ES463648A1 - Procedimiento para fabricar un dispositivo transistor con e-fecto de campo, de arseniuro de galio, microminiatura, de gran potencia y dispositivo transistor obtenido por dicho procedimiento. - Google Patents

Procedimiento para fabricar un dispositivo transistor con e-fecto de campo, de arseniuro de galio, microminiatura, de gran potencia y dispositivo transistor obtenido por dicho procedimiento.

Info

Publication number
ES463648A1
ES463648A1 ES463648A ES463648A ES463648A1 ES 463648 A1 ES463648 A1 ES 463648A1 ES 463648 A ES463648 A ES 463648A ES 463648 A ES463648 A ES 463648A ES 463648 A1 ES463648 A1 ES 463648A1
Authority
ES
Spain
Prior art keywords
gallium arsenide
field effect
high power
effect transistor
schottky barrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES463648A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of ES463648A1 publication Critical patent/ES463648A1/es
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching

Landscapes

  • Junction Field-Effect Transistors (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

Procedimiento para fabricar un dispositivo transistor con efecto de campo, de arseniuro de galio, microminiatura de gran potencia y dispositivo transistor obtenido por dicho procedimiento comprende las fases: de formar por lo menos una meseta epitaxial sobre un substrato de arseniuro de galio; formar sobre dicha meseta o mesetas una pluralidad de electrodos fuente, puerta y drenaje en una relación de intercalación separada entre si, comprendiendo cada uno de los electrodos una parte que se extiende más allá de por lo menos uno de los cantos opuestos de por lo menos una meseta y sobre el substrato; formar una barra de distribución de drenaje sobre el substrato adyacente a un canto de la meseta para unir entre sí los electrodos de drenaje.
ES463648A 1976-10-29 1977-10-28 Procedimiento para fabricar un dispositivo transistor con e-fecto de campo, de arseniuro de galio, microminiatura, de gran potencia y dispositivo transistor obtenido por dicho procedimiento. Expired ES463648A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/736,731 US4104672A (en) 1976-10-29 1976-10-29 High power gallium arsenide schottky barrier field effect transistor

Publications (1)

Publication Number Publication Date
ES463648A1 true ES463648A1 (es) 1978-07-16

Family

ID=24961079

Family Applications (1)

Application Number Title Priority Date Filing Date
ES463648A Expired ES463648A1 (es) 1976-10-29 1977-10-28 Procedimiento para fabricar un dispositivo transistor con e-fecto de campo, de arseniuro de galio, microminiatura, de gran potencia y dispositivo transistor obtenido por dicho procedimiento.

Country Status (11)

