ATE250497T1 - Verfahren zur herstellung lithographischen druckplatten - Google Patents
Verfahren zur herstellung lithographischen druckplattenInfo
- Publication number
- ATE250497T1 ATE250497T1 AT98939401T AT98939401T ATE250497T1 AT E250497 T1 ATE250497 T1 AT E250497T1 AT 98939401 T AT98939401 T AT 98939401T AT 98939401 T AT98939401 T AT 98939401T AT E250497 T1 ATE250497 T1 AT E250497T1
- Authority
- AT
- Austria
- Prior art keywords
- imaging
- layer
- imaging layer
- imaged
- lithographic printing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000003384 imaging method Methods 0.000 abstract 7
- 230000005855 radiation Effects 0.000 abstract 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 abstract 2
- 239000004202 carbamide Substances 0.000 abstract 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 150000002825 nitriles Chemical class 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 229940124530 sulfonamide Drugs 0.000 abstract 2
- 150000003456 sulfonamides Chemical class 0.000 abstract 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 abstract 1
- 238000010521 absorption reaction Methods 0.000 abstract 1
- -1 alkoxymethyl amide Chemical class 0.000 abstract 1
- 150000001408 amides Chemical class 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 230000005660 hydrophilic surface Effects 0.000 abstract 1
- 230000002401 inhibitory effect Effects 0.000 abstract 1
- XMYQHJDBLRZMLW-UHFFFAOYSA-N methanolamine Chemical compound NCO XMYQHJDBLRZMLW-UHFFFAOYSA-N 0.000 abstract 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 abstract 1
- 230000001052 transient effect Effects 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/922,190 US6060217A (en) | 1997-09-02 | 1997-09-02 | Thermal lithographic printing plates |
| PCT/US1998/016886 WO1999011458A1 (en) | 1997-09-02 | 1998-08-14 | Thermal lithographic printing plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE250497T1 true ATE250497T1 (de) | 2003-10-15 |
Family
ID=25446668
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT98939401T ATE250497T1 (de) | 1997-09-02 | 1998-08-14 | Verfahren zur herstellung lithographischen druckplatten |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6060217A (de) |
| EP (1) | EP0939698B1 (de) |
| AT (1) | ATE250497T1 (de) |
| DE (1) | DE69818421T2 (de) |
| ES (1) | ES2206975T3 (de) |
| WO (1) | WO1999011458A1 (de) |
Families Citing this family (61)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL122318A (en) * | 1996-04-23 | 2001-01-28 | Horsell Graphic Ind Ltd | Lithographic printing forms |
| BR9810668A (pt) * | 1997-07-05 | 2001-09-04 | Kodak Polychrome Graphics Co | Processos para formação de moldes e materiais sensìveis a radiação |
| US6573022B1 (en) | 1997-10-17 | 2003-06-03 | Fuji Photo Film Co., Ltd. | Positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser |
| US6399279B1 (en) | 1998-01-16 | 2002-06-04 | Mitsubishi Chemical Corporation | Method for forming a positive image |
| EP0934822B1 (de) * | 1998-02-04 | 2005-05-04 | Mitsubishi Chemical Corporation | Positiv arbeitende lichtempfindliche Zusammensetzung, lichtempfindliche Druckplatte und Verfahren zur Herstellung eines positiven Bildes |
| GB9806478D0 (en) * | 1998-03-27 | 1998-05-27 | Horsell Graphic Ind Ltd | Pattern formation |
| IT1299220B1 (it) * | 1998-05-12 | 2000-02-29 | Lastra Spa | Composizione sensibile sia a radiazioni ir che a radiazioni uv e lastra litografica |
| JP3509612B2 (ja) * | 1998-05-29 | 2004-03-22 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性重合体組成物、レリーフパターンの製造法及び電子部品 |
| DE19825244A1 (de) * | 1998-06-05 | 1999-12-16 | Kodak Polychrome Graphics Gmbh | Offsetdruckplatte mit hoher Auflagenstabilität |
