NL1002904C2 - Bekledingen en registratie-materialen die zijn gestabiliseerd met benzotriazool-UV-absorptiemiddelen. - Google Patents

Bekledingen en registratie-materialen die zijn gestabiliseerd met benzotriazool-UV-absorptiemiddelen. Download PDF

Info

Publication number: NL1002904C2
Authority: NL; Netherlands
Prior art keywords: tert; composition; benzotriazole; butyl; hydroxy
Prior art date: 1995-04-19

Application number

NL1002904A

Other languages

English (en)

Dutch (nl)

Other versions

NL1002904A1 (nl

Inventor

David George Leppard

Mark Stephen Holt

Ramanathan Ravichandran

Roland Arthur Edwin Winter

Volker Hartmut Von Ahn

Joseph Edmund Babiarz

Original Assignee

Ciba Geigy Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1995-04-19

Filing date

1996-04-19

Publication date

1998-04-10

1996-04-19 Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag

1996-10-22 Publication of NL1002904A1 publication Critical patent/NL1002904A1/xx

1998-04-10 Application granted granted Critical

1998-04-10 Publication of NL1002904C2 publication Critical patent/NL1002904C2/nl

Links

239000006096 absorbing agent Substances 0.000 title claims description 53
QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 title claims description 38
239000012964 benzotriazole Substances 0.000 title claims description 38
239000000463 material Substances 0.000 title claims description 38
238000000576 coating method Methods 0.000 title description 51
-1 tert-octyl Chemical group 0.000 claims description 74
239000000203 mixture Substances 0.000 claims description 42
239000007787 solid Substances 0.000 claims description 33
239000004922 lacquer Substances 0.000 claims description 28
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NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 17
125000000217 alkyl group Chemical group 0.000 claims description 16
239000003381 stabilizer Substances 0.000 claims description 15
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UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
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JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 5
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238000006068 polycondensation reaction Methods 0.000 description 6
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XUQNLOIVFHUMTR-UHFFFAOYSA-N 2-[[2-hydroxy-5-nonyl-3-(1-phenylethyl)phenyl]methyl]-4-nonyl-6-(1-phenylethyl)phenol Chemical compound OC=1C(C(C)C=2C=CC=CC=2)=CC(CCCCCCCCC)=CC=1CC(C=1O)=CC(CCCCCCCCC)=CC=1C(C)C1=CC=CC=C1 XUQNLOIVFHUMTR-UHFFFAOYSA-N 0.000 description 4
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UZUNCLSDTUBVCN-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-6-(2-phenylpropan-2-yl)-4-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound C=1C(C(C)(C)CC(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C(O)C=1C(C)(C)C1=CC=CC=C1 UZUNCLSDTUBVCN-UHFFFAOYSA-N 0.000 description 3
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NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
150000002596 lactones Chemical class 0.000 description 1
150000007517 lewis acids Chemical class 0.000 description 1
239000000314 lubricant Substances 0.000 description 1
WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
239000011159 matrix material Substances 0.000 description 1
239000000155 melt Substances 0.000 description 1
239000006078 metal deactivator Substances 0.000 description 1
229910000000 metal hydroxide Inorganic materials 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
150000004702 methyl esters Chemical class 0.000 description 1
239000010445 mica Substances 0.000 description 1
229910052618 mica group Inorganic materials 0.000 description 1
230000005012 migration Effects 0.000 description 1
238000013508 migration Methods 0.000 description 1
238000002156 mixing Methods 0.000 description 1
QITVMFSGIKQAFH-UHFFFAOYSA-N n'-(2,2,6,6-tetramethylpiperidin-1-yl)hexane-1,6-diamine Chemical compound CC1(C)CCCC(C)(C)N1NCCCCCCN QITVMFSGIKQAFH-UHFFFAOYSA-N 0.000 description 1
YIMHRDBSVCPJOV-UHFFFAOYSA-N n'-(2-ethoxyphenyl)-n-(2-ethylphenyl)oxamide Chemical compound CCOC1=CC=CC=C1NC(=O)C(=O)NC1=CC=CC=C1CC YIMHRDBSVCPJOV-UHFFFAOYSA-N 0.000 description 1
GTIBACHAUHDNPH-UHFFFAOYSA-N n,n'-bis(benzylideneamino)oxamide Chemical compound C=1C=CC=CC=1C=NNC(=O)C(=O)NN=CC1=CC=CC=C1 GTIBACHAUHDNPH-UHFFFAOYSA-N 0.000 description 1
OTXXCIYKATWWQI-UHFFFAOYSA-N n,n-dihexadecylhydroxylamine Chemical compound CCCCCCCCCCCCCCCCN(O)CCCCCCCCCCCCCCCC OTXXCIYKATWWQI-UHFFFAOYSA-N 0.000 description 1
WQAJFRSBFZAUPB-UHFFFAOYSA-N n,n-dioctylhydroxylamine Chemical compound CCCCCCCCN(O)CCCCCCCC WQAJFRSBFZAUPB-UHFFFAOYSA-N 0.000 description 1
YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
