CA1091969A - Pellicule monochouche a emulsion photopolymerisable en dispersion - Google Patents

Pellicule monochouche a emulsion photopolymerisable en dispersion

Info

Publication number: CA1091969A
Authority: CA; Canada
Prior art keywords: photosensitive; film structure; phase; phase material; film
Prior art date: 1975-06-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA249,489A

Other languages

English (en)

Inventor

Robert W. Hallman

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Napp Systems (usa) Inc

Original Assignee

Napp Systems (usa) Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-06-19

Filing date

1976-04-02

Publication date

1980-12-23

1976-04-02 Application filed by Napp Systems (usa) Inc filed Critical Napp Systems (usa) Inc

1980-12-23 Application granted granted Critical

1980-12-23 Publication of CA1091969A publication Critical patent/CA1091969A/fr

Status Expired legal-status Critical Current

Links

239000000839 emulsion Substances 0.000 title claims description 17
239000006185 dispersion Substances 0.000 title claims description 14
239000000463 material Substances 0.000 claims abstract description 71
239000002904 solvent Substances 0.000 claims abstract description 27
238000007639 printing Methods 0.000 claims abstract description 15
229920002120 photoresistant polymer Polymers 0.000 claims abstract description 5
230000005670 electromagnetic radiation Effects 0.000 claims abstract description 4
229910001868 water Inorganic materials 0.000 claims description 48
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 45
239000000758 substrate Substances 0.000 claims description 38
239000002245 particle Substances 0.000 claims description 19
239000000203 mixture Substances 0.000 claims description 15
229920001577 copolymer Polymers 0.000 claims description 14
150000008049 diazo compounds Chemical class 0.000 claims description 11
229920002689 polyvinyl acetate Polymers 0.000 claims description 9
239000011118 polyvinyl acetate Substances 0.000 claims description 8
-1 aromatic diazo compounds Chemical class 0.000 claims description 7
150000001252 acrylic acid derivatives Chemical class 0.000 claims description 6
239000000470 constituent Substances 0.000 claims description 6
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 4
108010010803 Gelatin Proteins 0.000 claims description 4
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 4
239000007859 condensation product Substances 0.000 claims description 4
229920000159 gelatin Polymers 0.000 claims description 4
239000008273 gelatin Substances 0.000 claims description 4
235000019322 gelatine Nutrition 0.000 claims description 4
235000011852 gelatine desserts Nutrition 0.000 claims description 4
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 3
239000005977 Ethylene Substances 0.000 claims description 3
150000001728 carbonyl compounds Chemical class 0.000 claims description 3
238000012545 processing Methods 0.000 claims description 3
229910052709 silver Inorganic materials 0.000 claims description 3
239000004332 silver Substances 0.000 claims description 3
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
229920006243 acrylic copolymer Polymers 0.000 claims description 2
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical group CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims 1
239000003086 colorant Substances 0.000 claims 1
229920001038 ethylene copolymer Polymers 0.000 claims 1
230000001747 exhibiting effect Effects 0.000 claims 1
238000011161 development Methods 0.000 abstract description 19
238000004519 manufacturing process Methods 0.000 abstract description 8
239000000126 substance Substances 0.000 abstract description 8
150000001875 compounds Chemical class 0.000 abstract description 5
230000000704 physical effect Effects 0.000 abstract 1
239000010408 film Substances 0.000 description 78
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 19
230000018109 developmental process Effects 0.000 description 18
239000000976 ink Substances 0.000 description 12
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
229910052782 aluminium Inorganic materials 0.000 description 10
239000008399 tap water Substances 0.000 description 8
235000020679 tap water Nutrition 0.000 description 8
238000000034 method Methods 0.000 description 7
229940075065 polyvinyl acetate Drugs 0.000 description 6
DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 6
238000000576 coating method Methods 0.000 description 5
230000008569 process Effects 0.000 description 5
239000011800 void material Substances 0.000 description 5
229910052724 xenon Inorganic materials 0.000 description 5
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 5
238000007605 air drying Methods 0.000 description 4
238000004581 coalescence Methods 0.000 description 4
239000011248 coating agent Substances 0.000 description 4
238000007645 offset printing Methods 0.000 description 4
230000035699 permeability Effects 0.000 description 4
239000012466 permeate Substances 0.000 description 4
238000002360 preparation method Methods 0.000 description 4
239000000243 solution Substances 0.000 description 4
