ES2637113T3 - Procedimientos para preparar isoquinolinonas y formas sólidas de isoquinolinonas - Google Patents
Procedimientos para preparar isoquinolinonas y formas sólidas de isoquinolinonas Download PDFInfo
- Publication number
- ES2637113T3 ES2637113T3 ES12734039.6T ES12734039T ES2637113T3 ES 2637113 T3 ES2637113 T3 ES 2637113T3 ES 12734039 T ES12734039 T ES 12734039T ES 2637113 T3 ES2637113 T3 ES 2637113T3
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- Prior art keywords
- peak
- polymorph
- integral
- normalized
- dimethylaminoethyl
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- 238000000034 method Methods 0.000 title claims description 41
- 239000007787 solid Chemical group 0.000 title claims description 6
- VDBNYAPERZTOOF-UHFFFAOYSA-N isoquinolin-1(2H)-one Chemical group C1=CC=C2C(=O)NC=CC2=C1 VDBNYAPERZTOOF-UHFFFAOYSA-N 0.000 title description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 24
- 238000000634 powder X-ray diffraction Methods 0.000 claims abstract description 18
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 claims description 6
- 206010028980 Neoplasm Diseases 0.000 claims description 4
- 201000011510 cancer Diseases 0.000 claims description 3
- 208000035475 disorder Diseases 0.000 claims description 3
- 208000027866 inflammatory disease Diseases 0.000 claims description 3
- -1 2,2,2-trichloroethoxycarbonyl Chemical group 0.000 claims 39
- 239000002904 solvent Substances 0.000 claims 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims 10
- 239000002253 acid Substances 0.000 claims 7
- 239000000725 suspension Substances 0.000 claims 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N trifluoroacetic acid Substances OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims 6
- 239000008194 pharmaceutical composition Substances 0.000 claims 5
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 239000003153 chemical reaction reagent Substances 0.000 claims 4
- 239000007788 liquid Substances 0.000 claims 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims 2
- ZHGNHOOVYPHPNJ-UHFFFAOYSA-N Amigdalin Chemical compound FC(F)(F)C(=O)OCC1OC(OCC2OC(OC(C#N)C3=CC=CC=C3)C(OC(=O)C(F)(F)F)C(OC(=O)C(F)(F)F)C2OC(=O)C(F)(F)F)C(OC(=O)C(F)(F)F)C(OC(=O)C(F)(F)F)C1OC(=O)C(F)(F)F ZHGNHOOVYPHPNJ-UHFFFAOYSA-N 0.000 claims 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical group ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims 2
- 229920002472 Starch Polymers 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 2
- 125000004423 acyloxy group Chemical group 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 claims 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 2
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 claims 2
- 229940125782 compound 2 Drugs 0.000 claims 2
- 239000010949 copper Substances 0.000 claims 2
- 239000004148 curcumin Substances 0.000 claims 2
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical compound C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 claims 2
- 238000001914 filtration Methods 0.000 claims 2
- CETVQRFGPOGIQJ-UHFFFAOYSA-N lithium;hexane Chemical compound [Li+].CCCCC[CH2-] CETVQRFGPOGIQJ-UHFFFAOYSA-N 0.000 claims 2
- HQKMJHAJHXVSDF-UHFFFAOYSA-L magnesium stearate Chemical compound [Mg+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O HQKMJHAJHXVSDF-UHFFFAOYSA-L 0.000 claims 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 claims 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims 2
- 239000000546 pharmaceutical excipient Substances 0.000 claims 2
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 claims 2
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 claims 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims 2
- 150000003839 salts Chemical class 0.000 claims 2
- 239000000377 silicon dioxide Substances 0.000 claims 2
- 235000012239 silicon dioxide Nutrition 0.000 claims 2
- 239000012453 solvate Substances 0.000 claims 2
- 239000008107 starch Substances 0.000 claims 2
- 235000019698 starch Nutrition 0.000 claims 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 claims 2
- GUBGYTABKSRVRQ-UHFFFAOYSA-N 2-(hydroxymethyl)-6-[4,5,6-trihydroxy-2-(hydroxymethyl)oxan-3-yl]oxyoxane-3,4,5-triol Chemical compound OCC1OC(OC2C(O)C(O)C(O)OC2CO)C(O)C(O)C1O GUBGYTABKSRVRQ-UHFFFAOYSA-N 0.000 claims 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 1
