JPS5936731B2 - 印刷材料 - Google Patents

印刷材料

Info

Publication number: JPS5936731B2
Authority: JP; Japan
Prior art keywords: photosensitive; diazo; substrate; material according; item
Prior art date: 1975-06-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP51067029A

Other languages

English (en)

Japanese (ja)

Other versions

JPS522520A (en

Inventor

ロバート・ダブリユー・ハルマン

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Napp Systems Inc

Original Assignee

Napp Systems Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-06-19

Filing date

1976-06-08

Publication date

1984-09-05

1976-06-08 Application filed by Napp Systems Inc filed Critical Napp Systems Inc

1977-01-10 Publication of JPS522520A publication Critical patent/JPS522520A/ja

1984-09-05 Publication of JPS5936731B2 publication Critical patent/JPS5936731B2/ja

Status Expired legal-status Critical Current

Links

239000000463 material Substances 0.000 title claims description 41
238000007639 printing Methods 0.000 title claims description 24
239000000758 substrate Substances 0.000 claims description 32
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 27
150000008049 diazo compounds Chemical class 0.000 claims description 16
239000000126 substance Substances 0.000 claims description 9
239000006185 dispersion Substances 0.000 claims description 7
239000002356 single layer Substances 0.000 claims description 7
229920002689 polyvinyl acetate Polymers 0.000 claims description 6
239000011118 polyvinyl acetate Substances 0.000 claims description 6
239000011347 resin Substances 0.000 claims description 6
229920005989 resin Polymers 0.000 claims description 6
150000001875 compounds Chemical class 0.000 claims description 4
239000007859 condensation product Substances 0.000 claims description 4
150000001728 carbonyl compounds Chemical class 0.000 claims description 3
239000003086 colorant Substances 0.000 claims description 3
229920000642 polymer Polymers 0.000 claims description 3
239000000975 dye Substances 0.000 claims description 2
239000010410 layer Substances 0.000 claims description 2
230000005855 radiation Effects 0.000 claims description 2
239000011236 particulate material Substances 0.000 claims 3
229920003023 plastic Polymers 0.000 claims 3
239000004033 plastic Substances 0.000 claims 3
229920006243 acrylic copolymer Polymers 0.000 claims 2
239000006229 carbon black Substances 0.000 claims 2
229920000058 polyacrylate Polymers 0.000 claims 2
239000002184 metal Substances 0.000 claims 1
239000011159 matrix material Substances 0.000 description 27
239000000203 mixture Substances 0.000 description 27
239000002904 solvent Substances 0.000 description 17
239000000976 ink Substances 0.000 description 14
238000011161 development Methods 0.000 description 13
239000000839 emulsion Substances 0.000 description 12
229920001577 copolymer Polymers 0.000 description 7
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 7
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
229910052782 aluminium Inorganic materials 0.000 description 6
238000000576 coating method Methods 0.000 description 6
238000004519 manufacturing process Methods 0.000 description 6
230000035699 permeability Effects 0.000 description 6
239000008399 tap water Substances 0.000 description 6
235000020679 tap water Nutrition 0.000 description 6
239000011800 void material Substances 0.000 description 6
239000011248 coating agent Substances 0.000 description 5
238000000034 method Methods 0.000 description 5
238000007645 offset printing Methods 0.000 description 5
-1 silver halide Chemical class 0.000 description 5
229910052724 xenon Inorganic materials 0.000 description 5
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 5
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
239000012530 fluid Substances 0.000 description 4
238000012986 modification Methods 0.000 description 4
230000004048 modification Effects 0.000 description 4
239000000243 solution Substances 0.000 description 4
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
230000008901 benefit Effects 0.000 description 3
239000000084 colloidal system Substances 0.000 description 3
238000013461 design Methods 0.000 description 3
230000002209 hydrophobic effect Effects 0.000 description 3
239000002245 particle Substances 0.000 description 3
230000008569 process Effects 0.000 description 3
238000005201 scrubbing Methods 0.000 description 3
238000003756 stirring Methods 0.000 description 3
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
206010034972 Photosensitivity reaction Diseases 0.000 description 2
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 2
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
230000005540 biological transmission Effects 0.000 description 2
238000005266 casting Methods 0.000 description 2
230000008859 change Effects 0.000 description 2
DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
239000012467 final product Substances 0.000 description 2
229920000159 gelatin Polymers 0.000 description 2
239000008273 gelatin Substances 0.000 description 2
239000004922 lacquer Substances 0.000 description 2
238000002386 leaching Methods 0.000 description 2
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
229920002120 photoresistant polymer Polymers 0.000 description 2
230000036211 photosensitivity Effects 0.000 description 2
238000002360 preparation method Methods 0.000 description 2
230000009467 reduction Effects 0.000 description 2
229910052709 silver Inorganic materials 0.000 description 2
239000004332 silver Substances 0.000 description 2
229910052714 tellurium Inorganic materials 0.000 description 2
PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
229920000178 Acrylic resin Polymers 0.000 description 1
239000004925 Acrylic resin Substances 0.000 description 1
229920002799 BoPET Polymers 0.000 description 1
229920000742 Cotton Polymers 0.000 description 1
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
239000005977 Ethylene Substances 0.000 description 1
108010010803 Gelatin Proteins 0.000 description 1
239000005041 Mylar™ Substances 0.000 description 1
BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
229930040373 Paraformaldehyde Natural products 0.000 description 1
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
239000002253 acid Substances 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
150000001252 acrylic acid derivatives Chemical class 0.000 description 1
230000009471 action Effects 0.000 description 1
230000004913 activation Effects 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
230000001680 brushing effect Effects 0.000 description 1
238000004581 coalescence Methods 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
238000010586 diagram Methods 0.000 description 1
SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
238000009792 diffusion process Methods 0.000 description 1
230000003467 diminishing effect Effects 0.000 description 1
238000001035 drying Methods 0.000 description 1
230000005670 electromagnetic radiation Effects 0.000 description 1
229920001038 ethylene copolymer Polymers 0.000 description 1
238000007687 exposure technique Methods 0.000 description 1
239000000945 filler Substances 0.000 description 1
235000019322 gelatine Nutrition 0.000 description 1
235000011852 gelatine desserts Nutrition 0.000 description 1
230000035876 healing Effects 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
229920001519 homopolymer Polymers 0.000 description 1
230000008595 infiltration Effects 0.000 description 1
238000001764 infiltration Methods 0.000 description 1
229910001867 inorganic solvent Inorganic materials 0.000 description 1
239000003049 inorganic solvent Substances 0.000 description 1
238000001459 lithography Methods 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
239000012528 membrane Substances 0.000 description 1
238000002156 mixing Methods 0.000 description 1
239000003607 modifier Substances 0.000 description 1
238000000465 moulding Methods 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
229920002866 paraformaldehyde Polymers 0.000 description 1
239000003504 photosensitizing agent Substances 0.000 description 1
230000000704 physical effect Effects 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
238000007747 plating Methods 0.000 description 1
239000000047 product Substances 0.000 description 1
230000001737 promoting effect Effects 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
238000010992 reflux Methods 0.000 description 1
230000002940 repellent Effects 0.000 description 1
239000005871 repellent Substances 0.000 description 1
238000007790 scraping Methods 0.000 description 1
239000002689 soil Substances 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000012360 testing method Methods 0.000 description 1
238000005406 washing Methods 0.000 description 1
239000002699 waste material Substances 0.000 description 1
238000009736 wetting Methods 0.000 description 1
239000000080 wetting agent Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Formation Of Insulating Films (AREA)

