SG38875A1 - A photoresist composition comprising a polyfunctional vinyl ether compound - Google Patents

A photoresist composition comprising a polyfunctional vinyl ether compound

Info

Publication number
SG38875A1
SG38875A1 SG1995001307A SG1995001307A SG38875A1 SG 38875 A1 SG38875 A1 SG 38875A1 SG 1995001307 A SG1995001307 A SG 1995001307A SG 1995001307 A SG1995001307 A SG 1995001307A SG 38875 A1 SG38875 A1 SG 38875A1
Authority
SG
Singapore
Prior art keywords
vinyl ether
photoresist composition
ether compound
polyfunctional vinyl
polyfunctional
Prior art date
Application number
SG1995001307A
Other languages
English (en)
Inventor
Shigeo Hozumi
Hiroya Nakagawa
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP21766594A external-priority patent/JPH0882929A/ja
Priority claimed from JP21766394A external-priority patent/JPH0882927A/ja
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of SG38875A1 publication Critical patent/SG38875A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
SG1995001307A 1994-09-12 1995-09-08 A photoresist composition comprising a polyfunctional vinyl ether compound SG38875A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP21766594A JPH0882929A (ja) 1994-09-12 1994-09-12 フォトレジスト樹脂組成物
JP21766394A JPH0882927A (ja) 1994-09-12 1994-09-12 ネガティブ型フォトレジスト樹脂組成物

Publications (1)

Publication Number Publication Date
SG38875A1 true SG38875A1 (en) 1997-04-17

Family

ID=26522151

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1995001307A SG38875A1 (en) 1994-09-12 1995-09-08 A photoresist composition comprising a polyfunctional vinyl ether compound

Country Status (6)

Country Link
US (1) US5719008A (de)
EP (1) EP0704765B1 (de)
KR (1) KR960011553A (de)
DE (1) DE69509183T2 (de)
SG (1) SG38875A1 (de)
TW (1) TW339421B (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5910394A (en) 1997-06-18 1999-06-08 Shipley Company, L.L.C. I-line photoresist compositions
JP4156784B2 (ja) 2000-07-25 2008-09-24 富士フイルム株式会社 ネガ型画像記録材料及び画像形成方法
JP2002082429A (ja) * 2000-09-08 2002-03-22 Fuji Photo Film Co Ltd ネガ型画像記録材料
US7148265B2 (en) * 2002-09-30 2006-12-12 Rohm And Haas Electronic Materials Llc Functional polymer
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
US8911921B2 (en) 2007-05-11 2014-12-16 Ciba Corporation Oxime ester photoinitiators
JP5535064B2 (ja) 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
CN102361896B (zh) 2009-03-23 2015-10-07 巴斯夫欧洲公司 光致抗蚀剂组合物
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
CN103153952B (zh) 2010-10-05 2016-07-13 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
CN103443072B (zh) 2011-01-28 2016-05-18 巴斯夫欧洲公司 包含肟磺酸酯作为热固化剂的可聚合组合物
EP2788325B1 (de) 2011-12-07 2016-08-10 Basf Se Oximester-fotoinitiatoren
KR102013541B1 (ko) 2012-05-09 2019-08-22 바스프 에스이 옥심 에스테르 광개시제
JP6469669B2 (ja) 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
KR102378364B1 (ko) * 2014-07-16 2022-03-25 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 표시장치용 기판의 제조방법
EP3186226B1 (de) 2014-08-29 2020-06-17 Basf Se Oximsulfonatderivate
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
TWI894219B (zh) 2020-03-04 2025-08-21 德商巴地斯顏料化工廠 肟酯光起始劑
WO2026057274A1 (en) 2024-09-13 2026-03-19 Basf Se Oxime ester photoinitiators

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4518788A (en) * 1981-03-13 1985-05-21 General Electric Company Aromatic polyvinyl ethers and heat curable molding compositions obtained therefrom
US4705887A (en) * 1981-03-13 1987-11-10 General Electric Company Aromatic polyvinyl ethers and heat curable molding compositions obtained therefrom
US4388450A (en) * 1981-03-13 1983-06-14 General Electric Company Aromatic polyvinyl ethers and heat curable molding compositions obtained therefrom
DE3135200A1 (de) * 1981-09-05 1983-03-17 L. & C. Steinmüller GmbH, 5270 Gummersbach Verfahren zur behandlung von endprodukten aus der rauchgasentschwefelung
JPS5881402U (ja) * 1981-11-26 1983-06-02 シャープ株式会社 熱風循環式調理器
JPS607165A (ja) 1983-06-24 1985-01-14 Sumitomo Electric Ind Ltd ボンディングワイヤ
JPS6053517A (ja) * 1983-09-05 1985-03-27 Agency Of Ind Science & Technol 反応性重合体
JPS6071657A (ja) * 1983-09-27 1985-04-23 Agency Of Ind Science & Technol 感光性樹脂組成物
DE3766315D1 (de) * 1986-08-06 1991-01-03 Ciba Geigy Ag Negativ-photoresist auf basis von polyphenolen und epoxidverbindungen oder vinylethern.
US4994346A (en) * 1987-07-28 1991-02-19 Ciba-Geigy Corporation Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
DE3817012A1 (de) * 1988-05-19 1989-11-30 Basf Ag Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern
JP2505033B2 (ja) * 1988-11-28 1996-06-05 東京応化工業株式会社 電子線レジスト組成物及びそれを用いた微細パタ―ンの形成方法
JPH03260651A (ja) * 1990-03-12 1991-11-20 Konica Corp 感光性組成物
US5070117A (en) * 1990-06-25 1991-12-03 Loctite Corporation Aromatic vinyl ether compounds and compositions, and method of making the same
US5004842A (en) * 1990-06-25 1991-04-02 Loctite Corporation Aromatic vinyl ether compounds and compositions, and method of making the same
US5362822A (en) * 1990-08-03 1994-11-08 The Dow Chemical Company Mesogenic adducts
JP2764480B2 (ja) * 1991-05-17 1998-06-11 日本化薬株式会社 カラーフィルター用光重合組成物
WO1994003535A1 (fr) * 1992-08-06 1994-02-17 Asahi Kasei Kogyo Kabushiki Kaisha Composition resineuse
JPH0667431A (ja) * 1992-08-20 1994-03-11 Sumitomo Chem Co Ltd ネガ型フォトレジスト組成物
CA2115333A1 (en) * 1993-02-16 1994-08-17 Shigeo Hozumi Polyfunctional vinyl ether compounds and photoresist resin composition containing the same
JPH0728241A (ja) * 1993-07-12 1995-01-31 Sumitomo Chem Co Ltd カラーフィルター用ネガティブ型フォトレジスト

Also Published As

Publication number Publication date
US5719008A (en) 1998-02-17
KR960011553A (ko) 1996-04-20
DE69509183D1 (de) 1999-05-27
EP0704765B1 (de) 1999-04-21
TW339421B (en) 1998-09-01
EP0704765A1 (de) 1996-04-03
DE69509183T2 (de) 1999-09-09

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