- GUBGYTABKSRVRQ-XLOQQCSPSA-N Alpha-Lactose Chemical compound O[C@@H]1[C@@H](O)[C@@H](O)[C@@H](CO)O[C@H]1O[C@@H]1[C@@H](CO)O[C@H](O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-XLOQQCSPSA-N 0.000 claims 1
- 208000023275 Autoimmune disease Diseases 0.000 claims 1
- KZMGYPLQYOPHEL-UHFFFAOYSA-N Boron trifluoride etherate Chemical compound FB(F)F.CCOCC KZMGYPLQYOPHEL-UHFFFAOYSA-N 0.000 claims 1
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 claims 1
- FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 claims 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 claims 1
- 235000019739 Dicalciumphosphate Nutrition 0.000 claims 1
- 239000007818 Grignard reagent Substances 0.000 claims 1
- GUBGYTABKSRVRQ-QKKXKWKRSA-N Lactose Natural products OC[C@H]1O[C@@H](O[C@H]2[C@H](O)[C@@H](O)C(O)O[C@@H]2CO)[C@H](O)[C@@H](O)[C@H]1O GUBGYTABKSRVRQ-QKKXKWKRSA-N 0.000 claims 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims 1
- 229930195725 Mannitol Natural products 0.000 claims 1
- 229920000168 Microcrystalline cellulose Polymers 0.000 claims 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims 1
- 229910002651 NO3 Inorganic materials 0.000 claims 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 1
- 229910019142 PO4 Inorganic materials 0.000 claims 1
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- 235000021355 Stearic acid Nutrition 0.000 claims 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 claims 1
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- 241000656145 Thyrsites atun Species 0.000 claims 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 1
- WXZIKFXSSPSWSR-UHFFFAOYSA-N [Li]CCCCC Chemical compound [Li]CCCCC WXZIKFXSSPSWSR-UHFFFAOYSA-N 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
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- 125000003368 amide group Chemical group 0.000 claims 1
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- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
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- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims 1
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- BLHLJVCOVBYQQS-UHFFFAOYSA-N ethyllithium Chemical compound [Li]CC BLHLJVCOVBYQQS-UHFFFAOYSA-N 0.000 claims 1
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Abstract
Polimorfo de un compuesto de fórmula (I):**Fórmula** en el que dicho polimorfo es la "forma C" de polimorfo, que tiene los siguientes picos de XRPD característicos: 2θ >= 10,4º (+- 0,2º), 13,3º (+- 0,2º) y 24,3º (+- 0,2º).
Description
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DESCRIPCION
Procedimientos para preparar isoquinolinonas y formas solidas de isoquinolinonas Descripcion
La actividad de las celulas puede regularse mediante senales externas que estimulan o inhiben acontecimientos intracelulares. El proceso mediante el cual las senales estimuladoras o inhibidoras se transmiten al interior o dentro de una celula para provocar una respuesta intracelular se denomina transduccion de senales. A lo largo de las ultimas decadas, se han esclarecido las cascadas de los acontecimientos de transduccion de senales y se ha encontrado que desempenan un papel crucial en una variedad de respuestas biologicas. Se ha encontrado que los defectos en diversos componentes de las rutas de transduccion de senales son responsables de un gran numero de enfermedades, que incluyen numerosas formas de cancer, trastornos inflamatorios, trastornos metabolicos, enfermedades vasculares y neuronales (Gaestel et al. Current Medicinal Chemistry (2007) 14:2214-2234).
Las cinasas representan una clase de importantes moleculas de senalizacion. Las cinasas pueden clasificarse en general en protema cinasas y en lfpido cinasas, y ciertas cinasas presentan especificidades dobles. Las protema cinasas son enzimas que fosforilan a otras protemas y/o a sf mismas (es decir, autofosforilacion). Las protema cinasas pueden clasificarse en general en tres grupos principales basados en la utilizacion de sus sustratos: tirosina cinasas, que fosforilan de forma predominante sustratos en los residuos de tirosina (por ejemplo, erb2, receptor de PDGF, receptor de EGF, receptor de VEGF, src, abl, serina/treonina cinasas, que fosforilan de forma predominante sustratos en residuos de serina y/o treonina (por ejemplo, mTorCI, mTorC2, ATM, ATR, ADN-PK, Akt), y cinasas de especificidad doble, que fosforilan sustratos en residuos de tirosina, serina y/o treonina.