ZRPOKHXBOZQSOX-UHFFFAOYSA-N n-heptadecyl-n-octadecylhydroxylamine Chemical compound CCCCCCCCCCCCCCCCCCN(O)CCCCCCCCCCCCCCCCC ZRPOKHXBOZQSOX-UHFFFAOYSA-N 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
239000012299 nitrogen atmosphere Substances 0.000 description 1
239000002667 nucleating agent Substances 0.000 description 1
239000012044 organic layer Substances 0.000 description 1
239000007800 oxidant agent Substances 0.000 description 1
150000002924 oxiranes Chemical class 0.000 description 1
125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
230000000149 penetrating effect Effects 0.000 description 1
WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
229960000969 phenyl salicylate Drugs 0.000 description 1
150000003018 phosphorus compounds Chemical class 0.000 description 1
239000002985 plastic film Substances 0.000 description 1
229920006255 plastic film Polymers 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
229920000647 polyepoxide Polymers 0.000 description 1
239000004848 polyfunctional curative Substances 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
239000002897 polymer film coating Substances 0.000 description 1
229920000307 polymer substrate Polymers 0.000 description 1
229920005862 polyol Polymers 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
239000001267 polyvinylpyrrolidone Substances 0.000 description 1
229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
230000001376 precipitating effect Effects 0.000 description 1
125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
238000007639 printing Methods 0.000 description 1
229940090181 propyl acetate Drugs 0.000 description 1
125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical group COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
239000011241 protective layer Substances 0.000 description 1
238000007342 radical addition reaction Methods 0.000 description 1
150000003254 radicals Chemical class 0.000 description 1
239000011541 reaction mixture Substances 0.000 description 1
238000010992 reflux Methods 0.000 description 1
230000001105 regulatory effect Effects 0.000 description 1
239000012744 reinforcing agent Substances 0.000 description 1
229940066675 ricinoleate Drugs 0.000 description 1
229910052895 riebeckite Inorganic materials 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
239000004576 sand Substances 0.000 description 1
229920006395 saturated elastomer Polymers 0.000 description 1
239000012047 saturated solution Substances 0.000 description 1
DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
150000004760 silicates Chemical class 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1
159000000000 sodium salts Chemical class 0.000 description 1
239000000600 sorbitol Substances 0.000 description 1
230000006641 stabilisation Effects 0.000 description 1
238000011105 stabilization Methods 0.000 description 1
238000003756 stirring Methods 0.000 description 1
KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
239000006188 syrup Substances 0.000 description 1
235000020357 syrup Nutrition 0.000 description 1
239000000454 talc Substances 0.000 description 1
229910052623 talc Inorganic materials 0.000 description 1
KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
NZNAAUDJKMURFU-UHFFFAOYSA-N tetrakis(2,2,6,6-tetramethylpiperidin-4-yl) butane-1,2,3,4-tetracarboxylate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CC(C(=O)OC1CC(C)(C)NC(C)(C)C1)C(C(=O)OC1CC(C)(C)NC(C)(C)C1)CC(=O)OC1CC(C)(C)NC(C)(C)C1 NZNAAUDJKMURFU-UHFFFAOYSA-N 0.000 description 1
125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
CNUJLMSKURPSHE-UHFFFAOYSA-N trioctadecyl phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC CNUJLMSKURPSHE-UHFFFAOYSA-N 0.000 description 1
WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
150000003672 ureas Chemical class 0.000 description 1
NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
229910052720 vanadium Inorganic materials 0.000 description 1
229920001567 vinyl ester resin Polymers 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
150000003751 zinc Chemical class 0.000 description 1
239000011701 zinc Substances 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Polymers & Plastics (AREA)
Chemical Kinetics & Catalysis (AREA)
Life Sciences & Earth Sciences (AREA)
Wood Science & Technology (AREA)
Health & Medical Sciences (AREA)
Optics & Photonics (AREA)
Medicinal Chemistry (AREA)
Compositions Of Macromolecular Compounds (AREA)
Paints Or Removers (AREA)
Laminated Bodies (AREA)
Inks, Pencil-Leads, Or Crayons (AREA)
Ink Jet Recording Methods And Recording Media Thereof (AREA)
Heat Sensitive Colour Forming Recording (AREA)
Ink Jet (AREA)
Thermal Transfer Or Thermal Recording In General (AREA)
Application Of Or Painting With Fluid Materials (AREA)
Optical Record Carriers And Manufacture Thereof (AREA)