| US6358669B1 (en) * | 1998-06-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6534238B1 (en) | 1998-06-23 | 2003-03-18 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
| US6352811B1 (en) | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| DE69930019T2 (de) * | 1998-08-24 | 2006-10-12 | Fuji Photo Film Co., Ltd., Minami-Ashigara | Lichtempfindliche Harzzusammensetzung und Flachdruckplatte |
| GB2342459B (en) * | 1998-10-07 | 2003-01-15 | Horsell Graphic Ind Ltd | Improvements in relation to electronic parts |
| EP1872943B1 (de) * | 1999-05-21 | 2009-08-12 | FUJIFILM Corporation | Lichtempfindliche Zusammensetzung und Flachdruckplattenbasis damit |
| EP1072404B1 (de) * | 1999-07-30 | 2003-05-21 | Lastra S.P.A. | Infrarotstrahlungs- und wärme-empfindliche Zusammensetzung, und lithographische Druckplatte, die mit dieser Zusammensetzung beschichtet ist |
| US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| US6245481B1 (en) * | 1999-10-12 | 2001-06-12 | Gary Ganghui Teng | On-press process of lithographic plates having a laser sensitive mask layer |
| US6232031B1 (en) * | 1999-11-08 | 2001-05-15 | Ano-Coil Corporation | Positive-working, infrared-sensitive lithographic printing plate and method of imaging |
| US6300038B1 (en) | 1999-11-19 | 2001-10-09 | Kodak Polychrome Graphics Llc | Articles having imagable coatings |
| US6391524B2 (en) * | 1999-11-19 | 2002-05-21 | Kodak Polychrome Graphics Llc | Article having imagable coatings |
| US6534241B2 (en) | 2000-01-12 | 2003-03-18 | Howard A. Fromson | Method of actinically imaging a semiconductor |
| US6884561B2 (en) | 2000-01-12 | 2005-04-26 | Anocoil Corporation | Actinically imageable and infrared heated printing plate |
| US6355398B1 (en) | 2000-01-12 | 2002-03-12 | Howard A. Fromson | Method of actinically imaging |
| US6692896B2 (en) * | 2000-03-01 | 2004-02-17 | Fuji Photo Film Co., Ltd. | Heat mode-compatible planographic printing plate |
| JP2001305722A (ja) | 2000-04-18 | 2001-11-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US6506533B1 (en) * | 2000-06-07 | 2003-01-14 | Kodak Polychrome Graphics Llc | Polymers and their use in imagable products and image-forming methods |
| ATE421558T1 (de) | 2000-07-06 | 2009-02-15 | Cabot Corp | Modifizierte pigmente, deren dispersionen und zusammensetzungen die diese enthalten |
| AU2001281317A1 (en) | 2000-08-04 | 2002-02-18 | Kodak Polychrome Graphics Co. Ltd. | Lithographic printing form and method of preparation and use thereof |
| US6649324B1 (en) * | 2000-08-14 | 2003-11-18 | Kodak Polychrome Graphics Llc | Aqueous developer for lithographic printing plates |
| US6555291B1 (en) | 2000-08-14 | 2003-04-29 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
| US20080192233A1 (en) * | 2000-08-18 | 2008-08-14 | Veil Corporation | Near infrared electromagnetic radiation absorbing composition and method of use |
| US6794431B1 (en) | 2000-08-18 | 2004-09-21 | Veil Corporation | Near infrared electromagnetic radiation absorbing composition and method of use |
| WO2002034517A1 (en) | 2000-10-26 | 2002-05-02 | Kodak Polychrome Graphics Company, Ltd. | Compositions comprising a pigment |
| ATE420767T1 (de) * | 2000-11-30 | 2009-01-15 | Fujifilm Corp | Lithographische druckplattenvorläufer |
| US6613494B2 (en) | 2001-03-13 | 2003-09-02 | Kodak Polychrome Graphics Llc | Imageable element having a protective overlayer |
| US6436601B1 (en) * | 2001-06-25 | 2002-08-20 | Citiplate, Inc. | Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements |
| JP3917422B2 (ja) * | 2001-07-26 | 2007-05-23 | 富士フイルム株式会社 | 画像形成材料 |
| US6593055B2 (en) | 2001-09-05 | 2003-07-15 | Kodak Polychrome Graphics Llc | Multi-layer thermally imageable element |
| JP2003162045A (ja) | 2001-11-26 | 2003-06-06 | Fuji Photo Film Co Ltd | 平版印刷用原板 |
| US20050003296A1 (en) * | 2002-03-15 | 2005-01-06 | Memetea Livia T. | Development enhancement of radiation-sensitive elements |