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
238000005299 abrasion Methods 0.000 description 3
230000008901 benefit Effects 0.000 description 3
230000001680 brushing effect Effects 0.000 description 3
239000000084 colloidal system Substances 0.000 description 3
239000012530 fluid Substances 0.000 description 3
230000002209 hydrophobic effect Effects 0.000 description 3
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
238000012986 modification Methods 0.000 description 3
230000004048 modification Effects 0.000 description 3
230000005855 radiation Effects 0.000 description 3
238000005201 scrubbing Methods 0.000 description 3
239000004094 surface-active agent Substances 0.000 description 3
238000009736 wetting Methods 0.000 description 3
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
206010034960 Photophobia Diseases 0.000 description 2
229940022663 acetate Drugs 0.000 description 2
239000002253 acid Substances 0.000 description 2
230000009471 action Effects 0.000 description 2
238000013459 approach Methods 0.000 description 2
239000006229 carbon black Substances 0.000 description 2
238000001035 drying Methods 0.000 description 2
239000004922 lacquer Substances 0.000 description 2
208000013469 light sensitivity Diseases 0.000 description 2
239000011236 particulate material Substances 0.000 description 2
230000009467 reduction Effects 0.000 description 2
239000011347 resin Substances 0.000 description 2
229920005989 resin Polymers 0.000 description 2
159000000000 sodium salts Chemical class 0.000 description 2
239000007787 solid Substances 0.000 description 2
239000010409 thin film Substances 0.000 description 2
JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
NSMMFSKPGXCMOE-UHFFFAOYSA-N 2-[2-(2-sulfophenyl)ethenyl]benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1C=CC1=CC=CC=C1S(O)(=O)=O NSMMFSKPGXCMOE-UHFFFAOYSA-N 0.000 description 1
229920002799 BoPET Polymers 0.000 description 1
229920000742 Cotton Polymers 0.000 description 1
239000005041 Mylar™ Substances 0.000 description 1
229930040373 Paraformaldehyde Natural products 0.000 description 1
206010034972 Photosensitivity reaction Diseases 0.000 description 1
102100035115 Testin Human genes 0.000 description 1
101710070533 Testin Proteins 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
FRHBOQMZUOWXQL-UHFFFAOYSA-L ammonium ferric citrate Chemical compound [NH4+].[Fe+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O FRHBOQMZUOWXQL-UHFFFAOYSA-L 0.000 description 1
238000004458 analytical method Methods 0.000 description 1
PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
150000004056 anthraquinones Chemical class 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
239000001055 blue pigment Substances 0.000 description 1
238000005266 casting Methods 0.000 description 1
230000008859 change Effects 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
230000002844 continuous effect Effects 0.000 description 1
XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
230000003467 diminishing effect Effects 0.000 description 1
238000007687 exposure technique Methods 0.000 description 1
229960004642 ferric ammonium citrate Drugs 0.000 description 1
239000007888 film coating Substances 0.000 description 1
238000009501 film coating Methods 0.000 description 1
239000012467 final product Substances 0.000 description 1
238000009472 formulation Methods 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
229920001519 homopolymer Polymers 0.000 description 1
238000003384 imaging method Methods 0.000 description 1
230000006872 improvement Effects 0.000 description 1
229910001867 inorganic solvent Inorganic materials 0.000 description 1
239000003049 inorganic solvent Substances 0.000 description 1
238000007689 inspection Methods 0.000 description 1
239000004313 iron ammonium citrate Substances 0.000 description 1
235000000011 iron ammonium citrate Nutrition 0.000 description 1
238000002386 leaching Methods 0.000 description 1
239000011159 matrix material Substances 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
238000012856 packing Methods 0.000 description 1
229920002866 paraformaldehyde Polymers 0.000 description 1
IPBVNPXQWQGGJP-UHFFFAOYSA-N phenyl acetate Chemical compound CC(=O)OC1=CC=CC=C1 IPBVNPXQWQGGJP-UHFFFAOYSA-N 0.000 description 1
PWGIEBRSWMQVCO-UHFFFAOYSA-N phosphono prop-2-enoate Chemical compound OP(O)(=O)OC(=O)C=C PWGIEBRSWMQVCO-UHFFFAOYSA-N 0.000 description 1
230000036211 photosensitivity Effects 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
238000007747 plating Methods 0.000 description 1
230000001737 promoting effect Effects 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
230000004043 responsiveness Effects 0.000 description 1
238000007789 sealing Methods 0.000 description 1
230000007480 spreading Effects 0.000 description 1
238000003892 spreading Methods 0.000 description 1
229910052714 tellurium Inorganic materials 0.000 description 1
PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
239000002699 waste material Substances 0.000 description 1
239000000080 wetting agent Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Formation Of Insulating Films (AREA)

