JPS6473658A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS6473658A JPS6473658A JP62231610A JP23161087A JPS6473658A JP S6473658 A JPS6473658 A JP S6473658A JP 62231610 A JP62231610 A JP 62231610A JP 23161087 A JP23161087 A JP 23161087A JP S6473658 A JPS6473658 A JP S6473658A
- Authority
- JP
- Japan
- Prior art keywords
- metal layer
- insulating
- coil
- insulating layer
- magnetic substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/0006—Printed inductances
- H01F17/0033—Printed inductances with the coil helically wound around a magnetic core
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To make high integration easy by a method wherein end parts of each strip of a first metal layer and end parts of each strip of a second metal layer are connected individually via through holes made in a second insulating layer and a third insulating layer in such a way that the first metal layer and the second metal layer form a coil and that a magnetic substance is situated at the inside of the coil. CONSTITUTION:A silicon nitride film as a first insulating layer 6 is formed on the surface; two or more parallel strip of a first metal layer 8 are formed on it. A silicon nitride film as a second insulating film 7 is formed on the first metal layer 8 and the first insulating layer 6; a ferrite as a magnetic substance 12 is formed on the second insulating film 7 and is patterned to be a belt shape. Then, a silicon nitride film as a third insulating layer 9 is formed on the strip-shaped magnetic substance 12 and the second insulating layer 7; a through hole 70 is made in the second and the third insulating layers 7, 9 in a position that the first metal layer 8 and a second metal layer 11 form a coil and that the magnetic substance 72 is situated at the inside of the coil; two or more strips of the second metal layer 11 which are arranged by forming a small angle with reference to the first metal layer 8 at intervals are formed on the third insulating layer. By this setup, a square-shaped coil which has the magnetic substance at the inside can be formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62231610A JPS6473658A (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62231610A JPS6473658A (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6473658A true JPS6473658A (en) | 1989-03-17 |
Family
ID=16926210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62231610A Pending JPS6473658A (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6473658A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019220862A1 (en) * | 2018-05-18 | 2019-11-21 | 株式会社村田製作所 | Inductor and method for producing same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60136363A (en) * | 1983-12-26 | 1985-07-19 | Toshiba Corp | Semiconductor device |
-
1987
- 1987-09-14 JP JP62231610A patent/JPS6473658A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60136363A (en) * | 1983-12-26 | 1985-07-19 | Toshiba Corp | Semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019220862A1 (en) * | 2018-05-18 | 2019-11-21 | 株式会社村田製作所 | Inductor and method for producing same |
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