JP51067029A 1975-06-19 1976-06-08 印刷材料 Expired JPS5936731B2 (ja)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US58833475A	1975-06-19	1975-06-19

Publications (2)

Publication Number	Publication Date
JPS522520A JPS522520A (en)	1977-01-10
JPS5936731B2 true JPS5936731B2 (ja)	1984-09-05

Family

ID=24353419

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP51067029A Expired JPS5936731B2 (ja)	1975-06-19	1976-06-08	印刷材料

Country Status (12)

Country	Link
JP (1)	JPS5936731B2 (fr)
BE (1)	BE841797A (fr)
CA (1)	CA1091969A (fr)
CH (1)	CH633893A5 (fr)
DE (1)	DE2626066A1 (fr)
DK (1)	DK232276A (fr)
FR (1)	FR2315110A1 (fr)
GB (1)	GB1548764A (fr)
IT (1)	IT1061234B (fr)
NL (1)	NL7604774A (fr)
NO (1)	NO762006L (fr)
SE (1)	SE422847B (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52154627A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS52154626A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS5518621A (en) *	1978-07-26	1980-02-08	Fuji Photo Film Co Ltd	Photosensitive lithographic printing plate
DE2834059A1 (de) *	1978-08-03	1980-02-14	Hoechst Ag	Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5823026A (ja) *	1981-08-04	1983-02-10	Nippon Paint Co Ltd	水現像性平版印刷版材
JPS58174939A (ja) *	1982-03-18	1983-10-14	Konishiroku Photo Ind Co Ltd	画像形成材料
US4551415A (en) *	1982-04-22	1985-11-05	E. I. Du Pont De Nemours And Company	Photosensitive coatings containing crosslinked beads
US4601970A (en) *	1982-04-22	1986-07-22	E. I. Du Pont De Nemours And Company	Dry photosensitive film containing crosslinked beads
US4668604A (en) *	1982-04-22	1987-05-26	E.I. Du Pont De Nemours And Company	Positive-working photosensitive elements containing crosslinked beads and process of use
DE3328019A1 (de) *	1982-09-21	1984-03-22	Polychrome Corp., 10702 Yonkers, N.Y.	Mit wasser entwickelbare druckplatte
GB2273366B (en) *	1992-11-18	1996-03-27	Du Pont	Forming images on radiation-sensitive plates
US5688627A (en) *	1996-07-02	1997-11-18	Precision Lithograining Corp.	Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3382069A (en) *	1964-06-18	1968-05-07	Azoplate Corp	Planographic printing plate
GB1469941A (en) *	1973-04-10	1977-04-06	Andrews Paper & Chem Co Inc	Diazotype reproduction layer

