EP0097502A2 - Support pour plaque d'impression lithographique et procédé de fabrication - Google Patents

Support pour plaque d'impression lithographique et procédé de fabrication Download PDF

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Publication number
EP0097502A2
EP0097502A2 EP83303513A EP83303513A EP0097502A2 EP 0097502 A2 EP0097502 A2 EP 0097502A2 EP 83303513 A EP83303513 A EP 83303513A EP 83303513 A EP83303513 A EP 83303513A EP 0097502 A2 EP0097502 A2 EP 0097502A2
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EP
European Patent Office
Prior art keywords
printing plate
lithographic printing
water soluble
support
chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP83303513A
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German (de)
English (en)
Other versions
EP0097502A3 (en
EP0097502B1 (fr
Inventor
Akio Iwaki
Norihito Suzuki
Takeshi Yamamoto
Toru Aoki
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Konica Minolta Inc
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Konica Minolta Inc
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Publication date
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Publication of EP0097502A2 publication Critical patent/EP0097502A2/fr
Publication of EP0097502A3 publication Critical patent/EP0097502A3/en
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Publication of EP0097502B1 publication Critical patent/EP0097502B1/fr
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/038—Treatment with a chromium compound, a silicon compound, a phophorus compound or a compound of a metal of group IVB; Hydrophilic coatings obtained by hydrolysis of organometallic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/036—Chemical or electrical pretreatment characterised by the presence of a polymeric hydrophilic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/04—Intermediate layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12542—More than one such component
    • Y10T428/12549—Adjacent to each other
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12556—Organic component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12556—Organic component
    • Y10T428/12569—Synthetic resin
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12583—Component contains compound of adjacent metal
    • Y10T428/1259—Oxide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826—Group VIB metal-base component
    • Y10T428/12847—Cr-base component
    • Y10T428/12854—Next to Co-, Fe-, or Ni-base component

Definitions

  • This invention relates to a support for lithographic printing plate and a method for preparation thereof, more particularly to a support for lithographic printing plate having a layer substantially consisting of chromium and/or chromium oxide on its surface and a method for preparation thereof.
  • a support for lithographic printing plate by treating the surface of a steel treated with chromic acid with an aqueous silicate solution, an aqueous aluminate solution, an aqueous zirconic fluoride solution or an aqueous or alcoholic solution of a hydrophilic resin to make it hydrophilic (Japanese Patent Publication No.31277/1981).
  • an object of this invention is to provide a support for lithographic printing plate which does not undergo cutting during printing and a method for preparation thereof.
  • Another object of this invention is to provide a support for lithographic printing plate which is sufficiently hydrophilic, also excellent in adhesion to the photosensitive layer and has a high printing life.
  • a support for lithographic printing plate having, in order, provided on an iron material i) a layer substantially consisting of chromium and/or chromium oxide and ii) a layer containing at least one selected from water soluble salts of calcium, magnesium, zinc, barium, strontium, cobalt, manganese, nickel and silicon and a water soluble polymeric compound, and by a method for preparing a support for lithographic printing plate, which comprises treating the surface of a layer substantially consisting of chromium and/or chromium oxide provided on an iron material with a solution containing at least one selected from water soluble salts of calcium, magnesium, zinc, barium, strontium, cobalt, manganese, nickel and silicon and a water soluble polymeric compound.
  • the iron material to be used in this invention is inclusive of pure iron and also alloys of iron with other elements. As other elements forming alloys with iron, there may be included carbon, manganese, nickel, and others.
  • Typical examples of alloys may include carbon steels (alloys of carbon (0.04 to 1.7 %) and iron), cast irons with higher contents of carbon than carbon steels, and further special steels (e.g. manganese steel, nickel steel, chromium steel, nickel-chromium steel) having added other elements (e.g. manganese, nickel, chromium, cobalt,' tungsten, molybdenum), etc.
  • the above carbon steels may include super-soft steels (0.25 % or less carbon), soft steels (0.25 to 0.5 % carbon), hard steels (0.5 to 1.0 % carbon) and super-hard steels (1.0 % or more carbon).
  • the iron material of this invention may also include those having zinc, nickel, copper, tin, etc. laminated on these iron materials by the method such as plating, etc.
  • the layer substantially consisting of chromium and/or chromium oxide provided on the iron material may include a layer consisting of chromium, a layer consisting of chromium oxide, a layer in which chromium oxide is provided on chromium, a layer in which chromium is provided on chromium oxide, a layer in which chromium and chromium oxide exist as a mixture, and others.
  • the term "substantially consisting of" in the layer substantially consisting of chromium and/or chromium oxide as mentioned above means that the sum of the respective percentages of the numbers (atomic concentration) of chromium atoms and oxygen atoms comprise 50 % or more in the elemental composition consisting said layer.
  • Said layer may also contain other components than chromium atoms and oxygen atoms such atoms as carbon, chlorine, sulfur, calcium, nitrogen, fluorine, etc. within the range which does not impair the effect of this invention.
  • the chromium oxide may be inclusive of divalent, trivalent or hexavalent chromium oxides and hydrates thereof.
  • the above layer substantially consisting of chromium and/or chromium oxide may have a thickness preferably of 0.001 to 10 p, particularly preferably 0.005 to 4 p.
  • the method for providing the layer substantially consisting of chromium and/or chromium oxide on an iron material there may be employed those conventionally practiced in the art.
  • the so called chromium electroplating method in which electrolysis is carried out in an aqueous solution containing anhydrous chromic acid as the main component using an iron material as the cathode
  • the so called chromic acid heat treatment method in which an iron material is dipped in an aqueous bichromate solution or an aqueous solution containing chromic acid and reducing agent is thinly coated on the surface of an iron material, followed by baking at about 120 °C thereby to form a thin layer of chromium oxide
  • the electrolytic chromic acid treatment method in which electrolysis is carried out in an aqueous anhydrous chromic acid solution to which additives such as disulfonic acid, thiocyanates, etc.
  • One of the preferable iron material having a layer substantially consisting of chromium and/or chromium oxide is an iron material having an electrodeposited chromium layer, having an elemental composition substantially consisting of chromium and oxygen in the surface side portion of said electrodeposited layer and ratio of atomic concentrations of chromium atom and oxygen atom being substantially even at the same depth from every point on said surface.
  • This iron material is to be described in detail below.
  • the constitutional ratio of the respective atoms such as oxygen, chromium and iron constituting the substrate material may be varied within the region of from the surface of the electrodeosited chromium layer toward the substrate (iron material); such that oxygen atoms, without being increased or after slightly being increased, soon begin to be decreased; chromium atoms, after being increased, are gradually decreased as neared to the substrate; and the atoms constituting the substrate such as iron, etc. begin to exist at a certain depth from the surface of the . electrodeposited chromium layer, being increased as the depth is deeper.
  • the above electrodeposited chromium layer is constituted in the substrate side substantially of the atoms constituting the substrate and chromium atoms, and the constitutional ratios are varied continuously such that the ratio of the atoms constituting the substrate becomes greater and the ratio of chromium smaller as nearer to said substrate.
  • the above electrodeposited chromium layer refers to a region of from the support surface to a position at which the number of the atoms constituting the substrate and the number of chromium atoms are identical, and its thickness may be preferably 0.01 to 101im, particularly preferably 0.01 to 4pm.
  • the thickness can be determined by fluorescent X-ray analysis as an average value by the quantitative determination with reference to the calibration curve previously prepared from the standard chromium plated layers with known thicknesses.
  • the electrodeposited chromium layer is constituted, in the substrate side,substantially of the atoms constituting the substrate and chromium atoms" means that the sum of the respective atomic concentrations of the atoms constituting the substrate and chromium atoms is 60 % or more.
  • the surface side portion of the electrodeposited chromium layer refers to the portion of from the surface of said electrodeposited layer to the position where the atomic concentration of the atoms constituting the substrate exceeds 20 %
  • the elemental composition in the surface side portion consists substantially of chromium and oxygen means that the sum of the respective atomic concentrations of chromium atoms and oxygen atoms is 50 % or more, thus meaning that other components than chromium atoms and oxygen atoms, for example, carbon atoms, chlorine atoms, sulfur atoms, calcium, nitrogen atoms, fluorine atoms, etc., may be permitted to be contained within the range which does not impair the effect of this invention.
  • the above atomic concentrations can be determined by the surface analytical means such as photoelectric spectroscopy (e.g. X-ray photoelectric spectroscopy), and Auger electron spectroscopy.
  • the profile of the elements in the direction of depth of the electrodeposited chromium layer as mentioned above may be determined by Auger electron spectroscopy, and the atomic concentrations at various depths at various portions of the electrodeposited chromium layer can be determined by local analyses by means of the Scanning Auger Microprobe (e.g., PHI. Model 595 or 600) produced by Perkin Elmer Co.
  • the elemental composition in the surface side portion of the electrodeposited chromium layer may preferably be such that, in variations of the atomic concentrations of chromium and oxygen in the depth direction along the normal line on the electrodeposited chromium layer surface, the atomic concentration ya % of chromium at the depth of Xnm from said surface is within the range satisfying the conditions as represented by the formula (I) ya ⁇ -0.464X 2 + 7.82X + 70 (where 0 ⁇ X ⁇ 6) and the formula (II) ya > -0.0398X 2 + 1.99X + 15 (where 0 ⁇ X ⁇ 25), and the atomic concentration yb % of oxygen within the range satisfying the conditions as represented by the formula (III) yb ⁇ 0.0884X 2 - 4.46X + 80 (where 0 ⁇ X ⁇ 25) and the formula (IV) yb > 0.5X 2 - 8.1X + 20 (where 0 ⁇ X ⁇ 3), and further
  • argon ion was used as the ion gun and etching was effected at a speed of 20 A/min. with thallium oxide (Ta 2 0 5 ) as the standard (determined from the time for etching of Ta 2 0 5 with known film thicknesses), and further in calculation of the elemental composition, the peak intensities of the Auger spectrum (differential form) employed concern the peak at 529 eV for chromium and the peak at 503 eV for oxygen, the relative sensitivities of chromium and oxygen employed being the values as disclosed in L.E. Davis, P.W. Palberg, G.E. Riach, R.E.Weber, N.C. MacDonald " Handbook of Auger Electron Spectroscopy sec. ed.” (Physical Electronics Division Perkin-Elmer Corp., 1976).
  • the depth Xnm from the surface as defined above is obtained by transforming the etching time from the aforesaid etching speed into depth, being calculated on the basis that all the compositions are chromium oxide (Cr2p3).
  • the aforesaid elemental composition shows the ratio of atom number per unit area.
  • the elemental composition in the surface side portion of the electrodeposited chromium layer substantially consists of chromium and oxygen and the respective elemental compositions of chromium and oxygen at said portion are substantially even at the same depth from said surface and at respective portions on said surface.
  • substantially even means that, in the element profile in the depth direction at each portion, the value of Xo is within the range of error of + 80 %. The above error is calculated by dividing the difference between the two values by the greater value of the both values and multiplying the resultant value by 100.
  • the surface shape of the layer substantially consisting of chromium and/or chromic acid in this invention may be flat but preferably have concavo-convexes.
  • concavo-convexes there may be mentioned one having an electrodeposited chromium layer constituted of coalescively agglomerated assemblages of subagglomerated shperoidate particles of generally lobular curvilinear contour characterized by an effective absence of generally planar exterior surfaces and relativbely sharp protuberant angels, as disclosed in European Patent Publication No.20021; and also an electrodeposited chromium layer, wherein the surface of said electrodeposited layer has a shape having protuberant crystalline products with angles protruded thereon, the elemental composition in the surface side portion of said electrodeposited layer consists substantially of chromium and oxygen and the respective elemental compositions of chromium and oxygen in said portion are substantially even at the same depth from said surface and at every portion on said surface, as disclosed in European Patent Application No. filed on even date (our N.36681)
  • shape of protuberant crystalline products with angles of the electrodeposited layer may preferably a shape of plate or hexahedral (e.g. cubic) crystals, or an agglomerated product of these crystals or a mixture of said crystals and/or said agglomerated product.
  • plate crystals are preferred polygonal (primarily hexagonal) plates, and the polygonal shape may have sizes of planes preferably of 0.5 to 5/m and thicknesses preferably of 0.01 to 0.8 ⁇ m.
  • hexahedral crystals cubic crystals, especially those having side lengths of 0.1 to 2 pm are preferred.
  • the thus pre-treated iron was washed with water by spraying a shower thereon and then transferred to the main treatment step.
  • This main treatment step is a step for forming the electrodeposited chromium layer in which Electrolyte 2 as shown in Table 3 is cooled or heated by a coil tube for temperature control to adjust the liquid temperature, and electrolytic treatment is conducted under the Electrolysis Conditions 2 as shown in Table 4.
  • the Electrolyte 2 is an electrodeposited chromium layer forming solution for formation of an electrodeposited chromium layer on the surface of the iron material.
  • the water soluble polymeric compounds to be used in the present invention in the layer to be provided on the layer substantially consisting of chromium and/or chromium oxide may preferably have solubilities of 0.01 % or higher.
  • water soluble polymeric compounds there may be included natural polymeric compounds such as gum arabic, starch, dextrin, sodium alginate, gelatin, etc.; water soluble cellulose compounds such as water soluble salts of carboxyalkyl cellulose (as alkyl; methyl, ethyl, propyl, etc.), alkyl celluloses (as alkyl; methyl, hydroxymethyl, hydroxyethyl, hydroxypropyl and the like); synthetic polymeric compounds such as polyacrylic acid or water soluble salts thereof, polymethacrylic acid or water soluble salts thereof, acrylic acid copolymers or water soluble salts thereof, methacrylic acid copolymers or water soluble salts thereof, styrene-maleic anhydride copo
  • the water soluble salts of these polymeric compounds may include sodium and potassium salts.
  • the above various water soluble polymeric compounds may be used either singly or in combination of two or more kinds.
  • natural polymeric compounds such as starch, dextrin, etc. and water soluble cellulose compounds are preferred.
  • These polymeric compounds may have molecular weights preferably of 500 to 1,000,000.
  • Water soluble salts to be used together with the water soluble polymeric compound are preferably those having solubilities of 0.01 % or higher, particularly salts of inorganic or organic acids with calcium, magnesium, zinc, barium, strontium, cobalt, manganese, nickel or silicon.
  • the salts may contain complex salts.
  • Typical organic acid salts are those of low molecular carboxylic acids such as acetic acid, propionic acid, butyric acid, succinic acid, benzoic acid and salicylic acid and acetylacetone complex.
  • Typical inorganic salts are chlorides, bromides, chlorate, bromate, iodides, iodate, nitrates, sulfates and phosphates. Water soluble salts may be used either singly or in combination of two or more kinds.
  • an organic salt is particularly preferred, and the salts with calcium, magnesium, barium and zinc are particularly preferred.
  • the amount of the layer containing the water soluble polymeric compound and the water soluble salt after dired is preferably 0.001 to 1 mg/dm 2 , particularly 0.05 to 0.5 mg/dm2 .
  • the method for providing a layer containing a water soluble polymeric compound and a water soluble salt there may preferably be employed the method in which, after washing the surface of the layer substantially consisting of chromium and/or chromium oxide provided on the iron material with an aqueous acidic or alkaline solution, if desired, the surface is applied thereon with a surface treating solution containing a water soluble polymeric compound and at least one selected from the water soluble salts of calcium, magnesium, zinc, barium strontium, cobalt, manganese, nickel and silicon.
  • the solvent for dissolving the above water soluble polymeric compounds and water soluble salts there may preferably employed water, methanol, ethanol, methyl cellosolve, or mixtures of water and an organic solvent miscible with water such as methanol, ethanol, acetone, methyl cellosolve, ethyl cellosolve, dioxane, etc.
  • the above surface treating solutions may preferably contain the water soluble polymeric compound and the water soluble salt each at a concentration of 0.05 to 3 % by weight (the total solid content being preferably 0.1 to 6 % by weight).
  • a humectant such as surfactants, etc., if desired.
  • the method for surface treatment there may be employed the method in which a surface treating solution is coated on the layer substantially consisting of chromium and/or chromium oxide, the method in which the surface treating solution is sprayed on said layer or the method in which the iron material having said layer is dipped in the surface treating solution.
  • compositions comprising photosensitive resins having unsaturated double bonds in molecules, including, for example, photosensitive resins containing photosensitive groups: in the main chains of polymers, as disclosed in U.S. Patents 3,030,208; 3,453,237 and 3,622,320, and polyvinyl cinnamates having photosensitive groups in the side chains of polymers.
  • compositions comprise monomers having double bonds and binders (polymeric compounds), typically the compositions as disclosed in U.S. Patents 2,760,863; 2,791,504 and 3,801,328.
  • compositions comprising diazo resins and binders (film forming resins), as exemplified by the photosensitive compositions disclosed in Japanese Patent Publication No.1167/1972, Japanese Unexamined Patent Publications Nos.18585/1975, 118802/1975, 98613/1979 and 98614/1979.
  • photosensitive compositions comprising azide compounds and water soluble or alkali soluble polymeric compounds as disclosed in U . S . Patents 2,852,397 and 2,940,853; U.K. Patents No.886,100 and No.892,811; Japanese Patent Publications Nos.34930/1977 and 34933/1977 or photosensitive compositions comprising polymers having azide groups as disclosed in Japanese Unexamined Patent Publication Nos.5102/1975, 84302/1975, 12984/1978 and 135525/1979.
  • compositions comprising o-naphthoquinonediazide compounds and alkali soluble resins as disclosed in U.S. Patents 3,184,310 and 3,535,157; Japanese Unexamined Patent Publications Nos.48403/1974, 57841/1980 and 1044/1981; Japanese Patent Publications Nos.7842/1975 and 14042/1976.
  • the thus obtained original plate for printing is then subjected to imagewise exposure, followed by developing with a developer suitable for the photosensitive composition, to give a printing plate.
  • a developer suitable for the photosensitive composition to give a printing plate.
  • the thus pre-treated iron plate was washed with by spraying with water and then applied with the main treatment step.
  • the Electrolyte IV and the Electrolysis Conditions IV in the main treatment step are shown in Table 7 and Table 8, respectively.
  • the iron plate having been thus finished with the main treatment step was then washed by showering with water, and thereafter immersed in an aqueous 5 wt. % caustic soda solution at 40 °C for one minute, followed by washing with water, and subsequently subjected to the surface treatment by being immersed in a surface treating solution as shown in Table 9 at 50 °C for 60 seconds. After the surface treatment, the iron plate was washed with water and dried to obtain a support. The amount of the layer after dried was 0.12 mg/dm 2 .
  • the support was coated with a photosensitive coating solution having the following composition by a whirler, followed by drying at 100 °C for 4 minutes, to obtain an original plate for lithographic printing.
  • the weight of the coating after drying was about 2.7 g/m 2.
  • this printing plate was mounted on an offset printing machine and printing was carried out to obtain a large number of printed products with clear images.
  • a steel plate was treated by the method disclosed in European Patent Publication No. 20021 to provide an elecrodeposited chromium layer thereon, then immersed in an aqueous 5 wt.% caustic soda solution at 40 °C for one minute and after washing with water subjected to the same surface treatment as in Example 1, followed by washing with water and drying.
  • the amount of the layer was 0.13 mg/dm2 .
  • the diazo resin B is a hexafluorophosphoric acid salt obtained by mixing an aqueous 5 % diazo resin (trade name: D-012 produced by E.H.C. Co.) and an aqueous 10 % ammonium hexafluorophosphate, recovering the precipitates formed by suction filtration and drying the precipitates under reduced pressure at 30 to 40 ° C .
  • the above copolymer had a weight average molecular weight of 80,000, and further the molecular weight distribution of the above diazo resin was measured by gel permeation chromatography (GPC) to find that the fractions with molecular weights of trimer or lower comprise 93 % of the total fractions.).
  • the weight of the coating after drying was 2.0 g/m 2 ,
  • this printing plate was mounted on an offset printing machine and printing was carried out to obtain a large number of printed products with clear images.
  • a printing plate was obtained according to entirely the same procedure as in Example 1 except that the Electrolyte V (shown in Table 10) was employed in place of the Electrolyte IV in the main treatment step.
  • the printing performance was good similarly as in Example 1.
  • a printing plate was obtained according to entirely the same procedure as in Example 1 except that the surface treating solution as shown in Table 11 was employed as the surface treating solution in the surface treatment step.
  • the printing performance was good similarly as in Example 1.
  • a printing plate was obtained according to entirely the same procedure as in Example 1 except that the surface treating solution as shown in Table 12 was employed as the surface treating solution in the surface treatment step.
  • the printing performance was good similarly as in Example 1.
  • a printing plate was obtained according to entirely the same procedure as in Example 1 except that the surface treating solution as shown in Table 13 was employed as the surface treating solution in the surface treatment step.
  • the printing performance was good similarly as in Example 1.
  • Example 1 was repeated except that the surface treatment step was omitted to obtain a lithographic printing plate.
  • a lithographic printing plate was obtained according to entirely the same procedure as in Example 2 except that the surface treating solution as shown below was employed as the surface treating solution in the surface treatment step.
  • a lithographic printing plate was obtained according to entirely the same procedure as in Example 3 except that the surface treating solution as shown below was employed as the surface treating solution in the surface treatment step.
  • a lithographic printing plate was obtained according to entirely the same procedure as in Example 1 except that the surface treating solution as shown below was employed as the surface treating solution in the surface treatment step.
  • a lithographic printing plate was obtained according to entirely the same procedure as in Example 1 except that the surface treating solution as shown below was employed as the surface treating solution in the surface treatment step.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
EP83303513A 1982-06-18 1983-06-17 Support pour plaque d'impression lithographique et procédé de fabrication Expired EP0097502B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP57105726A JPS58220797A (ja) 1982-06-18 1982-06-18 平版印刷版用支持体およびその製造方法
JP105726/82 1982-06-18

Publications (3)

Publication Number Publication Date
EP0097502A2 true EP0097502A2 (fr) 1984-01-04
EP0097502A3 EP0097502A3 (en) 1984-02-15
EP0097502B1 EP0097502B1 (fr) 1988-01-13

Family

ID=14415304

Family Applications (1)

Application Number Title Priority Date Filing Date
EP83303513A Expired EP0097502B1 (fr) 1982-06-18 1983-06-17 Support pour plaque d'impression lithographique et procédé de fabrication

Country Status (4)

Country Link
US (1) US4522891A (fr)
EP (1) EP0097502B1 (fr)
JP (1) JPS58220797A (fr)
DE (1) DE3375290D1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4619742A (en) * 1984-07-04 1986-10-28 Hoechst Aktiengesellschaft Process for the simultaneous graining and chromium-plating of steel plates as supports for lithographic applications
US4687729A (en) * 1985-10-25 1987-08-18 Minnesota Mining And Manufacturing Company Lithographic plate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5906909A (en) * 1997-01-06 1999-05-25 Presstek, Inc. Wet lithographic printing constructions incorporating metallic inorganic layers

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2875047A (en) * 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses
GB802112A (en) * 1956-01-05 1958-10-01 Warren S D Co Improvements in magnetically imageable planographic printing plates and in a method of duplicating magnetic recordings utilising said plates
US3478684A (en) * 1965-11-22 1969-11-18 Schafler Armando B Planographic printing plates
JPS4927301A (fr) * 1972-07-03 1974-03-11
US3860426A (en) * 1972-12-22 1975-01-14 Eastman Kodak Co Subbed lithographic printing plate
FR2390760A1 (fr) * 1977-05-12 1978-12-08 Rhone Poulenc Graphic Nouvelles plaques lithographiques a base de photopolymeres et procedes de mise en oeuvre
JPS55156089A (en) * 1979-05-25 1980-12-04 Carbon Paper Kk Stamp material and stamp
JPS5624193A (en) * 1979-08-06 1981-03-07 Sachiko Kobayashi Plate material for printing
EP0024470A3 (fr) * 1979-08-21 1981-05-06 Ball Corporation Procédé et appareil pour compenser les variations de sensibilité dans un capteur d'image
JPS5667294A (en) * 1979-11-08 1981-06-06 Oji Paper Co Ltd Negative plate for flat plate printing
GB2081178A (en) * 1980-07-29 1982-02-17 Heidelberger Druckmasch Ag Sheet-guiding Foil as a Dressing for Back Pressure Cylinders
JPH063387B2 (ja) * 1985-09-04 1994-01-12 日本電装株式会社 熱式空気流量測定装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4619742A (en) * 1984-07-04 1986-10-28 Hoechst Aktiengesellschaft Process for the simultaneous graining and chromium-plating of steel plates as supports for lithographic applications
US4687729A (en) * 1985-10-25 1987-08-18 Minnesota Mining And Manufacturing Company Lithographic plate

Also Published As

Publication number Publication date
JPH043319B2 (fr) 1992-01-22
JPS58220797A (ja) 1983-12-22
EP0097502A3 (en) 1984-02-15
DE3375290D1 (en) 1988-02-18
US4522891A (en) 1985-06-11
EP0097502B1 (fr) 1988-01-13

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