JPS5214366A - Process for production of semiconductor device - Google Patents

Process for production of semiconductor device

Info

Publication number
JPS5214366A
JPS5214366A JP50090293A JP9029375A JPS5214366A JP S5214366 A JPS5214366 A JP S5214366A JP 50090293 A JP50090293 A JP 50090293A JP 9029375 A JP9029375 A JP 9029375A JP S5214366 A JPS5214366 A JP S5214366A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
membrane
flattening
disconnection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50090293A
Other languages
Japanese (ja)
Other versions
JPS5625019B2 (en
Inventor
Takehisa Nitta
Takaaki Mori
Hiroyuki Kondo
Yorio Moriguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50090293A priority Critical patent/JPS5214366A/en
Publication of JPS5214366A publication Critical patent/JPS5214366A/en
Publication of JPS5625019B2 publication Critical patent/JPS5625019B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Element Separation (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To prevent the disconnection of the layer of Al wiring by flattening the oxidized membrane of the surface of the semiconductor substrate by the spread of viscous insulator membrane.
JP50090293A 1975-07-25 1975-07-25 Process for production of semiconductor device Granted JPS5214366A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50090293A JPS5214366A (en) 1975-07-25 1975-07-25 Process for production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50090293A JPS5214366A (en) 1975-07-25 1975-07-25 Process for production of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5214366A true JPS5214366A (en) 1977-02-03
JPS5625019B2 JPS5625019B2 (en) 1981-06-10

Family

ID=13994473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50090293A Granted JPS5214366A (en) 1975-07-25 1975-07-25 Process for production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5214366A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5897848A (en) * 1981-12-08 1983-06-10 Seiko Instr & Electronics Ltd Smoothing method for surface
JPS59175745A (en) * 1983-03-26 1984-10-04 Mitsubishi Electric Corp Manufacture of semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4883788A (en) * 1972-02-09 1973-11-08
JPS4933572A (en) * 1972-07-26 1974-03-28

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4883788A (en) * 1972-02-09 1973-11-08
JPS4933572A (en) * 1972-07-26 1974-03-28

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5897848A (en) * 1981-12-08 1983-06-10 Seiko Instr & Electronics Ltd Smoothing method for surface
JPS59175745A (en) * 1983-03-26 1984-10-04 Mitsubishi Electric Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS5625019B2 (en) 1981-06-10

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