| US6911293B2 (en) * | 2002-04-11 | 2005-06-28 | Clariant Finance (Bvi) Limited | Photoresist compositions comprising acetals and ketals as solvents |
| US6849372B2 (en) * | 2002-07-30 | 2005-02-01 | Kodak Polychrome Graphics | Method of manufacturing imaging compositions |
| US20040023160A1 (en) * | 2002-07-30 | 2004-02-05 | Kevin Ray | Method of manufacturing imaging compositions |
| US20040067435A1 (en) * | 2002-09-17 | 2004-04-08 | Fuji Photo Film Co., Ltd. | Image forming material |
| US6858359B2 (en) | 2002-10-04 | 2005-02-22 | Kodak Polychrome Graphics, Llp | Thermally sensitive, multilayer imageable element |
| US7160667B2 (en) * | 2003-01-24 | 2007-01-09 | Fuji Photo Film Co., Ltd. | Image forming material |
| CN1802603A (zh) | 2003-07-17 | 2006-07-12 | 霍尼韦尔国际公司 | 用于高级微电子应用的平面化薄膜及其生产装置和方法 |
| AU2005231729A1 (en) * | 2004-03-26 | 2005-10-20 | Presstek, Inc. | Printing members having solubility-transition layers and related methods |
| US7060416B2 (en) * | 2004-04-08 | 2006-06-13 | Eastman Kodak Company | Positive-working, thermally sensitive imageable element |
| US7279263B2 (en) * | 2004-06-24 | 2007-10-09 | Kodak Graphic Communications Canada Company | Dual-wavelength positive-working radiation-sensitive elements |
| US6969579B1 (en) | 2004-12-21 | 2005-11-29 | Eastman Kodak Company | Solvent resistant imageable element |
| US20060210917A1 (en) * | 2005-03-18 | 2006-09-21 | Kodak Polychrome Graphics Llc | Positive-working, thermally sensitive imageable element |
| US7291440B2 (en) * | 2005-05-16 | 2007-11-06 | Eastman Kodak Company | Bakeable multi-layer imageable element |
| BRPI0611018B1 (pt) | 2005-06-03 | 2017-03-07 | American Dye Source Inc | copolímeros de acetal de absorção próxima do infravermelho termicamente reativos, métodos de preparo e métodos de uso |
| US7144661B1 (en) | 2005-11-01 | 2006-12-05 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
| US7544462B2 (en) | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
| US8298750B2 (en) | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
| CN102482310B (zh) | 2009-10-29 | 2015-08-19 | 米兰集团 | 用于平版印刷版涂料组合物的棓单宁类化合物 |
| CN113831329B (zh) * | 2021-11-05 | 2024-05-14 | 乐凯华光印刷科技有限公司 | 一种交联剂及其制备方法和应用 |
| CN117024311B (zh) * | 2023-07-07 | 2026-01-30 | 乐凯华光印刷科技有限公司 | 一种大环化合物及其应用、包含大环化合物的免处理热敏版前体和免处理热敏版及应用 |
Family Cites Families (104)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3046121A (en) * | 1949-07-23 | 1962-07-24 | Azoplate Corp | Process for the manufacture of printing plates and light-sensitive material suttablefor use therein |
| NL76414C (de) * | 1949-07-23 | |||
| US3046119A (en) * | 1950-08-01 | 1962-07-24 | Azoplate Corp | Light sensitive material for printing and process for making printing plates |
| BE506677A (de) * | 1950-10-31 | |||
| NL78025C (de) * | 1951-02-02 | |||
| US2767092A (en) * | 1951-12-06 | 1956-10-16 | Azoplate Corp | Light sensitive material for lithographic printing |
| GB742557A (en) * | 1952-10-01 | 1955-12-30 | Kalle & Co Ag | Light-sensitive material for photomechanical reproduction and process for the production of images |
| GB772517A (en) * | 1954-02-06 | 1957-04-17 | Kalle & Co Ag | Improvements in or relating to photo-mechanical reproduction |
| NL199728A (de) * | 1954-08-20 | |||
| US2907665A (en) * | 1956-12-17 | 1959-10-06 | Cons Electrodynamics Corp | Vitreous enamel |
| NL247299A (de) * | 1959-01-14 | |||
| BE593836A (de) * | 1959-08-05 | |||
| US3105465A (en) * | 1960-05-31 | 1963-10-01 | Oliver O Peters | Hot water heater |
| US3206601A (en) | 1963-05-21 | 1965-09-14 | Keuffel & Esser Co | Plastic film thermography |
| US3635709A (en) * | 1966-12-15 | 1972-01-18 | Polychrome Corp | Light-sensitive lithographic plate |