Country Link
US (1) US4104672A (es)
JP (1) JPS592384B2 (es)
BE (1) BE860064A (es)
CA (1) CA1092254A (es)
DE (1) DE2748103C3 (es)
ES (1) ES463648A1 (es)
FR (1) FR2369689A1 (es)
GB (1) GB1573775A (es)
IT (1) IT1091703B (es)
NL (1) NL7711887A (es)
SE (1) SE7711676L (es)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4201997A (en) * 1978-04-21 1980-05-06 Texas Instruments Incorporated MESFET semiconductor device and method of making
US4202003A (en) * 1978-04-21 1980-05-06 Texas Instruments Incorporated MESFET Semiconductor device and method of making
US4202001A (en) * 1978-05-05 1980-05-06 Rca Corporation Semiconductor device having grid for plating contacts
GB1601059A (en) * 1978-05-31 1981-10-21 Secr Defence Fet devices and their fabrication
FR2431768A1 (fr) * 1978-07-20 1980-02-15 Labo Electronique Physique Perfectionnement au procede de fabrication de dispositifs semi-conducteurs par auto-alignement et dispositifs obtenus
US4266333A (en) * 1979-04-27 1981-05-12 Rca Corporation Method of making a Schottky barrier field effect transistor
JPS566476A (en) * 1979-06-28 1981-01-23 Nec Corp Ultrahigh frequency field effect transistor
FR2461358A1 (fr) * 1979-07-06 1981-01-30 Thomson Csf Procede de realisation d'un transistor a effet de champ a grille auto-alignee, et transistor obtenu par ce procede
JPS5696657U (es) * 1979-12-21 1981-07-31
DE3177208D1 (de) * 1980-11-17 1990-10-04 Ball Corp Integrierter monolithischer mikrowellenschaltkreis mit integraler antennenanordnung.
US4380022A (en) * 1980-12-09 1983-04-12 The United States Of America As Represented By The Secretary Of The Navy Monolithic fully integrated class B push-pull microwave GaAs MESFET with differential inputs and outputs with reduced Miller effect
CA1200017A (en) * 1981-12-04 1986-01-28 Ho C. Huang Microwave field effect transistor
JPS58100462A (ja) * 1981-12-10 1983-06-15 Fujitsu Ltd 電界効果形トランジスタ
US4583107A (en) * 1983-08-15 1986-04-15 Westinghouse Electric Corp. Castellated gate field effect transistor
US4495431A (en) * 1983-08-22 1985-01-22 United Technologies Corporation Low reflectivity surface-mounted electrodes on semiconductive saw devices
FR2558647B1 (fr) * 1984-01-23 1986-05-09 Labo Electronique Physique Transistor a effet de champ de type schottky pour applications hyperfrequences et procede de realisation permettant d'obtenir un tel transistor
JPH0682686B2 (ja) * 1987-03-20 1994-10-19 日本ビクター株式会社 電界効果トランジスタ
US4899201A (en) * 1987-08-14 1990-02-06 Regents Of The University Of Minnesota Electronic and optoelectric devices utilizing light hole properties
US4947062A (en) * 1988-05-19 1990-08-07 Adams Russell Electronics Co., Inc. Double balanced mixing
JPH04171734A (ja) * 1990-11-02 1992-06-18 Mitsubishi Electric Corp 半導体装置
JPH04252036A (ja) * 1991-01-10 1992-09-08 Fujitsu Ltd 半導体装置
JP2580966B2 (ja) * 1993-08-05 1997-02-12 日本電気株式会社 半導体装置
US5698870A (en) * 1996-07-22 1997-12-16 The United States Of America As Represented By The Secretary Of The Air Force High electron mobility transistor (HEMT) and pseudomorphic high electron mobility transistor (PHEMT) devices with single layer integrated metal
JP3499103B2 (ja) * 1997-02-21 2004-02-23 三菱電機株式会社 半導体装置
US6127272A (en) * 1998-01-26 2000-10-03 Motorola, Inc. Method of electron beam lithography on very high resistivity substrates
IT1392321B1 (it) * 2008-12-15 2012-02-24 St Microelectronics Srl Sistema sensore/attuatore interamente in materiale organico
US11929408B2 (en) 2020-05-14 2024-03-12 Macom Technology Solutions Holdings, Inc. Layout techniques and optimization for power transistors

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2120388A1 (de) * 1970-04-28 1971-12-16 Agency Ind Science Techn Verbindungshalbleitervorrichtung
US3737743A (en) * 1971-12-23 1973-06-05 Gen Electric High power microwave field effect transistor
US3855613A (en) * 1973-06-22 1974-12-17 Rca Corp A solid state switch using an improved junction field effect transistor
JPS5631751B2 (es) * 1973-08-28 1981-07-23
US3969745A (en) * 1974-09-18 1976-07-13 Texas Instruments Incorporated Interconnection in multi element planar structures
US4016643A (en) * 1974-10-29 1977-04-12 Raytheon Company Overlay metallization field effect transistor
US4015278A (en) * 1974-11-26 1977-03-29 Fujitsu Ltd. Field effect semiconductor device
US3988619A (en) * 1974-12-27 1976-10-26 International Business Machines Corporation Random access solid-state image sensor with non-destructive read-out

Also Published As

Publication number Publication date
DE2748103A1 (de) 1978-05-11
SE7711676L (sv) 1978-04-30
FR2369689B1 (es) 1982-04-09
GB1573775A (en) 1980-08-28
IT1091703B (it) 1985-07-06
CA1092254A (en) 1980-12-23
BE860064A (fr) 1978-02-15
DE2748103B2 (de) 1980-09-18
US4104672A (en) 1978-08-01
JPS592384B2 (ja) 1984-01-18
FR2369689A1 (fr) 1978-05-26
DE2748103C3 (de) 1981-05-14
NL7711887A (nl) 1978-05-03
JPS5356978A (en) 1978-05-23

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