SE422847B - Grafiskt foremal innefattande ett substrat forsett med en fotokenslig enskiktsfilmkonstruktion - Google Patents

Grafiskt foremal innefattande ett substrat forsett med en fotokenslig enskiktsfilmkonstruktion

Info

Publication number
SE422847B
SE422847B SE7605083A SE7605083A SE422847B SE 422847 B SE422847 B SE 422847B SE 7605083 A SE7605083 A SE 7605083A SE 7605083 A SE7605083 A SE 7605083A SE 422847 B SE422847 B SE 422847B
Authority
SE
Sweden
Prior art keywords
photo
substrate provided
sensitive single
single movie
formal
Prior art date
Application number
SE7605083A
Other languages
English (en)
Swedish (sv)
Other versions
SE7605083L (sv
Inventor
R W Hallman
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of SE7605083L publication Critical patent/SE7605083L/xx
Publication of SE422847B publication Critical patent/SE422847B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
SE7605083A 1975-06-19 1976-05-04 Grafiskt foremal innefattande ett substrat forsett med en fotokenslig enskiktsfilmkonstruktion SE422847B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58833475A 1975-06-19 1975-06-19

Publications (2)

Publication Number Publication Date
SE7605083L SE7605083L (sv) 1976-12-20
SE422847B true SE422847B (sv) 1982-03-29

Family

ID=24353419

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7605083A SE422847B (sv) 1975-06-19 1976-05-04 Grafiskt foremal innefattande ett substrat forsett med en fotokenslig enskiktsfilmkonstruktion

Country Status (12)

Country Link
JP (1) JPS5936731B2 (fr)
BE (1) BE841797A (fr)
CA (1) CA1091969A (fr)
CH (1) CH633893A5 (fr)
DE (1) DE2626066A1 (fr)
DK (1) DK232276A (fr)
FR (1) FR2315110A1 (fr)
GB (1) GB1548764A (fr)
IT (1) IT1061234B (fr)
NL (1) NL7604774A (fr)
NO (1) NO762006L (fr)
SE (1) SE422847B (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154626A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS52154627A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS5518621A (en) * 1978-07-26 1980-02-08 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
DE2834059A1 (de) * 1978-08-03 1980-02-14 Hoechst Ag Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5823026A (ja) * 1981-08-04 1983-02-10 Nippon Paint Co Ltd 水現像性平版印刷版材
JPS58174939A (ja) * 1982-03-18 1983-10-14 Konishiroku Photo Ind Co Ltd 画像形成材料
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
US4668604A (en) * 1982-04-22 1987-05-26 E.I. Du Pont De Nemours And Company Positive-working photosensitive elements containing crosslinked beads and process of use
DE3328019A1 (de) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. Mit wasser entwickelbare druckplatte
GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
US5688627A (en) * 1996-07-02 1997-11-18 Precision Lithograining Corp. Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3382069A (en) * 1964-06-18 1968-05-07 Azoplate Corp Planographic printing plate
GB1469941A (en) * 1973-04-10 1977-04-06 Andrews Paper & Chem Co Inc Diazotype reproduction layer

Also Published As

Publication number Publication date
SE7605083L (sv) 1976-12-20
JPS522520A (en) 1977-01-10
JPS5936731B2 (ja) 1984-09-05
IT1061234B (it) 1983-02-28
DK232276A (da) 1976-12-20
GB1548764A (en) 1979-07-18
FR2315110A1 (fr) 1977-01-14
CA1091969A (fr) 1980-12-23
NO762006L (fr) 1976-12-21
BE841797A (fr) 1976-09-01
FR2315110B1 (fr) 1981-11-13
CH633893A5 (en) 1982-12-31
DE2626066A1 (de) 1977-01-20
NL7604774A (nl) 1976-12-21

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