JPS605016A - 高温処理により製造された二酸化ケイ素、その製造方法およびその用途 - Google Patents

高温処理により製造された二酸化ケイ素、その製造方法およびその用途

Info

Publication number
JPS605016A
JPS605016A JP59116775A JP11677584A JPS605016A JP S605016 A JPS605016 A JP S605016A JP 59116775 A JP59116775 A JP 59116775A JP 11677584 A JP11677584 A JP 11677584A JP S605016 A JPS605016 A JP S605016A
Authority
JP
Japan
Prior art keywords
silicon dioxide
temperature treatment
dioxide produced
high temperature
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59116775A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0362647B2 (de
Inventor
デトレ−フ・コ−ト
デイ−テル・シユツテ
マンフレ−ト・シユミツト
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Deutsche Gold und Silber Scheideanstalt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa GmbH, Deutsche Gold und Silber Scheideanstalt filed Critical Degussa GmbH
Publication of JPS605016A publication Critical patent/JPS605016A/ja
Publication of JPH0362647B2 publication Critical patent/JPH0362647B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/90Other properties not specified above

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
JP59116775A 1983-06-10 1984-06-08 高温処理により製造された二酸化ケイ素、その製造方法およびその用途 Granted JPS605016A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE33209685 1983-06-10
DE19833320968 DE3320968A1 (de) 1983-06-10 1983-06-10 Pyrogen hergestelltes siliciumdioxid, verfahren zu seiner herstellung und verwendung

Publications (2)

Publication Number Publication Date
JPS605016A true JPS605016A (ja) 1985-01-11
JPH0362647B2 JPH0362647B2 (de) 1991-09-26

Family

ID=6201131

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59116775A Granted JPS605016A (ja) 1983-06-10 1984-06-08 高温処理により製造された二酸化ケイ素、その製造方法およびその用途

Country Status (3)

Country Link
EP (1) EP0129015B1 (de)
JP (1) JPS605016A (de)
DE (2) DE3320968A1 (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04254403A (ja) * 1990-09-12 1992-09-09 Shell Internatl Res Maatschappij Bv 窒化シリカ
JPH1067510A (ja) * 1997-08-11 1998-03-10 Chisso Corp シリカ
JP2019503961A (ja) * 2015-12-18 2019-02-14 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラスの調製における二酸化ケイ素粉末のアンモニア処理
JP2020500817A (ja) * 2016-11-30 2020-01-16 コーニング インコーポレイテッド 塩基性添加剤を使用してシリカスート成形体から光学品質ガラスを形成するための方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5182046A (en) * 1990-12-05 1993-01-26 Morton International, Inc. Sodium borohydride composition and improved method of producing compacted sodium borohydride
US5455137A (en) * 1993-12-21 1995-10-03 International Business Machines Corporation Toner composition
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
KR20180095618A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 다중-챔버 가열로에서 실리카 유리체의 제조
JP6981710B2 (ja) 2015-12-18 2021-12-17 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 二酸化ケイ素造粒体からの石英ガラス体の調製
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
TWI840318B (zh) 2015-12-18 2024-05-01 德商何瑞斯廓格拉斯公司 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3269799A (en) * 1965-05-10 1966-08-30 Columbian Carbon Treatment of pigmentary silica
US3511605A (en) * 1968-04-29 1970-05-12 Columbian Carbon Defluorination of pigmentary silica

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1642994A1 (de) * 1967-01-21 1971-06-03 Degussa Verfahren zum Reinigen von hochdispersen Oxiden

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3269799A (en) * 1965-05-10 1966-08-30 Columbian Carbon Treatment of pigmentary silica
US3511605A (en) * 1968-04-29 1970-05-12 Columbian Carbon Defluorination of pigmentary silica

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04254403A (ja) * 1990-09-12 1992-09-09 Shell Internatl Res Maatschappij Bv 窒化シリカ
JPH1067510A (ja) * 1997-08-11 1998-03-10 Chisso Corp シリカ
JP2019503961A (ja) * 2015-12-18 2019-02-14 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラスの調製における二酸化ケイ素粉末のアンモニア処理
JP2020500817A (ja) * 2016-11-30 2020-01-16 コーニング インコーポレイテッド 塩基性添加剤を使用してシリカスート成形体から光学品質ガラスを形成するための方法
US11724954B2 (en) 2016-11-30 2023-08-15 Corning Incorporated Basic additives for silica soot compacts and methods for forming optical quality glass

Also Published As

Publication number Publication date
EP0129015A3 (de) 1988-09-07
JPH0362647B2 (de) 1991-09-26
EP0129015A2 (de) 1984-12-27
DE3320968A1 (de) 1984-12-13
DE3484884D1 (de) 1991-09-12
EP0129015B1 (en) 1991-08-07

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