JPS61143748A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number: JPS61143748A
Authority: JP; Japan
Prior art keywords: free radical; photosensitive; agent; radical generating; composition
Prior art date: 1984-12-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP26584384A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0481788B2 (fr

Inventor

Akira Nagashima

彰永島

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Holdings Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-12-17

Filing date

1984-12-17

Publication date

1986-07-01

1984-12-17 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

1984-12-17 Priority to JP26584384A priority Critical patent/JPS61143748A/ja

1986-07-01 Publication of JPS61143748A publication Critical patent/JPS61143748A/ja

1992-12-24 Publication of JPH0481788B2 publication Critical patent/JPH0481788B2/ja

Status Granted legal-status Critical Current

Links

239000000203 mixture Substances 0.000 title claims description 58
150000003254 radicals Chemical class 0.000 claims abstract description 49
239000003795 chemical substances by application Substances 0.000 claims abstract description 42
125000004618 benzofuryl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 claims abstract description 12
238000006303 photolysis reaction Methods 0.000 claims abstract description 10
125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 9
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 7
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
150000001875 compounds Chemical class 0.000 claims description 26
-1 o-naphthoquinone diazide compound Chemical class 0.000 claims description 12
150000005072 1,3,4-oxadiazoles Chemical class 0.000 claims 2
WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 claims 1
230000015843 photosynthesis, light reaction Effects 0.000 claims 1
238000006243 chemical reaction Methods 0.000 abstract description 4
206010034972 Photosensitivity reaction Diseases 0.000 abstract description 3
230000036211 photosensitivity Effects 0.000 abstract description 3
KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 abstract 1
FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
229910052782 aluminium Inorganic materials 0.000 description 14
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
239000000243 solution Substances 0.000 description 12
239000000126 substance Substances 0.000 description 9
239000002253 acid Substances 0.000 description 8
238000011161 development Methods 0.000 description 8
230000035945 sensitivity Effects 0.000 description 8
239000007864 aqueous solution Substances 0.000 description 7
238000000034 method Methods 0.000 description 7
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
239000000975 dye Substances 0.000 description 6
238000004519 manufacturing process Methods 0.000 description 5
229910052751 metal Inorganic materials 0.000 description 5
239000002184 metal Substances 0.000 description 5
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
125000000217 alkyl group Chemical group 0.000 description 4
238000001035 drying Methods 0.000 description 4
229910052736 halogen Inorganic materials 0.000 description 4
WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 3
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
239000004115 Sodium Silicate Substances 0.000 description 3
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
150000007513 acids Chemical class 0.000 description 3
238000007743 anodising Methods 0.000 description 3
150000004982 aromatic amines Chemical class 0.000 description 3
239000011248 coating agent Substances 0.000 description 3
238000000576 coating method Methods 0.000 description 3
239000013078 crystal Substances 0.000 description 3
ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 3
239000003792 electrolyte Substances 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
239000000463 material Substances 0.000 description 3
229920000139 polyethylene terephthalate Polymers 0.000 description 3
239000005020 polyethylene terephthalate Substances 0.000 description 3
229920005989 resin Polymers 0.000 description 3
239000011347 resin Substances 0.000 description 3