NL1002904A 1995-04-19 1996-04-19 Bekledingen en registratie-materialen die zijn gestabiliseerd met benzotriazool-UV-absorptiemiddelen. NL1002904C2 (nl)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US42484395		1995-04-19
US08/424,843 US5574166A (en)	1995-04-19	1995-04-19	Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole

Publications (2)

Publication Number	Publication Date
NL1002904A1 NL1002904A1 (nl)	1996-10-22
NL1002904C2 true NL1002904C2 (nl)	1998-04-10

Family

ID=23684097

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NL1002904A NL1002904C2 (nl)	1995-04-19	1996-04-19	Bekledingen en registratie-materialen die zijn gestabiliseerd met benzotriazool-UV-absorptiemiddelen.

Country Status (18)

Country	Link
US (4)	US5574166A (de)
EP (1)	EP0738718A1 (de)
JP (2)	JP3309153B2 (de)
KR (2)	KR100426626B1 (de)
CN (2)	CN1066181C (de)
AT (1)	AT405936B (de)
AU (2)	AU707202B2 (de)
BE (1)	BE1010550A3 (de)
BR (2)	BR9601991A (de)
CA (2)	CA2174411C (de)
DE (1)	DE19615000A1 (de)
ES (1)	ES2130930B1 (de)
FR (1)	FR2733239B1 (de)
GB (1)	GB2299957B (de)
IT (1)	IT1283615B1 (de)
NL (1)	NL1002904C2 (de)
SE (1)	SE509606C2 (de)
TW (1)	TW419497B (de)

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US6166218A (en)	1996-11-07	2000-12-26	Ciba Specialty Chemicals Corporation	Benzotriazole UV absorbers having enhanced durability
FR2755444B1 (fr) *	1996-11-07	2004-10-08	Ciba Sc Holding Ag	Composition de revetement comprenant un compose stabilisant ledit compose et son utilisation
US5977219A (en) *	1997-10-30	1999-11-02	Ciba Specialty Chemicals Corporation	Benzotriazole UV absorbers having enhanced durability
EP0975421B1 (de)	1997-04-15	2014-06-18	Basf Se	Verfahren zur herstellung von wenig staubenden stabilisatoren
DE19723779A1 (de) *	1997-06-06	1998-12-10	Agfa Gevaert Ag	Inkjet-System
US6383716B1 (en)	1997-08-22	2002-05-07	Asahi Kasei Kabushiki Kaisha	Stable photosensitive resin composition
WO2000049462A1 (fr) *	1999-02-19	2000-08-24	Asahi Kasei Kogyo Kabushiki Kaisha	Composition de resine photosensible stable
JP3448851B2 (ja) *	1997-11-28	2003-09-22	タキロン株式会社	添加剤含有樹脂成形品及びその製造方法
US5948150A (en) *	1998-05-05	1999-09-07	Hewlett-Packard Company	Composition to improve colorfastness of a printed image
AU5856099A (en) *	1998-09-09	2000-03-27	Ciba Specialty Chemicals Holding Inc.	Photostable chromophore system
EP1046670B1 (de) *	1999-04-23	2003-07-09	Nippon Mitsubishi Oil Corporation	UV-absorbierende Harzzusammensetzung
US6187845B1 (en) *	1999-05-03	2001-02-13	Ciba Specialty Chemicals Corporation	Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom
US6268415B1 (en)	1999-05-03	2001-07-31	Ciba Specialty Chemicals Corporation	Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom
US6245915B1 (en)	1999-05-03	2001-06-12	Ciba Specialty Chemicals Corporation	Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety
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AU774383B2 (en) *	1999-07-12	2004-06-24	Ciba Specialty Chemicals Holding Inc.	Use of mixtures of micropigments for preventing tanning and for lightening skin and hair
CA2396221C (en) *	2000-02-01	2010-03-23	Ciba Specialty Chemicals Holding Inc.	Method of content protection with durable uv absorbers
US6392056B1 (en)	2000-08-03	2002-05-21	Ciba Specialty Chemical Corporation	2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith
US6451887B1 (en) *	2000-08-03	2002-09-17	Ciba Specialty Chemicals Corporation	Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith
US6387992B1 (en)	2000-11-27	2002-05-14	Ciba Specialty Chemicals Corporation	Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith
US6649770B1 (en)	2000-11-27	2003-11-18	Ciba Specialty Chemicals Corporation	Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof
NZ527246A (en) *	2001-01-16	2004-12-24	Ciba Sc Holding Ag	Water soluble hindered amine based ink-jet ink and recording material
JP4993421B2 (ja) *	2001-06-07	2012-08-08	株式会社Ａｄｅｋａ	合成樹脂組成物
EP1476503A1 (de) *	2002-02-19	2004-11-17	Ciba SC Holding AG	Hydroxyphenylbenzotriazol uv-absorber enthaltende behälter oder filme zum schutz des inhalts vor den schädlichen wirkungen von uv-strahlung
US20050209252A1 (en) *	2002-03-29	2005-09-22	Che-Ming Teng	Cancer treatment
EP2265092B1 (de)	2002-06-06	2018-03-14	UDC Ireland Limited	Elektrolumineszierende Vorrichtung
DE10228186A1 (de) *	2002-06-24	2004-01-22	Merck Patent Gmbh	UV-stabilisierte Partikel
KR100950626B1 (ko) *	2002-06-24	2010-04-01	메르크 파텐트 게엠베하	Ｕｖ-안정화 입자
DE10243438A1 (de) *	2002-09-18	2004-03-25	Merck Patent Gmbh	Oberflächenmodifizierte Effektpigmente
JP2006510773A (ja) *	2002-12-20	2006-03-30	チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド	インクジェット及び記録材料
EP1587887A1 (de) *	2003-01-29	2005-10-26	Ciba SC Holding AG	Tintenstrahltinte undaufnahmematerial
KR101114272B1 (ko)	2003-02-26	2012-03-28	시바 홀딩 인크	수 혼화성의 입체적으로 속박된 하이드록시 치환된 알콕시아민
US7153588B2 (en) *	2003-05-30	2006-12-26	3M Innovative Properties Company	UV resistant naphthalate polyester articles
US6974850B2 (en) *	2003-05-30	2005-12-13	3M Innovative Properties Company	Outdoor weatherable photopolymerizable coatings
JP4018674B2 (ja) *	2003-08-04	2007-12-05	キヤノン株式会社	インク用被記録媒体の製造方法
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Also Published As

