JPS6159658B2 - - Google Patents

Info

Publication number
JPS6159658B2
JPS6159658B2 JP54098949A JP9894979A JPS6159658B2 JP S6159658 B2 JPS6159658 B2 JP S6159658B2 JP 54098949 A JP54098949 A JP 54098949A JP 9894979 A JP9894979 A JP 9894979A JP S6159658 B2 JPS6159658 B2 JP S6159658B2
Authority
JP
Japan
Prior art keywords
etching
wiring layer
electrode
semiconductor substrate
electrode wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54098949A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5623752A (en
Inventor
Tooru Ookuma
Kenji Mitsui
Morio Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP9894979A priority Critical patent/JPS5623752A/ja
Publication of JPS5623752A publication Critical patent/JPS5623752A/ja
Publication of JPS6159658B2 publication Critical patent/JPS6159658B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP9894979A 1979-08-01 1979-08-01 Manufacture of semiconductor device Granted JPS5623752A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9894979A JPS5623752A (en) 1979-08-01 1979-08-01 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9894979A JPS5623752A (en) 1979-08-01 1979-08-01 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5623752A JPS5623752A (en) 1981-03-06
JPS6159658B2 true JPS6159658B2 (de) 1986-12-17

Family

ID=14233344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9894979A Granted JPS5623752A (en) 1979-08-01 1979-08-01 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5623752A (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57186335A (en) * 1981-05-12 1982-11-16 Nippon Telegr & Teleph Corp <Ntt> Forming method for pattern
JPS60221586A (ja) * 1985-03-29 1985-11-06 Nippon Telegr & Teleph Corp <Ntt> プラズマエツチング方法
JPS6393553A (ja) * 1986-10-03 1988-04-23 Mitsubishi Metal Corp 芯無研削装置
JPH01240262A (ja) * 1988-03-18 1989-09-25 Honda Motor Co Ltd 非円形内面研削方法
JP2650178B2 (ja) * 1992-12-05 1997-09-03 ヤマハ株式会社 ドライエッチング方法及び装置
US6846424B2 (en) * 1997-11-10 2005-01-25 Advanced Technology Materials, Inc. Plasma-assisted dry etching of noble metal-based materials

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1499857A (en) * 1975-09-18 1978-02-01 Standard Telephones Cables Ltd Glow discharge etching

Also Published As

Publication number Publication date
JPS5623752A (en) 1981-03-06

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