150000003839 salts Chemical class 0.000 description 3
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
229910052911 sodium silicate Inorganic materials 0.000 description 3
BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 2
229910000838 Al alloy Inorganic materials 0.000 description 2
PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
206010011732 Cyst Diseases 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 2
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
125000003545 alkoxy group Chemical group 0.000 description 2
229910000147 aluminium phosphate Inorganic materials 0.000 description 2
239000000460 chlorine Substances 0.000 description 2
229910052801 chlorine Inorganic materials 0.000 description 2
MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
229910052802 copper Inorganic materials 0.000 description 2
239000010949 copper Substances 0.000 description 2
JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
208000031513 cyst Diseases 0.000 description 2
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
230000000694 effects Effects 0.000 description 2
125000005843 halogen group Chemical group 0.000 description 2
150000002367 halogens Chemical class 0.000 description 2
239000003999 initiator Substances 0.000 description 2
OKJPEAGHQZHRQV-UHFFFAOYSA-N iodoform Chemical compound IC(I)I OKJPEAGHQZHRQV-UHFFFAOYSA-N 0.000 description 2
239000007788 liquid Substances 0.000 description 2
229910001507 metal halide Inorganic materials 0.000 description 2
150000005309 metal halides Chemical class 0.000 description 2
SHXOKQKTZJXHHR-UHFFFAOYSA-N n,n-diethyl-5-iminobenzo[a]phenoxazin-9-amine;hydrochloride Chemical compound [Cl-].C1=CC=C2C3=NC4=CC=C(N(CC)CC)C=C4OC3=CC(=[NH2+])C2=C1 SHXOKQKTZJXHHR-UHFFFAOYSA-N 0.000 description 2
229920003986 novolac Polymers 0.000 description 2
230000003287 optical effect Effects 0.000 description 2
KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
238000001782 photodegradation Methods 0.000 description 2
230000000704 physical effect Effects 0.000 description 2
229920000642 polymer Polymers 0.000 description 2
239000003381 stabilizer Substances 0.000 description 2
HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 2
229910052725 zinc Inorganic materials 0.000 description 2
239000011701 zinc Substances 0.000 description 2
RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
WHTZQYDVDPHTAM-UHFFFAOYSA-N 2,2,2-tribromo-1-phenylethanone Chemical compound BrC(Br)(Br)C(=O)C1=CC=CC=C1 WHTZQYDVDPHTAM-UHFFFAOYSA-N 0.000 description 1
DKBZDWDOSPZINT-UHFFFAOYSA-N 2-[4-(diethylamino)anilino]-2-oxo-n-phenylethanimidoyl cyanide Chemical compound C1=CC(N(CC)CC)=CC=C1NC(=O)C(C#N)=NC1=CC=CC=C1 DKBZDWDOSPZINT-UHFFFAOYSA-N 0.000 description 1
CWBAMDVCIHSKNW-UHFFFAOYSA-N 2-iminonaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(=N)CC(=O)C2=C1 CWBAMDVCIHSKNW-UHFFFAOYSA-N 0.000 description 1
QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
QRJZGVVKGFIGLI-UHFFFAOYSA-N 2-phenylguanidine Chemical compound NC(=N)NC1=CC=CC=C1 QRJZGVVKGFIGLI-UHFFFAOYSA-N 0.000 description 1
AGIJRRREJXSQJR-UHFFFAOYSA-N 2h-thiazine Chemical compound N1SC=CC=C1 AGIJRRREJXSQJR-UHFFFAOYSA-N 0.000 description 1
JKYKXTRKURYNGW-UHFFFAOYSA-N 3,4-dihydroxy-9,10-dioxo-9,10-dihydroanthracene-2-sulfonic acid Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(O)=C(O)C(S(O)(=O)=O)=C2 JKYKXTRKURYNGW-UHFFFAOYSA-N 0.000 description 1
IHZXTIBMKNSJCJ-UHFFFAOYSA-N 3-{[(4-{[4-(dimethylamino)phenyl](4-{ethyl[(3-sulfophenyl)methyl]amino}phenyl)methylidene}cyclohexa-2,5-dien-1-ylidene)(ethyl)azaniumyl]methyl}benzene-1-sulfonate Chemical compound C=1C=C(C(=C2C=CC(C=C2)=[N+](C)C)C=2C=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC(S(O)(=O)=O)=C1 IHZXTIBMKNSJCJ-UHFFFAOYSA-N 0.000 description 1
MGUKYHHAGPFJMC-UHFFFAOYSA-N 4-[3-(4-hydroxy-2,5-dimethylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-2,5-dimethylphenol Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C(=CC(O)=C(C)C=2)C)=C1C MGUKYHHAGPFJMC-UHFFFAOYSA-N 0.000 description 1
OLQIKGSZDTXODA-UHFFFAOYSA-N 4-[3-(4-hydroxy-2-methylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-3-methylphenol Chemical compound CC1=CC(O)=CC=C1C1(C=2C(=CC(O)=CC=2)C)C2=CC=CC=C2S(=O)(=O)O1 OLQIKGSZDTXODA-UHFFFAOYSA-N 0.000 description 1
