JPS605016A - 高温処理により製造された二酸化ケイ素、その製造方法およびその用途 - Google Patents
高温処理により製造された二酸化ケイ素、その製造方法およびその用途Info
- Publication number
- JPS605016A JPS605016A JP59116775A JP11677584A JPS605016A JP S605016 A JPS605016 A JP S605016A JP 59116775 A JP59116775 A JP 59116775A JP 11677584 A JP11677584 A JP 11677584A JP S605016 A JPS605016 A JP S605016A
- Authority
- JP
- Japan
- Prior art keywords
- silicon dioxide
- temperature treatment
- dioxide produced
- high temperature
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 41
- 235000012239 silicon dioxide Nutrition 0.000 title claims description 20
- 239000000377 silicon dioxide Substances 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 16
- 229910021529 ammonia Inorganic materials 0.000 claims description 8
- 230000002378 acidificating effect Effects 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 2
- 230000000996 additive effect Effects 0.000 claims description 2
- 230000007717 exclusion Effects 0.000 claims description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000005049 silicon tetrachloride Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE33209685 | 1983-06-10 | ||
| DE19833320968 DE3320968A1 (de) | 1983-06-10 | 1983-06-10 | Pyrogen hergestelltes siliciumdioxid, verfahren zu seiner herstellung und verwendung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS605016A true JPS605016A (ja) | 1985-01-11 |
| JPH0362647B2 JPH0362647B2 (de) | 1991-09-26 |
Family
ID=6201131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59116775A Granted JPS605016A (ja) | 1983-06-10 | 1984-06-08 | 高温処理により製造された二酸化ケイ素、その製造方法およびその用途 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0129015B1 (de) |
| JP (1) | JPS605016A (de) |
| DE (2) | DE3320968A1 (de) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04254403A (ja) * | 1990-09-12 | 1992-09-09 | Shell Internatl Res Maatschappij Bv | 窒化シリカ |
| JPH1067510A (ja) * | 1997-08-11 | 1998-03-10 | Chisso Corp | シリカ |
| JP2019503961A (ja) * | 2015-12-18 | 2019-02-14 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラスの調製における二酸化ケイ素粉末のアンモニア処理 |
| JP2020500817A (ja) * | 2016-11-30 | 2020-01-16 | コーニング インコーポレイテッド | 塩基性添加剤を使用してシリカスート成形体から光学品質ガラスを形成するための方法 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5182046A (en) * | 1990-12-05 | 1993-01-26 | Morton International, Inc. | Sodium borohydride composition and improved method of producing compacted sodium borohydride |
| US5455137A (en) * | 1993-12-21 | 1995-10-03 | International Business Machines Corporation | Toner composition |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| KR20180095618A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 다중-챔버 가열로에서 실리카 유리체의 제조 |
| JP6981710B2 (ja) | 2015-12-18 | 2021-12-17 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 二酸化ケイ素造粒体からの石英ガラス体の調製 |
| EP3390304B1 (de) | 2015-12-18 | 2023-09-13 | Heraeus Quarzglas GmbH & Co. KG | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| TWI840318B (zh) | 2015-12-18 | 2024-05-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3269799A (en) * | 1965-05-10 | 1966-08-30 | Columbian Carbon | Treatment of pigmentary silica |
| US3511605A (en) * | 1968-04-29 | 1970-05-12 | Columbian Carbon | Defluorination of pigmentary silica |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1642994A1 (de) * | 1967-01-21 | 1971-06-03 | Degussa | Verfahren zum Reinigen von hochdispersen Oxiden |
-
1983
- 1983-06-10 DE DE19833320968 patent/DE3320968A1/de not_active Withdrawn
-
1984
- 1984-04-14 DE DE8484104245T patent/DE3484884D1/de not_active Expired - Lifetime
- 1984-04-14 EP EP84104245A patent/EP0129015B1/de not_active Expired - Lifetime
- 1984-06-08 JP JP59116775A patent/JPS605016A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3269799A (en) * | 1965-05-10 | 1966-08-30 | Columbian Carbon | Treatment of pigmentary silica |
| US3511605A (en) * | 1968-04-29 | 1970-05-12 | Columbian Carbon | Defluorination of pigmentary silica |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04254403A (ja) * | 1990-09-12 | 1992-09-09 | Shell Internatl Res Maatschappij Bv | 窒化シリカ |
| JPH1067510A (ja) * | 1997-08-11 | 1998-03-10 | Chisso Corp | シリカ |
| JP2019503961A (ja) * | 2015-12-18 | 2019-02-14 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラスの調製における二酸化ケイ素粉末のアンモニア処理 |
| JP2020500817A (ja) * | 2016-11-30 | 2020-01-16 | コーニング インコーポレイテッド | 塩基性添加剤を使用してシリカスート成形体から光学品質ガラスを形成するための方法 |
| US11724954B2 (en) | 2016-11-30 | 2023-08-15 | Corning Incorporated | Basic additives for silica soot compacts and methods for forming optical quality glass |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0129015A3 (de) | 1988-09-07 |
| JPH0362647B2 (de) | 1991-09-26 |
| EP0129015A2 (de) | 1984-12-27 |
| DE3320968A1 (de) | 1984-12-13 |
| DE3484884D1 (de) | 1991-09-12 |
| EP0129015B1 (en) | 1991-08-07 |
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