1)

Cited By (29)

Cited By (29)

Also Published As

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