WCKQPPQRFNHPRJ-UHFFFAOYSA-N 4-[[4-(dimethylamino)phenyl]diazenyl]benzoic acid Chemical compound C1=CC(N(C)C)=CC=C1N=NC1=CC=C(C(O)=O)C=C1 WCKQPPQRFNHPRJ-UHFFFAOYSA-N 0.000 description 1
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
241000345998 Calamus manan Species 0.000 description 1
229920002284 Cellulose triacetate Polymers 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
206010012442 Dermatitis contact Diseases 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
UTGQNNCQYDRXCH-UHFFFAOYSA-N N,N'-diphenyl-1,4-phenylenediamine Chemical compound C=1C=C(NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 UTGQNNCQYDRXCH-UHFFFAOYSA-N 0.000 description 1
229930040373 Paraformaldehyde Natural products 0.000 description 1
OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
241000219492 Quercus Species 0.000 description 1
241000220317 Rosa Species 0.000 description 1
229910000831 Steel Inorganic materials 0.000 description 1
LDKDGDIWEUUXSH-UHFFFAOYSA-N Thymophthalein Chemical compound C1=C(O)C(C(C)C)=CC(C2(C3=CC=CC=C3C(=O)O2)C=2C(=CC(O)=C(C(C)C)C=2)C)=C1C LDKDGDIWEUUXSH-UHFFFAOYSA-N 0.000 description 1
DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
GLNADSQYFUSGOU-GPTZEZBUSA-J Trypan blue Chemical group [Na+].[Na+].[Na+].[Na+].C1=C(S([O-])(=O)=O)C=C2C=C(S([O-])(=O)=O)C(/N=N/C3=CC=C(C=C3C)C=3C=C(C(=CC=3)\N=N\C=3C(=CC4=CC(=CC(N)=C4C=3O)S([O-])(=O)=O)S([O-])(=O)=O)C)=C(O)C2=C1N GLNADSQYFUSGOU-GPTZEZBUSA-J 0.000 description 1
NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
CBMCZKMIOZYAHS-NSCUHMNNSA-N [(e)-prop-1-enyl]boronic acid Chemical compound C\C=C\B(O)O CBMCZKMIOZYAHS-NSCUHMNNSA-N 0.000 description 1
239000000654 additive Substances 0.000 description 1
230000002411 adverse Effects 0.000 description 1
239000003513 alkali Substances 0.000 description 1
229910001516 alkali metal iodide Inorganic materials 0.000 description 1
239000012670 alkaline solution Substances 0.000 description 1
150000001412 amines Chemical class 0.000 description 1
150000008064 anhydrides Chemical class 0.000 description 1
PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
150000004056 anthraquinones Chemical class 0.000 description 1
229910052787 antimony Inorganic materials 0.000 description 1
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
229910052785 arsenic Inorganic materials 0.000 description 1
RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
125000003118 aryl group Chemical group 0.000 description 1
125000004429 atom Chemical group 0.000 description 1
JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
229910052797 bismuth Inorganic materials 0.000 description 1
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
239000004327 boric acid Substances 0.000 description 1
125000001246 bromo group Chemical group Br* 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
125000002843 carboxylic acid group Chemical group 0.000 description 1
239000003518 caustics Substances 0.000 description 1
239000012461 cellulose resin Substances 0.000 description 1
125000001309 chloro group Chemical group Cl* 0.000 description 1
KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
238000009833 condensation Methods 0.000 description 1
230000005494 condensation Effects 0.000 description 1
IQFVPQOLBLOTPF-HKXUKFGYSA-L congo red Chemical compound [Na+].[Na+].C1=CC=CC2=C(N)C(/N=N/C3=CC=C(C=C3)C3=CC=C(C=C3)/N=N/C3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)N)=CC(S([O-])(=O)=O)=C21 IQFVPQOLBLOTPF-HKXUKFGYSA-L 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
229920001577 copolymer Polymers 0.000 description 1
238000007334 copolymerization reaction Methods 0.000 description 1
229930003836 cresol Natural products 0.000 description 1
OBRMNDMBJQTZHV-UHFFFAOYSA-N cresol red Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C=C(C)C(O)=CC=2)=C1 OBRMNDMBJQTZHV-UHFFFAOYSA-N 0.000 description 1
230000020335 dealkylation Effects 0.000 description 1
238000006900 dealkylation reaction Methods 0.000 description 1
150000004985 diamines Chemical class 0.000 description 1
GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 1
CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