Publication number	Publication date
JPH08290112A (ja)	1996-11-05
CN1066181C (zh)	2001-05-23
CA2174412A1 (en)	1996-10-20
US5607987A (en)	1997-03-04
NL1002904A1 (nl)	1996-10-22
ES2130930B1 (es)	2000-03-01
EP0738718A1 (de)	1996-10-23
CN1140168A (zh)	1997-01-15
SE9601345D0 (sv)	1996-04-10
KR100426626B1 (ko)	2004-07-12
BR9601991A (pt)	1998-04-07
SE509606C2 (sv)	1999-02-15
KR100378233B1 (ko)	2003-06-12
SE9601345L (sv)	1996-10-20
ES2130930A1 (es)	1999-07-01
BE1010550A3 (fr)	1998-10-06
CA2174411A1 (en)	1996-10-20
CN1140187A (zh)	1997-01-15
GB2299957A (en)	1996-10-23
KR960037748A (ko)	1996-11-19
IT1283615B1 (it)	1998-04-22
GB2299957B (en)	1997-11-12
AT405936B (de)	1999-12-27
TW419497B (en)	2001-01-21
AU706957B2 (en)	1999-07-01
US5574166A (en)	1996-11-12
US5554760A (en)	1996-09-10
DE19615000A1 (de)	1996-10-24
ATA70596A (de)	1999-05-15
ITMI960751A1 (it)	1997-10-18
FR2733239A1 (fr)	1996-10-25
JPH08291151A (ja)	1996-11-05
AU5073196A (en)	1996-10-31
CN1059899C (zh)	2000-12-27
ITMI960751A0 (de)	1996-04-18
AU707202B2 (en)	1999-07-08
BR9601992A (pt)	1998-10-06
CA2174411C (en)	2007-02-20
US5563242A (en)	1996-10-08
AU5078496A (en)	1996-10-31
JP3309153B2 (ja)	2002-07-29
GB9607427D0 (en)	1996-06-12
KR960037664A (ko)	1996-11-19
FR2733239B1 (fr)	2004-10-01

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Date	Code	Title	Description
1996-12-02	AD1A	A request for search or an international type search has been filed
1997-03-03	CD	Transfer of rights (laid open patent application)	Free format text: CIBA SC HOLDING AG
1997-06-02	DD	Changes of names of applicants of laid open patent applications	Free format text: CIBA SPECIALTY CHEMICALS HOLDING INC.
1998-06-02	PD2B	A search report has been drawn up
2010-01-04	VD1	Lapsed due to non-payment of the annual fee	Effective date: 20091101

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