JPS6317903A - 光硬化性樹脂組成物 - Google Patents

光硬化性樹脂組成物

Info

Publication number
JPS6317903A
JPS6317903A JP16313086A JP16313086A JPS6317903A JP S6317903 A JPS6317903 A JP S6317903A JP 16313086 A JP16313086 A JP 16313086A JP 16313086 A JP16313086 A JP 16313086A JP S6317903 A JPS6317903 A JP S6317903A
Authority
JP
Japan
Prior art keywords
resin
parts
resin particles
light
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16313086A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0458801B2 (fr
Inventor
Kazunori Kanda
和典 神田
Ryuzo Mizuguchi
隆三 水口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP16313086A priority Critical patent/JPS6317903A/ja
Publication of JPS6317903A publication Critical patent/JPS6317903A/ja
Publication of JPH0458801B2 publication Critical patent/JPH0458801B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP16313086A 1986-07-10 1986-07-10 光硬化性樹脂組成物 Granted JPS6317903A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16313086A JPS6317903A (ja) 1986-07-10 1986-07-10 光硬化性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16313086A JPS6317903A (ja) 1986-07-10 1986-07-10 光硬化性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6317903A true JPS6317903A (ja) 1988-01-25
JPH0458801B2 JPH0458801B2 (fr) 1992-09-18

Family

ID=15767763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16313086A Granted JPS6317903A (ja) 1986-07-10 1986-07-10 光硬化性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6317903A (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0298995A (ja) * 1988-10-06 1990-04-11 Ibiden Co Ltd 多層配線板の製造方法
JPH04274428A (ja) * 1991-03-01 1992-09-30 Nippon Paint Co Ltd オフセット印刷用感光性組成物
US5743463A (en) * 1994-12-21 1998-04-28 Ntc Kogyo Kabushiki Kaisha Automatic water combination faucet
US7208260B2 (en) 1998-12-31 2007-04-24 Hynix Semiconductor Inc. Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55149302A (en) * 1979-02-01 1980-11-20 Dentsply Int Inc Hardening composition
JPS58190945A (ja) * 1982-04-22 1983-11-08 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− 交叉結合ビ−ズ含有光感受性コ−テイング
JPH0852303A (ja) * 1995-05-23 1996-02-27 Kanegafuchi Chem Ind Co Ltd 体外循環治療用吸着カラムの保存安定性を改良する方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55149302A (en) * 1979-02-01 1980-11-20 Dentsply Int Inc Hardening composition
JPS58190945A (ja) * 1982-04-22 1983-11-08 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− 交叉結合ビ−ズ含有光感受性コ−テイング
JPH0852303A (ja) * 1995-05-23 1996-02-27 Kanegafuchi Chem Ind Co Ltd 体外循環治療用吸着カラムの保存安定性を改良する方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0298995A (ja) * 1988-10-06 1990-04-11 Ibiden Co Ltd 多層配線板の製造方法
JPH04274428A (ja) * 1991-03-01 1992-09-30 Nippon Paint Co Ltd オフセット印刷用感光性組成物
US5743463A (en) * 1994-12-21 1998-04-28 Ntc Kogyo Kabushiki Kaisha Automatic water combination faucet
US7208260B2 (en) 1998-12-31 2007-04-24 Hynix Semiconductor Inc. Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same

Also Published As

Publication number Publication date
JPH0458801B2 (fr) 1992-09-18

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