238000002845 discoloration Methods 0.000 description 1
238000004070 electrodeposition Methods 0.000 description 1
YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
238000005886 esterification reaction Methods 0.000 description 1
RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
125000001033 ether group Chemical group 0.000 description 1
JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
239000011521 glass Substances 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
239000000852 hydrogen donor Substances 0.000 description 1
238000003384 imaging method Methods 0.000 description 1
238000007654 immersion Methods 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
230000007774 longterm Effects 0.000 description 1
FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
229940107698 malachite green Drugs 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 1
STZCRXQWRGQSJD-GEEYTBSJSA-M methyl orange Chemical compound [Na+].C1=CC(N(C)C)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-GEEYTBSJSA-M 0.000 description 1
229940012189 methyl orange Drugs 0.000 description 1
150000007522 mineralic acids Chemical class 0.000 description 1
239000000178 monomer Substances 0.000 description 1
LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
ISGXOWLMGOPVPB-UHFFFAOYSA-N n,n-dibenzylaniline Chemical compound C=1C=CC=CC=1CN(C=1C=CC=CC=1)CC1=CC=CC=C1 ISGXOWLMGOPVPB-UHFFFAOYSA-N 0.000 description 1
OPBAOMCCUSNABO-UHFFFAOYSA-N n-(naphthalen-1-ylmethyl)aniline Chemical compound C=1C=CC2=CC=CC=C2C=1CNC1=CC=CC=C1 OPBAOMCCUSNABO-UHFFFAOYSA-N 0.000 description 1
DYFFAVRFJWYYQO-UHFFFAOYSA-N n-methyl-n-phenylaniline Chemical compound C=1C=CC=CC=1N(C)C1=CC=CC=C1 DYFFAVRFJWYYQO-UHFFFAOYSA-N 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
150000007524 organic acids Chemical class 0.000 description 1
150000002896 organic halogen compounds Chemical class 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
235000006408 oxalic acid Nutrition 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
229920002866 paraformaldehyde Polymers 0.000 description 1
150000002989 phenols Chemical class 0.000 description 1
229910052698 phosphorus Inorganic materials 0.000 description 1
239000011574 phosphorus Substances 0.000 description 1
239000000906 photoactive agent Substances 0.000 description 1
229920002120 photoresistant polymer Polymers 0.000 description 1
239000004033 plastic Substances 0.000 description 1
229920003023 plastic Polymers 0.000 description 1
239000002985 plastic film Substances 0.000 description 1
229920006255 plastic film Polymers 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
150000003142 primary aromatic amines Chemical class 0.000 description 1
238000012545 processing Methods 0.000 description 1
235000012950 rattan cane Nutrition 0.000 description 1
PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
RAPZEAPATHNIPO-UHFFFAOYSA-N risperidone Chemical compound FC1=CC=C2C(C3CCN(CC3)CCC=3C(=O)N4CCCCC4=NC=3C)=NOC2=C1 RAPZEAPATHNIPO-UHFFFAOYSA-N 0.000 description 1
150000003336 secondary aromatic amines Chemical class 0.000 description 1
RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
235000012239 silicon dioxide Nutrition 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000011734 sodium Substances 0.000 description 1
235000019795 sodium metasilicate Nutrition 0.000 description 1
239000007787 solid Substances 0.000 description 1
239000002904 solvent Substances 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
239000010959 steel Substances 0.000 description 1
238000000859 sublimation Methods 0.000 description 1
230000008022 sublimation Effects 0.000 description 1
150000003464 sulfur compounds Chemical class 0.000 description 1
238000001308 synthesis method Methods 0.000 description 1
PRZSXZWFJHEZBJ-UHFFFAOYSA-N thymol blue Chemical compound C1=C(O)C(C(C)C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C(=CC(O)=C(C(C)C)C=2)C)=C1C PRZSXZWFJHEZBJ-UHFFFAOYSA-N 0.000 description 1
ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
239000002676 xenobiotic agent Substances 0.000 description 1
239000011787 zinc oxide Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