| GB1170495A (en) | 1967-03-31 | 1969-11-12 | Agfa Gevaert Nv | Radiation-Sensitive Recording Material |
| GB1231789A (de) | 1967-09-05 | 1971-05-12 | ||
| GB1245924A (en) | 1967-09-27 | 1971-09-15 | Agfa Gevaert | Improvements relating to thermo-recording |
| US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
| US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
| JPS5024641B2 (de) * | 1972-10-17 | 1975-08-18 | ||
| US3891439A (en) * | 1972-11-02 | 1975-06-24 | Polychrome Corp | Aqueous developing composition for lithographic diazo printing plates |
| US3859099A (en) * | 1972-12-22 | 1975-01-07 | Eastman Kodak Co | Positive plate incorporating diazoquinone |
| CA1085212A (en) | 1975-05-27 | 1980-09-09 | Ronald H. Engebrecht | Use of volatile carboxylic acids in improved photoresists containing quinone diazides |
| DE2543820C2 (de) | 1975-10-01 | 1984-10-31 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung von Flachdruckformen mittels Laserstrahlen |
| DE2607207C2 (de) * | 1976-02-23 | 1983-07-14 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen |
| GB1603920A (en) | 1978-05-31 | 1981-12-02 | Vickers Ltd | Lithographic printing plates |
| JPS5560944A (en) * | 1978-10-31 | 1980-05-08 | Fuji Photo Film Co Ltd | Image forming method |
| DE3009873A1 (de) * | 1979-03-16 | 1980-09-25 | Daicel Chem | Photoempfindliche masse |
| JPS561045A (en) * | 1979-06-16 | 1981-01-08 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS561044A (en) * | 1979-06-16 | 1981-01-08 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS569740A (en) * | 1979-07-05 | 1981-01-31 | Fuji Photo Film Co Ltd | Image forming method |
| GB2082339B (en) | 1980-08-05 | 1985-06-12 | Horsell Graphic Ind Ltd | Lithographic printing plates and method for processing |
| US4529682A (en) * | 1981-06-22 | 1985-07-16 | Philip A. Hunt Chemical Corporation | Positive photoresist composition with cresol-formaldehyde novolak resins |
| JPS58203433A (ja) * | 1982-05-21 | 1983-11-26 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS58224351A (ja) * | 1982-06-23 | 1983-12-26 | Fuji Photo Film Co Ltd | 感光性印刷版 |
| US4609615A (en) * | 1983-03-31 | 1986-09-02 | Oki Electric Industry Co., Ltd. | Process for forming pattern with negative resist using quinone diazide compound |
| DE3325023A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
| US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
| US4693958A (en) * | 1985-01-28 | 1987-09-15 | Lehigh University | Lithographic plates and production process therefor |
| DE3541534A1 (de) * | 1985-11-25 | 1987-05-27 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch |
| ZA872295B (de) * | 1986-03-13 | 1987-09-22 | ||
| US4684599A (en) * | 1986-07-14 | 1987-08-04 | Eastman Kodak Company | Photoresist compositions containing quinone sensitizer |
| DE3716848A1 (de) * | 1987-05-20 | 1988-12-01 | Hoechst Ag | Verfahren zur bebilderung lichtempfindlichen materials |
| EP0304313A3 (de) * | 1987-08-21 | 1990-08-22 | Oki Electric Industry Company, Limited | Bilderzeugungsmaterial |
| JPH01201654A (ja) * | 1988-02-06 | 1989-08-14 | Nippon Oil Co Ltd | ポジ型フォトレジスト材料 |
| US4962147A (en) * | 1988-05-26 | 1990-10-09 | Hoechst Celanese Corporation | Process for the suspension polymerization of 4-acetoxystyrene and hydrolysis to 4-hydroxystyrene polymers |
| DE3820001A1 (de) * | 1988-06-11 | 1989-12-14 | Basf Ag | Optisches aufzeichnungsmedium |
| US4877718A (en) * | 1988-09-26 | 1989-10-31 | Rennsselaer Polytechnic Institute | Positive-working photosensitive polyimide operated by photo induced molecular weight changes |
| JP2547626B2 (ja) * | 1988-10-07 | 1996-10-23 | 富士写真フイルム株式会社 | モノマーの製造方法 |
| EP0366590B2 (de) * | 1988-10-28 | 2001-03-21 | International Business Machines Corporation | Positiv arbeitende hochempfindliche Photolack-Zusammensetzung |
