JPH0263530U - - Google Patents

Info

Publication number
JPH0263530U
JPH0263530U JP14333788U JP14333788U JPH0263530U JP H0263530 U JPH0263530 U JP H0263530U JP 14333788 U JP14333788 U JP 14333788U JP 14333788 U JP14333788 U JP 14333788U JP H0263530 U JPH0263530 U JP H0263530U
Authority
JP
Japan
Prior art keywords
mask
deflection
amount
wafer
print gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14333788U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14333788U priority Critical patent/JPH0263530U/ja
Publication of JPH0263530U publication Critical patent/JPH0263530U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図は本考案に係る半導体製造装置の一実施
例を示す要部側断面図、第２図と第３図は従来の
半導体製造装置の一具体例を示す要部側断面図と
その動作時の側断面図である。 ２…吸着ステージ、３…半導体ウエーハ、４…
露光マスク、７…非接触距離検出器、Ａ，Ｂ，Ｃ
…複数の位置。

Claims (1)

  1. 【実用新案登録請求の範囲】 吸着ステージ上に載置した半導体ウエーハ上方
    に所定のプリントギヤツプを介して露光マスクを
    位置決め・配置し、上記ギヤツプ間を負圧吸引し
    て露光マスクをたわませ、半導体ウエーハに上記
    マスクを密着させて露光する半導体製造装置にお
    いて、 上記マスクのたわみ量を複数の位置で測定する
    非接触距離検出器と、上記検出器によつて測定さ
    れたマスクのたわみ量を設定値と比較し、上記プ
    リントギヤツプを可変して上記たわみ量を設定値
    にするプリントギヤツプ可変手段とを付設したこ
    とを特徴とする半導体製造装置。
JP14333788U 1988-10-31 1988-10-31 Pending JPH0263530U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14333788U JPH0263530U (ja) 1988-10-31 1988-10-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14333788U JPH0263530U (ja) 1988-10-31 1988-10-31

Publications (1)

Publication Number Publication Date
JPH0263530U true JPH0263530U (ja) 1990-05-11

Family

ID=31410068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14333788U Pending JPH0263530U (ja) 1988-10-31 1988-10-31

Country Status (1)

Country Link
JP (1) JPH0263530U (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006350192A (ja) * 2005-06-20 2006-12-28 Ono Sokki Co Ltd 露光機の整合装置及び露光機の整合方法
JP2013120789A (ja) * 2011-12-06 2013-06-17 National Institute Of Advanced Industrial & Technology 露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006350192A (ja) * 2005-06-20 2006-12-28 Ono Sokki Co Ltd 露光機の整合装置及び露光機の整合方法
JP2013120789A (ja) * 2011-12-06 2013-06-17 National Institute Of Advanced Industrial & Technology 露光装置

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