Las lfpido cinasas son enzimas que catalizan la fosforilacion de lfpidos. Estas enzimas, y los lfpidos fosforilados y moleculas organicas biologicamente activas procedentes de lfpidos resultantes, desempenan un papel en numerosos procesos fisiologicos diferentes, incluyendo la proliferacion, migracion, adhesion y diferenciacion celulares. Ciertas lfpido cinasas estan asociadas a la membrana y catalizan la fosforilacion de los lfpidos contenidos en o asociados a las membranas celulares. Los ejemplos de tales enzimas incluyen fosfoinosttido(s) cinasas (por ejemplo, PI3-cinasas, PI4-cinasas), diacilglicerol cinasas y esfingosina cinasas.
Las fosfoinosttido 3-cinasas (PI3K) constituyen una familia unica y altamente conservada de lfpido cinasas intracelulares que fosforilan el grupo 3'-OH en fosfatidilinositoles o fosfoinosftidos. La familia de PI3K comprende 15 cinasas con distintas especificidades de sustrato, patrones de expresion y modos de regulacion. Las PI3K de clase I (p110a, p110p, p110S y p110y) se activan normalmente mediante tirosina cinasas o receptores acoplados a protemas G para generar un producto lipfdico denominado PIP3, que se acopla a efectores posteriores tales como los de la ruta Akt/PDK1, mTOR, las cinasas de la familia Tec, y las GTPasas de la familia Rho. Las PI3K de clase II y III desempenan un papel en el trafico intracelular a traves de la smtesis de PI(3)P y PI(3,4)P2.
La ruta de senalizacion de las fosfoinosftido 3-cinasas (PI3K) es uno de los sistemas mas mutados en los canceres humanos. La senalizacion de PI3K tambien es un factor clave en muchas otras enfermedades de los seres humanos. La senalizacion PI3K esta implicada en numerosos estados patologicos incluyendo dermatitis alergica por contacto, artritis reumatoide, artrosis, enfermedades inflamatorias intestinales, trastorno pulmonar obstructivo cronico, psoriasis, esclerosis multiple, asma, trastornos relacionados con complicaciones de la diabetes y complicaciones inflamatorias del sistema cardiovascular, tales como smdrome coronario agudo.
Se han generado muchos inhibidores de PI3K. Aunque tales compuestos a menudo se evaluan inicialmente para determinar su actividad cuando estan disueltos en disolucion, algunas caractensticas de estado solido tales como polimorfismo desempenan un papel importante. Las formas polimorficas de un principio activo, tal como un inhibidor de PI3K, pueden tener diferentes propiedades qrnmicas y ffsicas, incluyendo cristalinidad, punto de fusion, reactividad qrnmica, solubilidad, velocidad de disolucion, propiedades opticas y mecanicas, presion de vapor y densidad. Estas propiedades pueden tener un efecto directo sobre la capacidad para procesar o fabricar un principio activo y el producto terminado. Ademas, el polimorfismo es a menudo un factor en la revision reguladora de la “igualdad” de productos terminados de diversos fabricantes. Por ejemplo, se ha evaluado el polimorfismo en compuestos tales como warfarina sodica, famotidina y ranitidina. El polimorfismo puede afectar a la calidad, seguridad y/o eficacia de un producto terminado, tal como un inhibidor de cinasa. Por tanto, la investigacion dirigida a polimorfos de inhibidores de PI3K y a procedimientos para preparar polimorfos de inhibidores de PI3K representa un campo de investigacion significativamente util en el desarrollo de principios activos farmaceuticos (API).