1976
- 1976-04-02 CA CA249,489A patent/CA1091969A/fr not_active Expired
- 1976-04-12 GB GB14886/76A patent/GB1548764A/en not_active Expired
- 1976-04-28 CH CH534076A patent/CH633893A5/de not_active IP Right Cessation
- 1976-05-03 IT IT49301/76A patent/IT1061234B/it active
- 1976-05-03 FR FR7613143A patent/FR2315110A1/fr active Granted
- 1976-05-04 SE SE7605083A patent/SE422847B/xx unknown
- 1976-05-05 NL NL7604774A patent/NL7604774A/xx not_active Application Discontinuation
- 1976-05-13 BE BE167002A patent/BE841797A/fr not_active IP Right Cessation
- 1976-05-26 DK DK232276A patent/DK232276A/da not_active Application Discontinuation
- 1976-06-08 JP JP51067029A patent/JPS5936731B2/ja not_active Expired
- 1976-06-10 DE DE19762626066 patent/DE2626066A1/de not_active Withdrawn
- 1976-06-10 NO NO762006A patent/NO762006L/no unknown

Also Published As

Publication number	Publication date
FR2315110B1 (fr)	1981-11-13
NO762006L (fr)	1976-12-21
BE841797A (fr)	1976-09-01
NL7604774A (nl)	1976-12-21
SE7605083L (sv)	1976-12-20
CA1091969A (fr)	1980-12-23
FR2315110A1 (fr)	1977-01-14
JPS522520A (en)	1977-01-10
GB1548764A (en)	1979-07-18
IT1061234B (it)	1983-02-28
SE422847B (sv)	1982-03-29
DK232276A (da)	1976-12-20
CH633893A5 (en)	1982-12-31
DE2626066A1 (de)	1977-01-20

Publication	Publication Date	Title
US2763553A (en)	1956-09-18	Lithographic offset printing process
US2184310A (en)	1939-12-26	Photographic and printing media
JPS589146A (ja)	1983-01-19	水不要平版用版材
JPS5936731B2 (ja)	1984-09-05	印刷材料
US3640712A (en)	1972-02-08	Hydrophilic-hydrophobic photon-sensitive medium
US4522910A (en)	1985-06-11	Photosensitive graphic arts article
JPH0150892B2 (fr)	1989-11-01
US4252879A (en)	1981-02-24	Image recording material having optically different particles
US3778272A (en)	1973-12-11	Photographic transfer materials
US3231381A (en)	1966-01-25	Photosensitive compositions containing polyethylene oxide, a phenolic resin, a photosensitive compound and an oxidizing agent
US4226927A (en)	1980-10-07	Photographic speed transfer element with oxidized polyethylene stripping layer
US3113023A (en)	1963-12-03	Photosensitive lithographic plate comprising photosensitive diazo resins and method for preparing same
JP4172858B2 (ja)	2008-10-29	スクリーン印刷ステンシル
JPH0272A (ja)	1990-01-05	石版印刷版として使用するのに好適なプレセンシタイズド像形成材料
US2444205A (en)	1948-06-29	Lithographic printing plate
US3933499A (en)	1976-01-20	Printing plate comprising diazo-borofluoride and diazo resin layers
JPH0693118B2 (ja)	1994-11-16	感光性シート
JPS6126655B2 (fr)	1986-06-21
US5264318A (en)	1993-11-23	Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin
JPS6048021B2 (ja)	1985-10-24	感光性複写組成物、および平版印刷版の製造法
US2373357A (en)	1945-04-10	Method of making printing plates
US2407290A (en)	1946-09-10	Lithographic plate and process for making same
JPH10511478A (ja)	1998-11-04	水なし平版板の製造法
US3305360A (en)	1967-02-21	Method of preparing lithographic plates
JPH0328699B2 (fr)	1991-04-19