CA249,489A 1975-06-19 1976-04-02 Pellicule monochouche a emulsion photopolymerisable en dispersion Expired CA1091969A (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US58833475A	1975-06-19	1975-06-19
US588,334		1975-06-19

Publications (1)

Publication Number	Publication Date
CA1091969A true CA1091969A (fr)	1980-12-23

Family

ID=24353419

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA249,489A Expired CA1091969A (fr)	1975-06-19	1976-04-02	Pellicule monochouche a emulsion photopolymerisable en dispersion

Country Status (12)

Country	Link
JP (1)	JPS5936731B2 (fr)
BE (1)	BE841797A (fr)
CA (1)	CA1091969A (fr)
CH (1)	CH633893A5 (fr)
DE (1)	DE2626066A1 (fr)
DK (1)	DK232276A (fr)
FR (1)	FR2315110A1 (fr)
GB (1)	GB1548764A (fr)
IT (1)	IT1061234B (fr)
NL (1)	NL7604774A (fr)
NO (1)	NO762006L (fr)
SE (1)	SE422847B (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52154627A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS52154626A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS5518621A (en) *	1978-07-26	1980-02-08	Fuji Photo Film Co Ltd	Photosensitive lithographic printing plate
DE2834059A1 (de) *	1978-08-03	1980-02-14	Hoechst Ag	Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5823026A (ja) *	1981-08-04	1983-02-10	Nippon Paint Co Ltd	水現像性平版印刷版材
JPS58174939A (ja) *	1982-03-18	1983-10-14	Konishiroku Photo Ind Co Ltd	画像形成材料
US4551415A (en) *	1982-04-22	1985-11-05	E. I. Du Pont De Nemours And Company	Photosensitive coatings containing crosslinked beads
US4601970A (en) *	1982-04-22	1986-07-22	E. I. Du Pont De Nemours And Company	Dry photosensitive film containing crosslinked beads
US4668604A (en) *	1982-04-22	1987-05-26	E.I. Du Pont De Nemours And Company	Positive-working photosensitive elements containing crosslinked beads and process of use
DE3328019A1 (de) *	1982-09-21	1984-03-22	Polychrome Corp., 10702 Yonkers, N.Y.	Mit wasser entwickelbare druckplatte
GB2273366B (en) *	1992-11-18	1996-03-27	Du Pont	Forming images on radiation-sensitive plates
US5688627A (en) *	1996-07-02	1997-11-18	Precision Lithograining Corp.	Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3382069A (en) *	1964-06-18	1968-05-07	Azoplate Corp	Planographic printing plate
GB1469941A (en) *	1973-04-10	1977-04-06	Andrews Paper & Chem Co Inc	Diazotype reproduction layer

