JPS5554572A - Etching method - Google Patents

Etching method

Info

Publication number: JPS5554572A
Authority: JP; Japan
Prior art keywords: film; etching; carried out; gas; processed
Prior art date: 1978-10-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP12462478A

Other languages

English (en)

Japanese (ja)

Other versions

JPS6115156B2 (fr

Inventor

Hiroshi Ono

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Toshiba Corp

Original Assignee

Toshiba Corp

Tokyo Shibaura Electric Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1978-10-12

Filing date

1978-10-12

Publication date

1980-04-21

1978-10-12 Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp

1978-10-12 Priority to JP12462478A priority Critical patent/JPS5554572A/ja

1980-04-21 Publication of JPS5554572A publication Critical patent/JPS5554572A/ja

1986-04-22 Publication of JPS6115156B2 publication Critical patent/JPS6115156B2/ja

Status Granted legal-status Critical Current

Links

238000005530 etching Methods 0.000 title abstract 5
238000000034 method Methods 0.000 title abstract 3
239000011248 coating agent Substances 0.000 abstract 2
238000000576 coating method Methods 0.000 abstract 2
239000000463 material Substances 0.000 abstract 2
VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 abstract 2
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
238000004519 manufacturing process Methods 0.000 abstract 1
238000000059 patterning Methods 0.000 abstract 1
229920002120 photoresistant polymer Polymers 0.000 abstract 1
238000001020 plasma etching Methods 0.000 abstract 1
239000004065 semiconductor Substances 0.000 abstract 1
229910052710 silicon Inorganic materials 0.000 abstract 1
239000010703 silicon Substances 0.000 abstract 1
238000004544 sputter deposition Methods 0.000 abstract 1
239000000758 substrate Substances 0.000 abstract 1
238000004381 surface treatment Methods 0.000 abstract 1

Landscapes

ing And Chemical Polishing (AREA)
Drying Of Semiconductors (AREA)

JP12462478A 1978-10-12 1978-10-12 Etching method Granted JPS5554572A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP12462478A JPS5554572A (en)	1978-10-12	1978-10-12	Etching method

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP12462478A JPS5554572A (en)	1978-10-12	1978-10-12	Etching method

Publications (2)

Publication Number	Publication Date
JPS5554572A true JPS5554572A (en)	1980-04-21
JPS6115156B2 JPS6115156B2 (fr)	1986-04-22

Family

ID=14890018

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP12462478A Granted JPS5554572A (en)	1978-10-12	1978-10-12	Etching method

Country Status (1)

Country	Link
JP (1)	JPS5554572A (fr)

1978
- 1978-10-12 JP JP12462478A patent/JPS5554572A/ja active Granted

Also Published As

Publication number	Publication date
JPS6115156B2 (fr)	1986-04-22

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