ATE78364T1 - Feldeffekttransistor. - Google Patents
Feldeffekttransistor.Info
- Publication number
- ATE78364T1 ATE78364T1 AT86309266T AT86309266T ATE78364T1 AT E78364 T1 ATE78364 T1 AT E78364T1 AT 86309266 T AT86309266 T AT 86309266T AT 86309266 T AT86309266 T AT 86309266T AT E78364 T1 ATE78364 T1 AT E78364T1
- Authority
- AT
- Austria
- Prior art keywords
- subregion
- conductivity type
- region
- field effect
- effect transistor
- Prior art date
Links
- 230000005669 field effect Effects 0.000 title abstract 2
- 238000005513 bias potential Methods 0.000 abstract 2
- 230000005684 electric field Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0163—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including enhancement-mode IGFETs and depletion-mode IGFETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Non-Volatile Memory (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US80516285A | 1985-12-04 | 1985-12-04 | |
| EP86309266A EP0228815B2 (de) | 1985-12-04 | 1986-11-27 | Feldeffekttransistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE78364T1 true ATE78364T1 (de) | 1992-08-15 |
Family
ID=25190826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT86309266T ATE78364T1 (de) | 1985-12-04 | 1986-11-27 | Feldeffekttransistor. |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0228815B2 (de) |
| JP (1) | JPS62134974A (de) |
| AT (1) | ATE78364T1 (de) |
| DE (1) | DE3686035T3 (de) |
| ES (1) | ES2033241T5 (de) |
| GR (2) | GR3005487T3 (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6480070A (en) * | 1987-09-21 | 1989-03-24 | Mitsubishi Electric Corp | Semiconductor integrated circuit |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5563873A (en) * | 1978-11-07 | 1980-05-14 | Seiko Epson Corp | Semiconductor integrated circuit |
| JPS5843556A (ja) * | 1981-09-08 | 1983-03-14 | Toshiba Corp | 相補型半導体装置の製造方法 |
| JPH0644572B2 (ja) * | 1983-03-23 | 1994-06-08 | 株式会社東芝 | 半導体装置の製造方法 |
| JPS6017965A (ja) * | 1983-07-11 | 1985-01-29 | Toshiba Corp | 半導体装置の製造方法 |
| JPS6038879A (ja) * | 1983-08-12 | 1985-02-28 | Hitachi Ltd | 半導体装置の製造方法 |
| JPH0693494B2 (ja) * | 1984-03-16 | 1994-11-16 | 株式会社日立製作所 | 半導体集積回路装置の製造方法 |
| JPS60234367A (ja) * | 1984-05-07 | 1985-11-21 | Hitachi Ltd | Mis型電界効果トランジスタ |
| JPS60241256A (ja) * | 1984-05-16 | 1985-11-30 | Hitachi Ltd | 半導体装置およびその製造方法 |
| JPS6165470A (ja) * | 1984-09-07 | 1986-04-04 | Hitachi Ltd | 半導体集積回路装置 |
| JPS61133656A (ja) * | 1984-12-03 | 1986-06-20 | Hitachi Ltd | 半導体装置およびその製造方法 |
-
1986
- 1986-11-27 EP EP86309266A patent/EP0228815B2/de not_active Expired - Lifetime
- 1986-11-27 AT AT86309266T patent/ATE78364T1/de not_active IP Right Cessation
- 1986-11-27 ES ES86309266T patent/ES2033241T5/es not_active Expired - Lifetime
- 1986-11-27 DE DE3686035T patent/DE3686035T3/de not_active Expired - Fee Related
- 1986-12-03 JP JP61288665A patent/JPS62134974A/ja active Pending
-
1992
- 1992-08-20 GR GR920401827T patent/GR3005487T3/el unknown
-
1997
- 1997-12-02 GR GR970403206T patent/GR3025557T3/el unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE3686035T3 (de) | 1998-01-22 |
| EP0228815A3 (en) | 1988-09-07 |
| ES2033241T3 (es) | 1993-03-16 |
| GR3005487T3 (en) | 1993-05-24 |
| DE3686035D1 (de) | 1992-08-20 |
| DE3686035T2 (de) | 1993-01-07 |
| JPS62134974A (ja) | 1987-06-18 |
| ES2033241T5 (es) | 1998-02-16 |
| GR3025557T3 (en) | 1998-03-31 |
| EP0228815B1 (de) | 1992-07-15 |
| EP0228815A2 (de) | 1987-07-15 |
| EP0228815B2 (de) | 1997-10-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR900000817B1 (en) | Semiconductor ic device manufacturing method | |
| KR840005933A (ko) | 전계효과 트랜지스터의 제조방법 | |
| EP0510604A3 (de) | Halbleiteranordnung und Verfahren zu ihrer Herstellung | |
| EP0154337A3 (en) | Transistor circuit for semiconductor device with hysteresis operation and manufacturing method therefor | |
| KR900001394B1 (en) | Super high frequency intergrated circuit device | |
| DE69828588D1 (de) | Struktur zur erhöhung der maximalen spannung von siliziumkarbid-leistungstransistoren | |
| KR870005450A (ko) | 반도체층을 통한 전기적 단락이 없는 반도체 장치와 그 제조방법 | |
| FR2581248B1 (fr) | Procede de fabrication de transistors a effet de champ et transistors bipolaires lateraux sur un meme substrat | |
| EP0614229A3 (en) | Junction field-effect transistor (jfet), semiconductor integrated circuit device including jfet, and method of manufacturing the same. | |
| EP0311419A3 (de) | Halbleiteranordnung mit einem bipolaren Transistor und Verfahren zu ihrer Herstellung | |
| EP0195460A3 (de) | Integrierte Halbleiterschaltung mit Isolationszone | |
| ES2060268T3 (es) | Elemento semiconductor emisor de electrones. | |
| ATE78364T1 (de) | Feldeffekttransistor. | |
| JPS6439069A (en) | Field-effect transistor | |
| EP0460918A3 (en) | Semiconductor device having improved insulated gate type transistor | |
| DE3668716D1 (de) | Halbleitersubstratvorspannungsgenerator. | |
| NL190591C (nl) | Werkwijze voor het vervaardigen van een halfgeleiderinrichting welke een element-isolerend gebied op een halfgeleidersubstraat omvat. | |
| EP0369676A3 (de) | Nichtflüchtige Halbleiterspeicheranordnung | |
| EP0160183A3 (de) | Hochspannungs-MOS-Feldeffekttransistor | |
| DE3581842D1 (de) | Integrierte halbleiterschaltung mit komplementaeren feldeffekttransistoren. | |
| JPS53136977A (en) | Driving circuit | |
| KR850008249A (ko) | 반도체 장치 | |
| DE3751278D1 (de) | Transistor mit Zusammensetzung aus Halbleitermaterial und aus leitendem Material. | |
| JPS6414960A (en) | Semiconductor element | |
| JPS6421972A (en) | Semiconductor integrated circuit |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification | ||
| UEP | Publication of translation of european patent specification | ||
| REN | Ceased due to non-payment of the annual fee |