JPH045978B2 - - Google Patents

Info

Publication number
JPH045978B2
JPH045978B2 JP58070493A JP7049383A JPH045978B2 JP H045978 B2 JPH045978 B2 JP H045978B2 JP 58070493 A JP58070493 A JP 58070493A JP 7049383 A JP7049383 A JP 7049383A JP H045978 B2 JPH045978 B2 JP H045978B2
Authority
JP
Japan
Prior art keywords
exposure mask
cleaning
section
defect detection
protective case
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58070493A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59195644A (ja
Inventor
Hiromi Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP58070493A priority Critical patent/JPS59195644A/ja
Publication of JPS59195644A publication Critical patent/JPS59195644A/ja
Publication of JPH045978B2 publication Critical patent/JPH045978B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP58070493A 1983-04-21 1983-04-21 露光マスク洗浄装置 Granted JPS59195644A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070493A JPS59195644A (ja) 1983-04-21 1983-04-21 露光マスク洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070493A JPS59195644A (ja) 1983-04-21 1983-04-21 露光マスク洗浄装置

Publications (2)

Publication Number Publication Date
JPS59195644A JPS59195644A (ja) 1984-11-06
JPH045978B2 true JPH045978B2 (de) 1992-02-04

Family

ID=13433097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070493A Granted JPS59195644A (ja) 1983-04-21 1983-04-21 露光マスク洗浄装置

Country Status (1)

Country Link
JP (1) JPS59195644A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0695511B2 (ja) * 1986-09-17 1994-11-24 大日本スクリ−ン製造株式会社 洗浄乾燥処理方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5441158B2 (de) * 1973-07-14 1979-12-06
JPS55102233A (en) * 1979-01-30 1980-08-05 Matsushita Electric Ind Co Ltd Removing method of dust

Also Published As

Publication number Publication date
JPS59195644A (ja) 1984-11-06

Similar Documents

Publication Publication Date Title
US4595289A (en) Inspection system utilizing dark-field illumination
JP4722244B2 (ja) 所定のフォトリソグラフィ工程に従って基板を加工する装置
JP3183046B2 (ja) 異物検査装置及びそれを用いた半導体デバイスの製造方法
KR100788055B1 (ko) 기판 결함 검출 장치 및 방법과 기판 식별 번호 검출 방법
JPH07209202A (ja) 表面状態検査装置、該表面状態検査装置を備える露光装置及び該露光装置を用いてデバイスを製造する方法
JPH061370B2 (ja) マスク欠陥検査装置
JPH0815169A (ja) 異物検査装置及びそれを用いた半導体デバイスの製造 方法
KR102831993B1 (ko) 결함 검사 장치, 결함 검사 방법 및 포토마스크 블랭크의 제조 방법
EP0065411B1 (de) Maschinen-lokale Masken-Inspektionseinrichtung
JPH045979B2 (de)
JPS59195644A (ja) 露光マスク洗浄装置
JPH0979991A (ja) パターン検査装置、欠陥検査装置およびパターン検査方法
JPS6138448B2 (de)
JPH0951028A (ja) フォトマスク管理システム
JPH06258235A (ja) 面検査装置
US7457454B1 (en) Detailed grey scale inspection method and apparatus
JP2919192B2 (ja) レチクル洗浄装置
WO2006019446A2 (en) Double inspection of reticle or wafer
JPH11191524A (ja) フォトリソプロセス装置
JPH0815167A (ja) 異物検査装置及びそれを用いた半導体デバイスの製造 方法
Ishihara et al. High-speed reticle qualification system
JPS58164227A (ja) パタ−ン欠陥検査方法
JPH0815168A (ja) 異物検査装置及びそれを用いた半導体デバイスの製造 方法
JPS60167424A (ja) 検査装置
JPS6161420A (ja) 露光マスク上の異物検査装置