1976
- 1976-04-02 CA CA249,489A patent/CA1091969A/fr not_active Expired
- 1976-04-12 GB GB14886/76A patent/GB1548764A/en not_active Expired
- 1976-04-28 CH CH534076A patent/CH633893A5/de not_active IP Right Cessation
- 1976-05-03 IT IT49301/76A patent/IT1061234B/it active
- 1976-05-03 FR FR7613143A patent/FR2315110A1/fr active Granted
- 1976-05-04 SE SE7605083A patent/SE422847B/xx unknown
- 1976-05-05 NL NL7604774A patent/NL7604774A/xx not_active Application Discontinuation
- 1976-05-13 BE BE167002A patent/BE841797A/fr not_active IP Right Cessation
- 1976-05-26 DK DK232276A patent/DK232276A/da not_active Application Discontinuation
- 1976-06-08 JP JP51067029A patent/JPS5936731B2/ja not_active Expired
- 1976-06-10 DE DE19762626066 patent/DE2626066A1/de not_active Withdrawn
- 1976-06-10 NO NO762006A patent/NO762006L/no unknown

Also Published As

Publication number	Publication date
FR2315110B1 (fr)	1981-11-13
NO762006L (fr)	1976-12-21
BE841797A (fr)	1976-09-01
NL7604774A (nl)	1976-12-21
JPS5936731B2 (ja)	1984-09-05
SE7605083L (sv)	1976-12-20
FR2315110A1 (fr)	1977-01-14
JPS522520A (en)	1977-01-10
GB1548764A (en)	1979-07-18
IT1061234B (it)	1983-02-28
SE422847B (sv)	1982-03-29
DK232276A (da)	1976-12-20
CH633893A5 (en)	1982-12-31
DE2626066A1 (de)	1977-01-20

Legal Events

Date	Code	Title	Description
1997-12-23	MKEX	Expiry

Publication	Publication Date	Title
US3635709A (en)	1972-01-18	Light-sensitive lithographic plate
US3280734A (en)	1966-10-25	Photographic plate
CA1174097A (fr)	1984-09-11	Produits photosensibles pour la copie, renfermant un copolymere tensio-actif a base d'unites de dialkylsiloxane et d'oxyalkylene
CA1091969A (fr)	1980-12-23	Pellicule monochouche a emulsion photopolymerisable en dispersion
US4472494A (en)	1984-09-18	Bilayer photosensitive imaging article
JPH06316182A (ja)	1994-11-15	リトグラフベースおよびそれを用いてリトグラフ印刷板を製造する方法
JPH06316183A (ja)	1994-11-15	リトグラフベースおよびそれを用いてリトグラフ印刷板を製造する方法
US4191570A (en)	1980-03-04	Process for heat treating lithographic printing plates
EP0000081A1 (fr)	1978-12-20	Bain de blanchiment dégradant.
US4522910A (en)	1985-06-11	Photosensitive graphic arts article
US4252879A (en)	1981-02-24	Image recording material having optically different particles
US4226927A (en)	1980-10-07	Photographic speed transfer element with oxidized polyethylene stripping layer
US3010391A (en)	1961-11-28	Light-sensitive sheets and process for producing transfer images
JPS6131856B2 (fr)	1986-07-23
CA2012258A1 (fr)	1990-09-17	Materiaux et methode d'imagerie
US5057394A (en)	1991-10-15	Method of forming an image
GB2128352A (en)	1984-04-26	Color image forming method and color image forming photo-sensitive material to be used therefor
US4388399A (en)	1983-06-14	Light-sensitive image-forming material
US3933499A (en)	1976-01-20	Printing plate comprising diazo-borofluoride and diazo resin layers
US3385701A (en)	1968-05-28	Lithographic offset master and method
EP0048160B1 (fr)	1985-07-24	Matériau enregistreur photosensible et procédé de mordançage en demi-ton
US4355095A (en)	1982-10-19	Method for producing a photomechanical color image using a strippable photostencil and water-permeable, water-insoluble color media
GB2095854A (en)	1982-10-06	Image forming material
US5264318A (en)	1993-11-23	Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin
GB2270989A (en)	1994-03-30	Photosensitive sheet for colour proofs