Ademas, se han usado inhibidores de PI3K para tratar diversas enfermedades y trastornos en seres humanos (por ejemplo, en ensayos clmicos). Para la produccion de un principio activo destinado para su uso en seres humanos, son aplicables las Buenas Practicas de Fabricacion (BPF) actuales. Es necesario implementar procedimientos que puedan controlar los niveles de impurezas y garantizar que se producen productos de API que cumplen sistematicamente sus especificaciones predeterminadas. Por tanto, existe una necesidad importante de un procedimiento para preparar inhibidores de PI3K adecuados para uso en seres humanos, particularmente a escala comercial, es decir entre otros, seguros, ampliables a escala, eficaces, economicamente viables y/o que tengan
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otras propiedades deseables. Entre otras entidades, se dan a conocer en el presente documento las formas polimorficas de inhibidores de PI3K que abordan estas necesidades y proporcionan ventajas a modo de ejemplo.
Sumario
En una realizacion, se proporciona en el presente documento una forma polimorfica de un compuesto de formula (I):
en la que dicha forma polimorfica es la “forma C” de polimorfo, que tiene los siguientes picos de XRPD caractensticos: 20 = 10,4° (+ 0,2°), 13,3° (+ 0,2°) y 24,3° (+ 0,2°).
En una realizacion, se proporciona en el presente documento un metodo de preparacion de un polimorfo de la forma C de un compuesto de formula (I):
En una realizacion, el metodo comprende una cualquiera, dos, tres, cuatro, cinco, seis, siete u ocho o mas de las siguientes etapas:
O
Claims (109)
- 5101520253035401. Polimorfo de un compuesto de formula (I):
imagen1 en el que dicho polimorfo es la “forma C” de polimorfo, que tiene los siguientes picos de XRPD caractensticos: 20 = 10,4° (+ 0,2°), 13,3° (+ 0,2°) y 24,3° (+ 0,2°). - 2. Polimorfo segun la reivindicacion 1, en el que dicho polimorfo comprende ademas al menos un pico de XRPD caractenstico seleccionado de 20 = 6,6° (+ 0,2°) y 12,5° (+ 0,2°).
- 3. Polimorfo segun la reivindicacion 1, en el que dicho polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 6,6° (+ 0,2°), 10,4° (+ 0,2°), 12,5° (+ 0,2°), 13,3° (+ 0,2°) y 24,3° (+ 0,2°) en combinacion con al menos un pico de XRPD seleccionado de 20 = 8,8° (+ 0,2°), 9,9° (+ 0,2°), 13,4° (+ 0,2°), 15,5° (+ 0,2°), 16,9° (+ 0,2°), 19,8° (+ 0,2°), 21,3° (+ 0,2°), 23,6° (+ 0,2°), 25,3° (+ 0,2°) y 27,9° (+ 0,2°).
- 4. Polimorfo segun la reivindicacion 1, en el que dicho polimorfo tiene sustancialmente todos los picos en su espectro de XRPD tal como se muestra en la figura 3.
- 5. Polimorfo segun la reivindicacion 1, en el que dicho polimorfo tiene un pico endotermico aaproximadamente 203°C.
- 6. Polimorfo segun la reivindicacion 1, en el que dicho polimorfo tiene un pico endotermico aaproximadamente 206°C o aproximadamente 208°C.
- 7. Polimorfo segun la reivindicacion 1, en el que dicho polimorfo tiene un pico endotermico en el intervalo de aproximadamente 203°C a aproximadamente 208°C, y al menos un pico seleccionado de un pico exotermico en el intervalo de aproximadamente 251°C a aproximadamente 254°C y un pico endotermico en el intervalo de aproximadamente 281°C a aproximadamente 283°C.
- 8. Polimorfo segun la reivindicacion 1, en el que dicho polimorfo tiene un pico endotermico aaproximadamente 208°C, un pico exotermico a aproximadamente 254°C y un pico endotermico a aproximadamente 283°C.
- 9. Polimorfo segun la reivindicacion 1, en el que el polimorfo de la forma C es un hidrato con canales.