| US5202221A (en) * | 1988-11-11 | 1993-04-13 | Fuji Photo Film Co., Ltd. | Light-sensitive composition |
| JP2571115B2 (ja) * | 1989-01-17 | 1997-01-16 | 富士写真フイルム株式会社 | 感光性組成物の増感方法及び増感された感光性組成物 |
| JP2871710B2 (ja) * | 1989-03-17 | 1999-03-17 | 株式会社きもと | 画像形成方法 |
| JPH02251962A (ja) * | 1989-03-27 | 1990-10-09 | Matsushita Electric Ind Co Ltd | 微細パターン形成材料およびパターン形成方法 |
| US5200298A (en) * | 1989-05-10 | 1993-04-06 | Fuji Photo Film Co., Ltd. | Method of forming images |
| EP0410606B1 (de) * | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Polysiloxane und positiv arbeitende Resistmasse |
| DE69032464T2 (de) * | 1989-10-19 | 1998-11-12 | Fujitsu Ltd | Verfahren zur Herstellung von Photolackmustern |
| GB9004337D0 (en) * | 1990-02-27 | 1990-04-25 | Minnesota Mining & Mfg | Preparation and use of dyes |
| DE4013575C2 (de) * | 1990-04-27 | 1994-08-11 | Basf Ag | Verfahren zur Herstellung negativer Reliefkopien |
| EP0455228B1 (de) * | 1990-05-02 | 1998-08-12 | Mitsubishi Chemical Corporation | Photolackzusammensetzung |
| JP2729850B2 (ja) * | 1990-05-15 | 1998-03-18 | 富士写真フイルム株式会社 | 画像形成層 |
| JP2639853B2 (ja) * | 1990-05-18 | 1997-08-13 | 富士写真フイルム株式会社 | 新規キノンジアジド化合物及びそれを含有する感光性組成物 |
| JP2645384B2 (ja) * | 1990-05-21 | 1997-08-25 | 日本ペイント株式会社 | ポジ型感光性樹脂組成物 |
| US5145763A (en) * | 1990-06-29 | 1992-09-08 | Ocg Microelectronic Materials, Inc. | Positive photoresist composition |
| US5085972A (en) * | 1990-11-26 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Alkoxyalkyl ester solubility inhibitors for phenolic resins |
| JPH04359906A (ja) * | 1991-06-07 | 1992-12-14 | Shin Etsu Chem Co Ltd | ポリ（パラ−ｔ−ブトキシカルボニルオキシスチレン）及びその製造方法 |
| CA2066895A1 (en) * | 1991-06-17 | 1992-12-18 | Thomas P. Klun | Aqueous developable imaging systems |
| US5258257A (en) * | 1991-09-23 | 1993-11-02 | Shipley Company Inc. | Radiation sensitive compositions comprising polymer having acid labile groups |
| US5437952A (en) * | 1992-03-06 | 1995-08-01 | Konica Corporation | Lithographic photosensitive printing plate comprising a photoconductor and a naphtho-quinone diazide sulfonic acid ester of a phenol resin |
| US5368977A (en) * | 1992-03-23 | 1994-11-29 | Nippon Oil Co. Ltd. | Positive type photosensitive quinone diazide phenolic resin composition |
| US5372917A (en) * | 1992-06-30 | 1994-12-13 | Kanzaki Paper Manufacturing Co., Ltd. | Recording material |
| US5286612A (en) * | 1992-10-23 | 1994-02-15 | Polaroid Corporation | Process for generation of free superacid and for imaging, and imaging medium for use therein |
| EP0608983B1 (de) * | 1993-01-25 | 1997-11-12 | AT&T Corp. | Ein Verfahren zum gesteuerten Entschützen von Polymeren und Verfahren zur Herstellung einer Vorrichtung welches diese zum Teil entschützten Polymere für Photoresiste benutzt |
| US5340699A (en) * | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
| DE4426820A1 (de) * | 1993-07-29 | 1995-02-02 | Fuji Photo Film Co Ltd | Bilderzeugungsmaterial und Bilderzeugungsverfahren |
| EP0672954B1 (de) * | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Strahlungsempfindliche Zusammensetzung, enthaltend ein Resolharz, ein Novolakharz, einen Infrarotabsorber und ein Triazin, und seine Verwendung in lithographischen Druckplatten |
| JP3317574B2 (ja) * | 1994-03-15 | 2002-08-26 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
| JP3461377B2 (ja) * | 1994-04-18 | 2003-10-27 | 富士写真フイルム株式会社 | 画像記録材料 |
| US5441850A (en) * | 1994-04-25 | 1995-08-15 | Polaroid Corporation | Imaging medium and process for producing an image |
| DE69525883T2 (de) * | 1994-07-04 | 2002-10-31 | Fuji Photo Film Co., Ltd. | Positiv-photoresistzusammensetzung |
| WO1996002021A1 (en) * | 1994-07-11 | 1996-01-25 | Konica Corporation | Original form for lithographic plate and process for preparing lithographic plate |
