NO762006L - - Google Patents

Info

Publication number: NO762006L
Authority: NO; Norway
Prior art keywords: photosensitive; phase; structure according; water; exposure
Prior art date: 1975-06-19

Application number

NO762006A

Other languages

English (en)

Norwegian (no)

Inventor

R W Hallman

Original Assignee

Napp Systems Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-06-19

Filing date

1976-06-10

Publication date

1976-12-21

1976-06-10 Application filed by Napp Systems Inc filed Critical Napp Systems Inc

1976-12-21 Publication of NO762006L publication Critical patent/NO762006L/no

Links

XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 33
239000011159 matrix material Substances 0.000 claims description 28
239000000758 substrate Substances 0.000 claims description 28
239000000463 material Substances 0.000 claims description 27
238000007639 printing Methods 0.000 claims description 26
239000000203 mixture Substances 0.000 claims description 23
239000002904 solvent Substances 0.000 claims description 19
239000000839 emulsion Substances 0.000 claims description 17
150000008049 diazo compounds Chemical class 0.000 claims description 14
239000006185 dispersion Substances 0.000 claims description 13
229920001577 copolymer Polymers 0.000 claims description 11
239000002356 single layer Substances 0.000 claims description 11
150000001875 compounds Chemical class 0.000 claims description 6
229920002689 polyvinyl acetate Polymers 0.000 claims description 6
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 5
239000011118 polyvinyl acetate Substances 0.000 claims description 5
-1 silver halide Chemical class 0.000 claims description 5
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 4
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
239000010410 layer Substances 0.000 claims description 4
108010010803 Gelatin Proteins 0.000 claims description 3
XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 3
150000001252 acrylic acid derivatives Chemical class 0.000 claims description 3
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
150000001728 carbonyl compounds Chemical class 0.000 claims description 3
239000007859 condensation product Substances 0.000 claims description 3
229920000159 gelatin Polymers 0.000 claims description 3
239000008273 gelatin Substances 0.000 claims description 3
235000019322 gelatine Nutrition 0.000 claims description 3
235000011852 gelatine desserts Nutrition 0.000 claims description 3
229910052709 silver Inorganic materials 0.000 claims description 3
239000004332 silver Substances 0.000 claims description 3
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 2
239000005977 Ethylene Substances 0.000 claims description 2
239000000975 dye Substances 0.000 claims description 2
230000005670 electromagnetic radiation Effects 0.000 claims description 2
229920001038 ethylene copolymer Polymers 0.000 claims description 2
229920002120 photoresistant polymer Polymers 0.000 claims 2
150000001242 acetic acid derivatives Chemical class 0.000 claims 1
229920006243 acrylic copolymer Polymers 0.000 claims 1
230000005494 condensation Effects 0.000 claims 1
238000009833 condensation Methods 0.000 claims 1
150000002500 ions Chemical class 0.000 claims 1
239000000047 product Substances 0.000 claims 1
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 13
239000000976 ink Substances 0.000 description 12
238000011161 development Methods 0.000 description 11
238000004519 manufacturing process Methods 0.000 description 9
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
229910052782 aluminium Inorganic materials 0.000 description 8
238000000576 coating method Methods 0.000 description 7
230000035699 permeability Effects 0.000 description 7
239000011248 coating agent Substances 0.000 description 6
238000007605 air drying Methods 0.000 description 5
239000007788 liquid Substances 0.000 description 5
238000007645 offset printing Methods 0.000 description 5
DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 5
230000001680 brushing effect Effects 0.000 description 4
229920001971 elastomer Polymers 0.000 description 4
229910052724 xenon Inorganic materials 0.000 description 4
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 4
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
230000002209 hydrophobic effect Effects 0.000 description 3
238000000034 method Methods 0.000 description 3
230000008569 process Effects 0.000 description 3
239000000243 solution Substances 0.000 description 3
238000005406 washing Methods 0.000 description 3
238000009736 wetting Methods 0.000 description 3
BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
206010034972 Photosensitivity reaction Diseases 0.000 description 2
230000008859 change Effects 0.000 description 2
239000000084 colloidal system Substances 0.000 description 2
239000012467 final product Substances 0.000 description 2
230000016507 interphase Effects 0.000 description 2
238000010409 ironing Methods 0.000 description 2
238000002386 leaching Methods 0.000 description 2
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
239000002245 particle Substances 0.000 description 2
230000036211 photosensitivity Effects 0.000 description 2
239000011347 resin Substances 0.000 description 2
229920005989 resin Polymers 0.000 description 2
238000005201 scrubbing Methods 0.000 description 2
229910052714 tellurium Inorganic materials 0.000 description 2
PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
239000002966 varnish Substances 0.000 description 2
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical group CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
229920002799 BoPET Polymers 0.000 description 1
208000005812 Colloid Cysts Diseases 0.000 description 1
235000009161 Espostoa lanata Nutrition 0.000 description 1
240000001624 Espostoa lanata Species 0.000 description 1
239000005041 Mylar™ Substances 0.000 description 1
229930040373 Paraformaldehyde Natural products 0.000 description 1
206010034960 Photophobia Diseases 0.000 description 1
239000002253 acid Substances 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
239000012670 alkaline solution Substances 0.000 description 1
239000004411 aluminium Substances 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
238000005266 casting Methods 0.000 description 1
230000015556 catabolic process Effects 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
238000006731 degradation reaction Methods 0.000 description 1
SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
239000003974 emollient agent Substances 0.000 description 1
239000007888 film coating Substances 0.000 description 1
238000009501 film coating Methods 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
229920001519 homopolymer Polymers 0.000 description 1
229910001867 inorganic solvent Inorganic materials 0.000 description 1
239000003049 inorganic solvent Substances 0.000 description 1
238000007689 inspection Methods 0.000 description 1
208000013469 light sensitivity Diseases 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
238000012856 packing Methods 0.000 description 1
239000003973 paint Substances 0.000 description 1
229920002866 paraformaldehyde Polymers 0.000 description 1
230000000149 penetrating effect Effects 0.000 description 1
230000035515 penetration Effects 0.000 description 1
230000000704 physical effect Effects 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
230000005855 radiation Effects 0.000 description 1
229920006395 saturated elastomer Polymers 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000003860 storage Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000008399 tap water Substances 0.000 description 1
235000020679 tap water Nutrition 0.000 description 1
239000011800 void material Substances 0.000 description 1
239000002699 waste material Substances 0.000 description 1
239000000080 wetting agent Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Formation Of Insulating Films (AREA)

NO762006A 1975-06-19 1976-06-10 NO762006L (fr)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US58833475A	1975-06-19	1975-06-19

Publications (1)

Publication Number	Publication Date
NO762006L true NO762006L (fr)	1976-12-21

Family

ID=24353419

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO762006A NO762006L (fr)	1975-06-19	1976-06-10

Country Status (12)

Country	Link
JP (1)	JPS5936731B2 (fr)
BE (1)	BE841797A (fr)
CA (1)	CA1091969A (fr)
CH (1)	CH633893A5 (fr)
DE (1)	DE2626066A1 (fr)
DK (1)	DK232276A (fr)
FR (1)	FR2315110A1 (fr)
GB (1)	GB1548764A (fr)
IT (1)	IT1061234B (fr)
NL (1)	NL7604774A (fr)
NO (1)	NO762006L (fr)
SE (1)	SE422847B (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52154627A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS52154626A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS5518621A (en) *	1978-07-26	1980-02-08	Fuji Photo Film Co Ltd	Photosensitive lithographic printing plate
DE2834059A1 (de) *	1978-08-03	1980-02-14	Hoechst Ag	Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5823026A (ja) *	1981-08-04	1983-02-10	Nippon Paint Co Ltd	水現像性平版印刷版材
JPS58174939A (ja) *	1982-03-18	1983-10-14	Konishiroku Photo Ind Co Ltd	画像形成材料
US4551415A (en) *	1982-04-22	1985-11-05	E. I. Du Pont De Nemours And Company	Photosensitive coatings containing crosslinked beads
US4601970A (en) *	1982-04-22	1986-07-22	E. I. Du Pont De Nemours And Company	Dry photosensitive film containing crosslinked beads
US4668604A (en) *	1982-04-22	1987-05-26	E.I. Du Pont De Nemours And Company	Positive-working photosensitive elements containing crosslinked beads and process of use
DE3328019A1 (de) *	1982-09-21	1984-03-22	Polychrome Corp., 10702 Yonkers, N.Y.	Mit wasser entwickelbare druckplatte
GB2273366B (en) *	1992-11-18	1996-03-27	Du Pont	Forming images on radiation-sensitive plates
US5688627A (en) *	1996-07-02	1997-11-18	Precision Lithograining Corp.	Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3382069A (en) *	1964-06-18	1968-05-07	Azoplate Corp	Planographic printing plate
GB1469941A (en) *	1973-04-10	1977-04-06	Andrews Paper & Chem Co Inc	Diazotype reproduction layer

1976
- 1976-04-02 CA CA249,489A patent/CA1091969A/fr not_active Expired
- 1976-04-12 GB GB14886/76A patent/GB1548764A/en not_active Expired
- 1976-04-28 CH CH534076A patent/CH633893A5/de not_active IP Right Cessation
- 1976-05-03 IT IT49301/76A patent/IT1061234B/it active
- 1976-05-03 FR FR7613143A patent/FR2315110A1/fr active Granted
- 1976-05-04 SE SE7605083A patent/SE422847B/xx unknown
- 1976-05-05 NL NL7604774A patent/NL7604774A/xx not_active Application Discontinuation
- 1976-05-13 BE BE167002A patent/BE841797A/fr not_active IP Right Cessation
- 1976-05-26 DK DK232276A patent/DK232276A/da not_active Application Discontinuation
- 1976-06-08 JP JP51067029A patent/JPS5936731B2/ja not_active Expired
- 1976-06-10 DE DE19762626066 patent/DE2626066A1/de not_active Withdrawn
- 1976-06-10 NO NO762006A patent/NO762006L/no unknown

Also Published As

Publication number	Publication date
FR2315110B1 (fr)	1981-11-13
BE841797A (fr)	1976-09-01
NL7604774A (nl)	1976-12-21
JPS5936731B2 (ja)	1984-09-05
SE7605083L (sv)	1976-12-20
CA1091969A (fr)	1980-12-23
FR2315110A1 (fr)	1977-01-14
JPS522520A (en)	1977-01-10
GB1548764A (en)	1979-07-18
IT1061234B (it)	1983-02-28
SE422847B (sv)	1982-03-29
DK232276A (da)	1976-12-20
CH633893A5 (en)	1982-12-31
DE2626066A1 (de)	1977-01-20

Publication	Publication Date	Title
NO762006L (fr)	1976-12-21
JPS589146A (ja)	1983-01-19	水不要平版用版材
US5366837A (en)	1994-11-22	Image receiving sheet and image transferring method employing the image receiving sheet
DK151199B (da)	1987-11-09	Fremgangsmaade til fremstilling af en fotopolymerdybtryksplade til gravuretrykning
US6060210A (en)	2000-05-09	Varnishing film and method of adjusting the surface gloss of prepress color proof using the same
US4389473A (en)	1983-06-21	Production of transfer material
JPH0225499B2 (fr)	1990-06-04
US4522910A (en)	1985-06-11	Photosensitive graphic arts article
US3128181A (en)	1964-04-07	Sheet material coated with water-resistant polyvinyl alcohol and method of making the same
US3778272A (en)	1973-12-11	Photographic transfer materials
US2405513A (en)	1946-08-06	Photogravure printing plate
US5845575A (en)	1998-12-08	Varnishing film and method of adjusting the surface gloss of prepress color proof using the same
JPS5954599A (ja)	1984-03-29	赤外線像形成フイルム用および熱像形成フイルム用剥離性コ−テイング
US20010052299A1 (en)	2001-12-20	Screen printing stencil prodcution
US3010391A (en)	1961-11-28	Light-sensitive sheets and process for producing transfer images
US2444205A (en)	1948-06-29	Lithographic printing plate
US5273855A (en)	1993-12-28	Method of forming multi-color image
JP2601603B2 (ja)	1997-04-16	感光性シート
US5541035A (en)	1996-07-30	Method of forming multicolor image
US3338164A (en)	1967-08-29	Lithographic master elements for reception of hydrophobic images
US3703362A (en)	1972-11-21	Presensitized light-sensitive letterpress printing makeready
US2892711A (en)	1959-06-30	Process for producing gelatin relief images on printing plates
JPS5876833A (ja)	1983-05-10	画像形成材料
JPS644167B2 (fr)	1989-01-24
RU2375735C2 (ru)	2009-12-10	Способ изготовления материала основы для трафаретной печати и материал основы этого типа