JP26584384A 1984-12-17 1984-12-17 感光性組成物 Granted JPS61143748A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP26584384A JPS61143748A (ja)	1984-12-17	1984-12-17	感光性組成物

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP26584384A JPS61143748A (ja)	1984-12-17	1984-12-17	感光性組成物

Publications (2)

Publication Number	Publication Date
JPS61143748A true JPS61143748A (ja)	1986-07-01
JPH0481788B2 JPH0481788B2 (fr)	1992-12-24

Family

ID=17422837

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP26584384A Granted JPS61143748A (ja)	1984-12-17	1984-12-17	感光性組成物

Country Status (1)

Country	Link
JP (1)	JPS61143748A (fr)

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0341564A (ja) *	1989-07-10	1991-02-22	Matsushita Electric Ind Co Ltd	論理回路のシミュレーション方法
EP0565006A2 (fr)	1992-04-06	1993-10-13	Fuji Photo Film Co., Ltd.	Méthode pour la préparation d'une plaque présensibilisée
EP1627732A1 (fr)	2004-08-18	2006-02-22	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1640173A1 (fr)	2004-09-27	2006-03-29	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1690685A2 (fr)	2005-02-09	2006-08-16	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1705004A1 (fr)	2005-03-22	2006-09-27	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
WO2007136005A1 (fr)	2006-05-18	2007-11-29	Fujifilm Corporation	ProcÉdÉ et appareil pour le sÉchage d'une substance
EP1872943A2 (fr)	1999-05-21	2008-01-02	FUJIFILM Corporation	Composition photosensible et base de plaque d'impression planographique correspondant
EP1925447A1 (fr)	2002-09-17	2008-05-28	FUJIFILM Corporation	Matériau pour l'enregistrement d'images
EP2036721A1 (fr)	2000-11-30	2009-03-18	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042308A2 (fr)	2007-09-27	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042306A2 (fr)	2007-09-28	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique et procédé de production d'un copolymère utilisé avec celui-ci
EP2042310A2 (fr)	2007-09-27	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042305A2 (fr)	2007-09-28	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042340A2 (fr)	2007-09-27	2009-04-01	Fujifilm Corporation	Plaque d'impression lithographique, agent de protection de surface et procédé de clichage pour une plaque d'impression lithographique
WO2009063824A1 (fr)	2007-11-14	2009-05-22	Fujifilm Corporation	Procédé de séchage de film de revêtement et procédé pour produire un précurseur de plaque d'impression lithographique
EP2105690A2 (fr)	2008-03-26	2009-09-30	Fujifilm Corporation	Procédé et appareil de séchage
EP2106907A2 (fr)	2008-04-02	2009-10-07	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2161129A2 (fr)	2008-09-09	2010-03-10	Fujifilm Corporation	Précurseur de plaque d'impression lithographique photosensible pour laser à infrarouges
DE112008000778T5 (de)	2007-03-23	2010-04-08	Mitsubishi Paper Mills Limited	Wasserentwickelbares photoempfindliches Lithographiedruckplattenmaterial
EP2236293A2 (fr)	2009-03-31	2010-10-06	FUJIFILM Corporation	Précurseur de plaque d'impression lithographique
WO2011037005A1 (fr)	2009-09-24	2011-03-31	富士フイルム株式会社	Plaque originale d'impression lithographique
EP2354854A1 (fr)	2002-09-20	2011-08-10	FUJIFILM Corporation	Méthode pour la production d'une plaque d'impression lithographique
EP2357530A2 (fr)	2010-02-17	2011-08-17	Fujifilm Corporation	Procédé de fabrication de plaque d'impression planographique
WO2011102485A1 (fr)	2010-02-19	2011-08-25	富士フイルム株式会社	Procédé de fabrication d'une plaque d'impression lithographique
WO2011125913A1 (fr)	2010-03-31	2011-10-13	富士フイルム株式会社	Révélateur permettant de traiter un précurseur de plaque d'impression planographique, procédé de préparation d'une plaque d'impression planographique en utilisant le révélateur, et procédé d'impression
EP2381312A2 (fr)	2000-08-25	2011-10-26	Fujifilm Corporation	Développeur liquide alcalin pour plaque d'impression lithographique et procédé de préparation d' une plaque d'impression lithographique
DE112011101165T5 (de)	2010-03-29	2013-03-28	Mitsubishi Paper Mills Limited	Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial
EP2641738A2 (fr)	2012-03-23	2013-09-25	Fujifilm Corporation	Procédé de production de plaque dýimpression planographique et plaque dýimpression planographique
EP2644379A1 (fr)	2012-03-30	2013-10-02	FUJIFILM Corporation	Procédé de fabrication de plaque dýimpression planographique

