JPS6477111A - Removal of static electricity of wafer - Google Patents
Removal of static electricity of waferInfo
- Publication number
- JPS6477111A JPS6477111A JP23419987A JP23419987A JPS6477111A JP S6477111 A JPS6477111 A JP S6477111A JP 23419987 A JP23419987 A JP 23419987A JP 23419987 A JP23419987 A JP 23419987A JP S6477111 A JPS6477111 A JP S6477111A
- Authority
- JP
- Japan
- Prior art keywords
- static electricity
- potential
- wafer
- removal
- wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005611 electricity Effects 0.000 title abstract 5
- 230000003068 static effect Effects 0.000 title abstract 5
- 229910003327 LiNbO3 Inorganic materials 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 230000003287 optical effect Effects 0.000 abstract 2
- 235000012431 wafers Nutrition 0.000 abstract 2
- 230000000694 effects Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Elimination Of Static Electricity (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23419987A JPS6477111A (en) | 1987-09-18 | 1987-09-18 | Removal of static electricity of wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23419987A JPS6477111A (en) | 1987-09-18 | 1987-09-18 | Removal of static electricity of wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6477111A true JPS6477111A (en) | 1989-03-23 |
Family
ID=16967240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23419987A Pending JPS6477111A (en) | 1987-09-18 | 1987-09-18 | Removal of static electricity of wafer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6477111A (ja) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5966782A (en) * | 1996-06-03 | 1999-10-19 | Daiwa Kasei Kogyo Kabushiki Kaisha | Fastener |
| JP2001210664A (ja) * | 1999-07-02 | 2001-08-03 | Matsushita Electric Ind Co Ltd | 電荷発生半導体基板用バンプ形成装置、電荷発生半導体基板の除電方法、電荷発生半導体基板用除電装置、及び電荷発生半導体基板 |
| US7005368B1 (en) | 1999-07-02 | 2006-02-28 | Matsushita Electric Industrial Co., Ltd. | Bump forming apparatus for charge appearance semiconductor substrate, charge removal method for charge appearance semiconductor substrate, charge removing unit for charge appearance semiconductor substrate, and charge appearance semiconductor substrate |
| JP2013041967A (ja) * | 2011-08-15 | 2013-02-28 | Disco Abrasive Syst Ltd | 分割装置 |
| US8801070B2 (en) | 2010-06-04 | 2014-08-12 | Aisin Seiki Kabushiki Kaisha | Garnish and mounting structure |
| CN111206773A (zh) * | 2020-01-19 | 2020-05-29 | 重庆渝能建筑安装工程有限公司 | 基于bim虚拟仿真的高支模板施工辅助系统及其施工方法 |
-
1987
- 1987-09-18 JP JP23419987A patent/JPS6477111A/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5966782A (en) * | 1996-06-03 | 1999-10-19 | Daiwa Kasei Kogyo Kabushiki Kaisha | Fastener |
| US6317937B1 (en) | 1996-06-03 | 2001-11-20 | Daiwa Kasei Kogyo Kabushiki Kaisha | Fastener structure assembly |
| JP2001210664A (ja) * | 1999-07-02 | 2001-08-03 | Matsushita Electric Ind Co Ltd | 電荷発生半導体基板用バンプ形成装置、電荷発生半導体基板の除電方法、電荷発生半導体基板用除電装置、及び電荷発生半導体基板 |
| US7005368B1 (en) | 1999-07-02 | 2006-02-28 | Matsushita Electric Industrial Co., Ltd. | Bump forming apparatus for charge appearance semiconductor substrate, charge removal method for charge appearance semiconductor substrate, charge removing unit for charge appearance semiconductor substrate, and charge appearance semiconductor substrate |
| US7014092B2 (en) * | 1999-07-02 | 2006-03-21 | Matsushita Electric Industrial Co., Ltd. | Bump forming apparatus for charge appearance semiconductor substrate, charge removal method for charge appearance semiconductor substrate, charge removing unit for charge appearance semiconductor substrate, and charge appearance semiconductor substrate |
| US8801070B2 (en) | 2010-06-04 | 2014-08-12 | Aisin Seiki Kabushiki Kaisha | Garnish and mounting structure |
| JP2013041967A (ja) * | 2011-08-15 | 2013-02-28 | Disco Abrasive Syst Ltd | 分割装置 |
| CN111206773A (zh) * | 2020-01-19 | 2020-05-29 | 重庆渝能建筑安装工程有限公司 | 基于bim虚拟仿真的高支模板施工辅助系统及其施工方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE380397T1 (de) | Verfahren und apparat zur herstellung von photovoltaischen vorrichtungen und daraus entstehendes produkt | |
| ATE35107T1 (de) | Oberflaechenbearbeitung von kunststoffen. | |
| GB2014790A (en) | Semiconductor substrate and method of manufacture thereof | |
| DE2962352D1 (en) | Process for treating the surface of plastics and film produced by this process | |
| ATE54341T1 (de) | Mikrowellenvorrichtung und verfahren zur herstellung von halbleiterteilen und halbleiterteile nach diesem verfahren. | |
| IL60888A (en) | Substrates and process for the quantitative assay of enzymes | |
| JPS6477111A (en) | Removal of static electricity of wafer | |
| BE870594A (fr) | Appareil et procédé de fabrication d'articles de verre soufflés | |
| ATE292842T1 (de) | Verfahren und vorrichtung zur oberflächenbehandlung von substraten | |
| DK147183D0 (da) | Fremgangsmade til behandling af belaegningsbaerende glas samt glas frembragt ved fremgangsmaden | |
| JPS5518469A (en) | Method of treating surface | |
| DE69125268D1 (de) | Verfahren und vorrichtung zum herstellen von übergängen durch diffusion in substrate von solarzellen | |
| EP0226311A3 (en) | Process for annealing iii-v compound semiconductor material | |
| ATE54340T1 (de) | Plasmareaktorgefaess und verfahren. | |
| JPS6428809A (en) | Laser annealing device | |
| JPS57202726A (en) | Manufacture of semiconductor device | |
| JPS5376748A (en) | Forming method of insulation fulm | |
| JPS6489572A (en) | Manufacture of high temperature superconducting thin film | |
| JPS6443384A (en) | Steam washing method and washer | |
| JPS5476066A (en) | Pattern forming method | |
| JPS6450534A (en) | Method of forming oxide film of element semiconductor | |
| DE3889967D1 (de) | Mikrolithographisches Verfahren zur Herstellung von Schaltungen unter Verwendung von für elektromagnetische Strahlungen und geladene Teilchen empfindlichen organischen leitfähigen Filmen. | |
| GB2028175B (en) | Process for rinsing or other treatment of articles in plants for surface treatment | |
| JPS5599726A (en) | Method and device for plasma treatment | |
| RU2072176C1 (ru) | Способ выделения платиноидов с поверхности подложки |