JPS58138028A - フオトマスクの欠陥修正方法 - Google Patents

フオトマスクの欠陥修正方法

Info

Publication number
JPS58138028A
JPS58138028A JP57019581A JP1958182A JPS58138028A JP S58138028 A JPS58138028 A JP S58138028A JP 57019581 A JP57019581 A JP 57019581A JP 1958182 A JP1958182 A JP 1958182A JP S58138028 A JPS58138028 A JP S58138028A
Authority
JP
Japan
Prior art keywords
pattern
photomask
missing
film
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57019581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS634173B2 (fr
Inventor
Katsuro Mizukoshi
克郎 水越
Mikio Hongo
幹雄 本郷
Takeoki Miyauchi
宮内　建興
Masaaki Okunaka
正昭 奥中
Masao Mitani
正男 三谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57019581A priority Critical patent/JPS58138028A/ja
Publication of JPS58138028A publication Critical patent/JPS58138028A/ja
Publication of JPS634173B2 publication Critical patent/JPS634173B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57019581A 1982-02-12 1982-02-12 フオトマスクの欠陥修正方法 Granted JPS58138028A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57019581A JPS58138028A (ja) 1982-02-12 1982-02-12 フオトマスクの欠陥修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57019581A JPS58138028A (ja) 1982-02-12 1982-02-12 フオトマスクの欠陥修正方法

Publications (2)

Publication Number Publication Date
JPS58138028A true JPS58138028A (ja) 1983-08-16
JPS634173B2 JPS634173B2 (fr) 1988-01-27

Family

ID=12003226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57019581A Granted JPS58138028A (ja) 1982-02-12 1982-02-12 フオトマスクの欠陥修正方法

Country Status (1)

Country Link
JP (1) JPS58138028A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03181945A (ja) * 1989-12-12 1991-08-07 Mitsubishi Electric Corp マスクのパターン欠け欠陥の修正方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51139267A (en) * 1975-05-28 1976-12-01 Hitachi Ltd Photo-mask
JPS5579447A (en) * 1978-12-09 1980-06-14 Dainippon Printing Co Ltd Photomask substrate and photomask
JPS55161240A (en) * 1979-06-04 1980-12-15 Dainippon Printing Co Ltd Photomask
JPS5694350A (en) * 1979-12-28 1981-07-30 Hitachi Ltd Method for correcting white spot defect of photomask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51139267A (en) * 1975-05-28 1976-12-01 Hitachi Ltd Photo-mask
JPS5579447A (en) * 1978-12-09 1980-06-14 Dainippon Printing Co Ltd Photomask substrate and photomask
JPS55161240A (en) * 1979-06-04 1980-12-15 Dainippon Printing Co Ltd Photomask
JPS5694350A (en) * 1979-12-28 1981-07-30 Hitachi Ltd Method for correcting white spot defect of photomask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03181945A (ja) * 1989-12-12 1991-08-07 Mitsubishi Electric Corp マスクのパターン欠け欠陥の修正方法

Also Published As

Publication number Publication date
JPS634173B2 (fr) 1988-01-27

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