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS59148784A (ja) *	1983-02-10	1984-08-25	Konishiroku Photo Ind Co Ltd	５―置換―２―ハロメチル―１，３，４―オキサジアゾール化合物及び該化合物を含有する光反応開始剤

1984
- 1984-12-17 JP JP26584384A patent/JPS61143748A/ja active Granted

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS59148784A (ja) *	1983-02-10	1984-08-25	Konishiroku Photo Ind Co Ltd	５―置換―２―ハロメチル―１，３，４―オキサジアゾール化合物及び該化合物を含有する光反応開始剤

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0341564A (ja) *	1989-07-10	1991-02-22	Matsushita Electric Ind Co Ltd	論理回路のシミュレーション方法
EP0565006A2 (fr)	1992-04-06	1993-10-13	Fuji Photo Film Co., Ltd.	Méthode pour la préparation d'une plaque présensibilisée
EP1872943A2 (fr)	1999-05-21	2008-01-02	FUJIFILM Corporation	Composition photosensible et base de plaque d'impression planographique correspondant
EP2381312A2 (fr)	2000-08-25	2011-10-26	Fujifilm Corporation	Développeur liquide alcalin pour plaque d'impression lithographique et procédé de préparation d' une plaque d'impression lithographique
EP2036721A1 (fr)	2000-11-30	2009-03-18	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP1925447A1 (fr)	2002-09-17	2008-05-28	FUJIFILM Corporation	Matériau pour l'enregistrement d'images
EP2354854A1 (fr)	2002-09-20	2011-08-10	FUJIFILM Corporation	Méthode pour la production d'une plaque d'impression lithographique
EP1627732A1 (fr)	2004-08-18	2006-02-22	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1640173A1 (fr)	2004-09-27	2006-03-29	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1690685A2 (fr)	2005-02-09	2006-08-16	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
EP1705004A1 (fr)	2005-03-22	2006-09-27	Fuji Photo Film Co., Ltd.	Précurseur de plaque d'impression planographique
WO2007136005A1 (fr)	2006-05-18	2007-11-29	Fujifilm Corporation	ProcÉdÉ et appareil pour le sÉchage d'une substance
DE112008000778T5 (de)	2007-03-23	2010-04-08	Mitsubishi Paper Mills Limited	Wasserentwickelbares photoempfindliches Lithographiedruckplattenmaterial
EP2042340A2 (fr)	2007-09-27	2009-04-01	Fujifilm Corporation	Plaque d'impression lithographique, agent de protection de surface et procédé de clichage pour une plaque d'impression lithographique
EP2042310A2 (fr)	2007-09-27	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042308A2 (fr)	2007-09-27	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2042306A2 (fr)	2007-09-28	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique et procédé de production d'un copolymère utilisé avec celui-ci
EP2042305A2 (fr)	2007-09-28	2009-04-01	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
WO2009063824A1 (fr)	2007-11-14	2009-05-22	Fujifilm Corporation	Procédé de séchage de film de revêtement et procédé pour produire un précurseur de plaque d'impression lithographique
EP2105690A2 (fr)	2008-03-26	2009-09-30	Fujifilm Corporation	Procédé et appareil de séchage
EP2106907A2 (fr)	2008-04-02	2009-10-07	FUJIFILM Corporation	Précurseur de plaque d'impression planographique
EP2161129A2 (fr)	2008-09-09	2010-03-10	Fujifilm Corporation	Précurseur de plaque d'impression lithographique photosensible pour laser à infrarouges
EP2236293A2 (fr)	2009-03-31	2010-10-06	FUJIFILM Corporation	Précurseur de plaque d'impression lithographique
WO2011037005A1 (fr)	2009-09-24	2011-03-31	富士フイルム株式会社	Plaque originale d'impression lithographique
EP2357530A2 (fr)	2010-02-17	2011-08-17	Fujifilm Corporation	Procédé de fabrication de plaque d'impression planographique
WO2011102485A1 (fr)	2010-02-19	2011-08-25	富士フイルム株式会社	Procédé de fabrication d'une plaque d'impression lithographique
DE112011101165T5 (de)	2010-03-29	2013-03-28	Mitsubishi Paper Mills Limited	Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial
WO2011125913A1 (fr)	2010-03-31	2011-10-13	富士フイルム株式会社	Révélateur permettant de traiter un précurseur de plaque d'impression planographique, procédé de préparation d'une plaque d'impression planographique en utilisant le révélateur, et procédé d'impression
EP2641738A2 (fr)	2012-03-23	2013-09-25	Fujifilm Corporation	Procédé de production de plaque dýimpression planographique et plaque dýimpression planographique
EP2644379A1 (fr)	2012-03-30	2013-10-02	FUJIFILM Corporation	Procédé de fabrication de plaque dýimpression planographique

Also Published As

Publication number	Publication date
JPH0481788B2 (fr)	1992-12-24

Legal Events

Date	Code	Title	Description
2003-12-24	LAPS	Cancellation because of no payment of annual fees

Publication	Publication Date	Title
JPS61143748A (ja)	1986-07-01	感光性組成物
JPS61151644A (ja)	1986-07-10	感光性組成物
US4279982A (en)	1981-07-21	Photosensitive compositions
US4232106A (en)	1980-11-04	Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors
JPH0342462B2 (fr)	1991-06-27
US5064741A (en)	1991-11-12	Positive working light-sensitive composition containing a free radical generator and a discoloring agent
US4708925A (en)	1987-11-24	Photosolubilizable compositions containing novolac phenolic resin
US4511645A (en)	1985-04-16	Photosensitive plate for lithographic printing plate
JPS6088942A (ja)	1985-05-18	感光性組成物
JPS60239736A (ja)	1985-11-28	感光性組成物
JPS60177340A (ja)	1985-09-11	感光性組成物
EP0549339B1 (fr)	1997-05-14	Composition photosensible
US4399210A (en)	1983-08-16	Photosensitive compositions
JPS60138544A (ja)	1985-07-23	感光性組成物
JPS62175735A (ja)	1987-08-01	感光性組成物
JPH0157777B2 (fr)	1989-12-07
US5645969A (en)	1997-07-08	Photosensitive composition and photosensitive lithographic printing plate
JP2565331B2 (ja)	1996-12-18	感光性組成物
JPS6224242A (ja)	1987-02-02	感光性組成物
JP3321595B2 (ja)	2002-09-03	感光性平版印刷版
JPH05232695A (ja)	1993-09-10	感光性組成物
JPS63214747A (ja)	1988-09-07	感光性組成物
JPH05341519A (ja)	1993-12-24	感光性組成物
JPH0296759A (ja)	1990-04-09	感光性平版印刷版
JPS6238453A (ja)	1987-02-19	光可溶化組成物

JPS61143748A - 感光性組成物 - Google Patents

Info

Links

Classifications

Landscapes

Priority Applications (1)

Applications Claiming Priority (1)

Publications (2)

Family

ID=17422837

Family Applications (1)

Country Status (1)

Cited By (30)

Citations (1)

Patent Citations (1)

Cited By (30)

Also Published As

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Legal Events