| US5466557A (en) * | 1994-08-29 | 1995-11-14 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates |
| EP0706899A1 (de) * | 1994-10-13 | 1996-04-17 | Agfa-Gevaert N.V. | Wärmeempfindliches Aufzeichnungselement |
| US5491046A (en) * | 1995-02-10 | 1996-02-13 | Eastman Kodak Company | Method of imaging a lithographic printing plate |
| US5658708A (en) * | 1995-02-17 | 1997-08-19 | Fuji Photo Film Co., Ltd. | Image recording material |
| JPH0962005A (ja) * | 1995-06-14 | 1997-03-07 | Fuji Photo Film Co Ltd | ネガ型感光性組成物 |
| US5641608A (en) * | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
| JPH09120157A (ja) * | 1995-10-25 | 1997-05-06 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
| US6132935A (en) * | 1995-12-19 | 2000-10-17 | Fuji Photo Film Co., Ltd. | Negative-working image recording material |
| JP3589365B2 (ja) * | 1996-02-02 | 2004-11-17 | 富士写真フイルム株式会社 | ポジ画像形成組成物 |
| IL122318A (en) * | 1996-04-23 | 2001-01-28 | Horsell Graphic Ind Ltd | Lithographic printing forms |
| EP0803771A1 (de) * | 1996-04-23 | 1997-10-29 | Agfa-Gevaert N.V. | Verfahren zur Herstellung einer Flachdruckplatte unter Verwendung eines Bildaufzeichnungsmaterials mit einer wärmeempfindlichen Maske |
| DE69608679D1 (de) * | 1996-07-19 | 2000-07-06 | Agfa Gevaert Nv | IR-Strahlungsempfindliches Bildaufzeichnungselement und Verfahren zur Herstellung von lithographischen Druckplatten mit diesem Element |
| JP3814961B2 (ja) * | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
| US5705309A (en) * | 1996-09-24 | 1998-01-06 | Eastman Kodak Company | Photosensitive composition and element containing polyazide and an infrared absorber in a photocrosslinkable binder |
| US5759742A (en) * | 1996-09-25 | 1998-06-02 | Eastman Kodak Company | Photosensitive element having integral thermally bleachable mask and method of use |
| US5705322A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Method of providing an image using a negative-working infrared photosensitive element |
| US5858626A (en) * | 1996-09-30 | 1999-01-12 | Kodak Polychrome Graphics | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| US5705308A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element |
| EP0839647B2 (de) * | 1996-10-29 | 2014-01-22 | Agfa Graphics N.V. | Verfahren zur Herstellung einer lithographischen Druckplatte mit verbesserten Druckfarbe-Aufnahme |
| DE69806986T2 (de) | 1997-03-11 | 2003-05-08 | Agfa-Gevaert, Mortsel | Verfahren zur Herstellung von positiv arbeitenden lithographischen Druckplatten |
| DE19712323A1 (de) | 1997-03-24 | 1998-10-01 | Agfa Gevaert Ag | Strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial für Offsetdruckplatten |
| JP3779444B2 (ja) * | 1997-07-28 | 2006-05-31 | 富士写真フイルム株式会社 | 赤外線レーザ用ポジ型感光性組成物 |
-
1997
- 1997-09-02 US US08/922,190 patent/US6060217A/en not_active Expired - Lifetime
-
1998
- 1998-08-14 WO PCT/US1998/016886 patent/WO1999011458A1/en not_active Ceased
- 1998-08-14 DE DE69818421T patent/DE69818421T2/de not_active Expired - Lifetime
- 1998-08-14 AT AT98939401T patent/ATE250497T1/de not_active IP Right Cessation
- 1998-08-14 EP EP98939401A patent/EP0939698B1/de not_active Expired - Lifetime
- 1998-08-14 ES ES98939401T patent/ES2206975T3/es not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0939698A1 (de) | 1999-09-08 |
| DE69818421D1 (de) | 2003-10-30 |
| EP0939698B1 (de) | 2003-09-24 |
| US6060217A (en) | 2000-05-09 |
| WO1999011458A1 (en) | 1999-03-11 |
| ES2206975T3 (es) | 2004-05-16 |
| DE69818421T2 (de) | 2004-07-08 |
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| Date | Code | Title | Description |
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| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |