JPS6054666B2 - 耐熱性フオトレジスト組成物およびその製造法 - Google Patents

耐熱性フオトレジスト組成物およびその製造法

Info

Publication number
JPS6054666B2
JPS6054666B2 JP13725677A JP13725677A JPS6054666B2 JP S6054666 B2 JPS6054666 B2 JP S6054666B2 JP 13725677 A JP13725677 A JP 13725677A JP 13725677 A JP13725677 A JP 13725677A JP S6054666 B2 JPS6054666 B2 JP S6054666B2
Authority
JP
Japan
Prior art keywords
formulas
tables
mathematical
chemical formulas
chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13725677A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5470820A (en
Inventor
馨 大村
一郎 柴崎
武夫 木村
宗明 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP13725677A priority Critical patent/JPS6054666B2/ja
Priority to GB7844576A priority patent/GB2008784B/en
Priority to US05/961,534 priority patent/US4180404A/en
Priority to FR7832525A priority patent/FR2409535A1/fr
Priority to BE191780A priority patent/BE872083A/fr
Priority to DE19782849981 priority patent/DE2849981A1/de
Publication of JPS5470820A publication Critical patent/JPS5470820A/ja
Priority to US06/062,800 priority patent/US4310641A/en
Publication of JPS6054666B2 publication Critical patent/JPS6054666B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/14—Polyamide-imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP13725677A 1977-11-17 1977-11-17 耐熱性フオトレジスト組成物およびその製造法 Expired JPS6054666B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP13725677A JPS6054666B2 (ja) 1977-11-17 1977-11-17 耐熱性フオトレジスト組成物およびその製造法
GB7844576A GB2008784B (en) 1977-11-17 1978-11-15 Heat resistant photoresist composition and process for preparing the same
US05/961,534 US4180404A (en) 1977-11-17 1978-11-16 Heat resistant photoresist composition and process for preparing the same
FR7832525A FR2409535A1 (fr) 1977-11-17 1978-11-17 Composition " photoresist " resistant a la chaleur et procede de preparation de celle-ci
BE191780A BE872083A (fr) 1977-11-17 1978-11-17 Composition "photoresist" resistant a la chaleur et procede de preparation de celle-ci
DE19782849981 DE2849981A1 (de) 1977-11-17 1978-11-17 Waermebestaendiges photoresistmaterial und verfahren zu seiner herstellung
US06/062,800 US4310641A (en) 1977-11-17 1979-08-01 Heat resistant photoresist composition and process for preparing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13725677A JPS6054666B2 (ja) 1977-11-17 1977-11-17 耐熱性フオトレジスト組成物およびその製造法

Publications (2)

Publication Number Publication Date
JPS5470820A JPS5470820A (en) 1979-06-07
JPS6054666B2 true JPS6054666B2 (ja) 1985-11-30

Family

ID=15194402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13725677A Expired JPS6054666B2 (ja) 1977-11-17 1977-11-17 耐熱性フオトレジスト組成物およびその製造法

Country Status (2)

Country Link
JP (1) JPS6054666B2 (fr)
BE (1) BE872083A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02162170A (ja) * 1988-12-15 1990-06-21 Daihatsu Motor Co Ltd 自動車の車体後部構造

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3683464D1 (de) * 1985-12-05 1992-02-27 Ibm Photoresistzusammensetzungen mit vermindertem loesungsgrad in basischen entwicklern, auf basis von durch diazochinon sensibilisierter polyamidsaeure.
JPH0646302B2 (ja) * 1987-06-22 1994-06-15 株式会社日立製作所 耐熱感光性重合体組成物
JP2006342335A (ja) * 2005-05-11 2006-12-21 Hitachi Chem Co Ltd ポリアミドイミドおよび樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02162170A (ja) * 1988-12-15 1990-06-21 Daihatsu Motor Co Ltd 自動車の車体後部構造

Also Published As

Publication number Publication date
BE872083A (fr) 1979-05-17
JPS5470820A (en) 1979-06-07

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