- 10. Metodo de preparacion de un polimorfo de la forma C de un compuesto de formula (I) segun la reivindicacion 1:
imagen2 51015202530354045en el que el metodo comprende:(i) exponer una composicion que comprende uno o mas polimorfos distintos a la forma C seleccionados de la forma A, la forma B, la forma D, la forma E, la forma F, la forma G, la forma H, la forma I, la forma J y una forma amorfa de un compuesto de formula (I) o una sal, un solvato o hidrato del mismo a condiciones no anhidras durante un periodo de tiempo suficiente para convertir al menos aproximadamente el 50% de la cantidad total de polimorfo(s) distinto(s) a la forma C en la forma C de un compuesto de formula (I); y(ii) recuperar dicho polimorfo de la forma C; en el que:la forma A de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 9,6° (+ 0,2°), 12,2° (+ 0,2°) y 18,3° (+ 0,2°);la forma B de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 7,9° (+ 0,2°), 13,4° (+ 0,2°) y 23,4° (+ 0,2°);la forma D de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 11,4° (+ 0,2°), 17,4° (+ 0,2°) y 22,9° (+ 0,2°);la forma E de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 6,7° (+ 0,2°), 9,3° (+ 0,2°) y 24,4° (+ 0,2°);la forma F de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 9,6° (+ 0,2°), 17,3° (+ 0,2°) y 24,6° (+ 0,2°);la forma G de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 6,7° (= 0,2°), 9,5° (+ 0,2°) y 19,0° (+ 0,2°);la forma H de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 8,9° (+ 0,2°), 9,2° (+ 0,2°) y 14,1° (60,2°);la forma I de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 9,7° (+ 0,2°), 19,3° (+ 0,2°) y 24,5° (+ 0,2°); yla forma J de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 9,1° (+ 0,2°), 17,3° (+ 0,2°) y 18,3° (+ 0,2°).Metodo de preparacion de un polimorfo de la forma C de un compuesto de formula (I) segun la reivindicacion 1:imagen3 en el que el metodo comprende: i) combinar un compuesto de formula (Ia):510152025303540imagen4 en la que:PG2 es un grupo protector seleccionado de metilsulfonilo, metilsulfonilo sustituido, bencenosulfonilo, bencenosulfonilo sustituido, benciloxicarbonilo, benciloxicarbonilo sustituido, 2,2,2-tricloroetoxicarbonilo, 2- trimetilsililetoxicarbonilo, t-butoxicarbonilo, 1-adamantiloxicarbonilo, 2-adamantiloxicarbonilo, alquilo, alquilo sustituido, t-butildimetilsililo, triisopropilsililo, alilo, bencilo, bencilo sustituido, hidroximetilo, metoximetilo, dietoximetilo, (2-cloroetoxi)metilo, t-butoximetilo, t-butildimetilsiloximetilo, pivaloiloximetilo, benciloximetilo, dimetilaminometilo, 2-tetrahidropiranilo, alcoximetilo sustituido y ariloximetilo sustituido, yen donde los sustituyentes se seleccionan de alquilo, heteroalquilo, alquenilo, alquinilo, cicloalquilo, heterociclilo, arilo, arilalquilo, heteroarilo, heteroarilalquilo, alcoxilo, cicloalcoxilo, heterocicliloxilo, ariloxilo, heteroariloxilo, amido, amino, acilo, aciloxilo, alcoxicarbonilo, ester, eter, tio, sulfinilo, sulfonilo, sulfonamido, halo, ciano, hidroxilo, nitro, fosfato, urea, carbamato y carbonato; con uno o mas reactivos para eliminar el grupo protector PG2 para formar el compuesto de formula (I); yii) recuperar el polimorfo de la forma C del compuesto de formula (I);en el que al menos una de las etapas i) y ii) se produce en condiciones no anhidras.Metodo de preparacion de un polimorfo de la forma C de un compuesto de formula (I) segun la reivindicacion 1:imagen5 en el que el metodo comprende:(i) preparar una primera suspension espesa de un polimorfo de la forma C en diclorometano;(ii) recuperar los solidos en la primera suspension espesa mediante filtracion;(iii) preparar una segunda suspension espesa de los solidos recuperados en la etapa ii) en agua o disolvente que contiene agua; y(iv) recuperar los solidos en la segunda suspension espesa mediante filtracion para dar el polimorfo de la forma C.Metodo de preparacion de un polimorfo de la forma C de un compuesto de formula (I) segun lareivindicacion 1:510 - 14.15 15.
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- 22.
