JPS588768Y2 - マグネトロン型カソ−ド装置 - Google Patents

マグネトロン型カソ−ド装置

Info

Publication number
JPS588768Y2
JPS588768Y2 JP1979132079U JP13207979U JPS588768Y2 JP S588768 Y2 JPS588768 Y2 JP S588768Y2 JP 1979132079 U JP1979132079 U JP 1979132079U JP 13207979 U JP13207979 U JP 13207979U JP S588768 Y2 JPS588768 Y2 JP S588768Y2
Authority
JP
Japan
Prior art keywords
target
type cathode
magnetron type
cathode device
holding portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1979132079U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5653770U (de
Inventor
藤岡俊昭
Original Assignee
日本真空技術株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本真空技術株式会社 filed Critical 日本真空技術株式会社
Priority to JP1979132079U priority Critical patent/JPS588768Y2/ja
Publication of JPS5653770U publication Critical patent/JPS5653770U/ja
Application granted granted Critical
Publication of JPS588768Y2 publication Critical patent/JPS588768Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1979132079U 1979-09-26 1979-09-26 マグネトロン型カソ−ド装置 Expired JPS588768Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1979132079U JPS588768Y2 (ja) 1979-09-26 1979-09-26 マグネトロン型カソ−ド装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979132079U JPS588768Y2 (ja) 1979-09-26 1979-09-26 マグネトロン型カソ−ド装置

Publications (2)

Publication Number Publication Date
JPS5653770U JPS5653770U (de) 1981-05-12
JPS588768Y2 true JPS588768Y2 (ja) 1983-02-17

Family

ID=29363711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979132079U Expired JPS588768Y2 (ja) 1979-09-26 1979-09-26 マグネトロン型カソ−ド装置

Country Status (1)

Country Link
JP (1) JPS588768Y2 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000004203A1 (fr) * 1998-07-14 2000-01-27 Japan Energy Corporation Cible de pulverisation cathodique et piece pour appareil de formation de couches minces
EP1332512A2 (de) * 2000-11-09 2003-08-06 Williams Advanced Materials Inc. Ionenstrahl-ablagerungs-targets mit verriegelnder grenzfläche und auswechselbarer einlage
JP2008001920A (ja) * 2006-06-20 2008-01-10 National Institute Of Advanced Industrial & Technology ターゲット保持装置およびターゲット保持方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607705B2 (ja) * 1981-12-03 1985-02-26 日本真空技術株式会社 スパツタリング装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS512682A (ja) * 1974-06-26 1976-01-10 Fujitsu Ltd Supatsutaringuhoho

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000004203A1 (fr) * 1998-07-14 2000-01-27 Japan Energy Corporation Cible de pulverisation cathodique et piece pour appareil de formation de couches minces
EP1332512A2 (de) * 2000-11-09 2003-08-06 Williams Advanced Materials Inc. Ionenstrahl-ablagerungs-targets mit verriegelnder grenzfläche und auswechselbarer einlage
JP2008001920A (ja) * 2006-06-20 2008-01-10 National Institute Of Advanced Industrial & Technology ターゲット保持装置およびターゲット保持方法

Also Published As

Publication number Publication date
JPS5653770U (de) 1981-05-12

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