JPH0332779B2 - - Google Patents

Info

Publication number
JPH0332779B2
JPH0332779B2 JP15745483A JP15745483A JPH0332779B2 JP H0332779 B2 JPH0332779 B2 JP H0332779B2 JP 15745483 A JP15745483 A JP 15745483A JP 15745483 A JP15745483 A JP 15745483A JP H0332779 B2 JPH0332779 B2 JP H0332779B2
Authority
JP
Japan
Prior art keywords
formula
polymer
general formula
groups
tetrafluoroborate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15745483A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6049334A (ja
Inventor
Shoji Watanabe
Shohei Kosakai
Masao Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP15745483A priority Critical patent/JPS6049334A/ja
Publication of JPS6049334A publication Critical patent/JPS6049334A/ja
Publication of JPH0332779B2 publication Critical patent/JPH0332779B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP15745483A 1983-08-29 1983-08-29 感光性組成物 Granted JPS6049334A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15745483A JPS6049334A (ja) 1983-08-29 1983-08-29 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15745483A JPS6049334A (ja) 1983-08-29 1983-08-29 感光性組成物

Publications (2)

Publication Number Publication Date
JPS6049334A JPS6049334A (ja) 1985-03-18
JPH0332779B2 true JPH0332779B2 (lt) 1991-05-14

Family

ID=15650007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15745483A Granted JPS6049334A (ja) 1983-08-29 1983-08-29 感光性組成物

Country Status (1)

Country Link
JP (1) JPS6049334A (lt)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04330445A (ja) * 1991-02-08 1992-11-18 Fuji Photo Film Co Ltd 光重合性組成物
JPH075687A (ja) * 1993-06-18 1995-01-10 Mitsui Toatsu Chem Inc 液状エッチングレジスト及びエッチングレジスト被膜を形成した銅張り積層板

Also Published As

Publication number Publication date
JPS6049334A (ja) 1985-03-18

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