- 23.50
imagen6 en el que el metodo comprende poner el polimorfo de la forma A de un compuesto de formula (I) en agua o un sistema de disolventes que contiene agua;en el que la forma A de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 9,6° (+ 0,2°), 12,2° (+ 0,2°) y 18,3° (+ 0,2°).Metodo segun la reivindicacion 10 o la reivindicacion 11, en el que las condiciones no anhidras incluyen agua lfquida.Metodo segun la reivindicacion 14, en el que las condiciones no anhidras incluyen un disolvente miscible en agua y sistema de disolventes con agua lfquida.Metodo segun la reivindicacion 14 o la reivindicacion 15, en el que esta presente el agua lfquida en una cantidad seleccionada de aproximadamente el 1%, aproximadamente el 5%, aproximadamente el 10%, aproximadamente el 15%, aproximadamente el 20%, aproximadamente el 25%, aproximadamente el 30%,aproximadamente el 35%, aproximadamente el 40%, aproximadamente el 45%, aproximadamente el 50%,aproximadamente el 55%, aproximadamente el 60%, aproximadamente el 65%, aproximadamente el 70%,aproximadamente el 75%, aproximadamente el 80%, aproximadamente el 85%, aproximadamente el 90%,aproximadamente el 95% y aproximadamente el 100% en volumen del sistema de disolventes.Metodo segun la reivindicacion 14 o la reivindicacion 15, en el que esta presente dicha agua lfquida en una cantidad de entre aproximadamente el 85% y aproximadamente el 95% en volumen del sistema de disolventes.Metodo segun la reivindicacion 10, en el que el uno o mas polimorfos distintos a la forma C comprenden al menos aproximadamente el 50% en peso de la forma A de polimorfo o comprenden una forma amorfa;en el que la forma A de polimorfo tiene los siguientes picos de XRPD caractensticos: 20 = 9,6° (+ 0,2°), 12,2° (+ 0,2°) y 18,3° (+ 0,2°).Metodo segun la reivindicacion 11, en el que la etapa (ii) implica cristalizar en un sistema de mono o multidisolvente, en el que cristalizar implica anadir un antidisolvente o bien con o bien sin una etapa de enfriamiento para provocar la precipitacion de la forma C.Metodo segun la reivindicacion 19, en el que las condiciones de cristalizacion son no anhidras.Metodo segun la reivindicacion 11, en el que el uno o mas reactivos para eliminar el grupo protector PG2 se seleccionan de acidos, bases de carbonato, bases de hidroxido, bases de litio, oxidantes, condiciones de hidrogenacion, TBAF y BF3-Et2O.Metodo segun la reivindicacion 21, en el que el reactivo para eliminar el grupo protector PG2 es un acido y PG2 es 2-tetrahidropiranilo.Metodo segun la reivindicacion 22, en el que el acido es HCl, HBr, TFA, acido perclorico, acido sulfurico, acido mtrico o acido fosforico. - 24. Metodo segun la reivindicacion 23, en el que el acido es HCl.
- 25. Metodo segun la reivindicacion 13, en el que el sistema de disolventes comprende agua y 2-propanol. 55
- 26. Metodo segun la reivindicacion 13, en el que la forma A de polimorfo se pone en agua o un sistema de disolventes que contiene agua para formar una suspension espesa durante aproximadamente 18-24 horas.
- 27. Metodo segun la reivindicacion 13, en el que la forma A se pone en agua o un sistema de disolventes que5 contiene agua para formar una suspension espesa durante de menos de aproximadamente una hora aaproximadamente 24 horas.
- 28. Metodo segun la reivindicacion 13, en el que la forma A de polimorfo se prepara volviendo a formar una suspension espesa de uno o mas polimorfo(s) distinto(s) a la forma A en un disolvente anhidro.10
- 29. Metodo segun la reivindicacion 28, en el que el disolvente anhidro se selecciona de cloroformo, diclorometano, alcohol isopropflico, etanol o una mezcla de los mismos.
- 30. Metodo segun la reivindicacion 11, en el que el compuesto de formula (la) se prepara combinando el15 compuesto 9 de formula:
imagen7 20con un compuesto de cloropurina protegido de formula:imagen8 en presencia de Et3N en un disolvente alcoholico seleccionado de MeOH, EtOH, PrOH e iPrOH.25 31. Metodo segun la reivindicacion 11, la reivindicacion 21 o la reivindicacion 30, en el que el uno o masreactivos para eliminar el grupo protector PG2 se seleccionan de HCl, HBr, TFA, Na2CO3 y K2CO3, NaOH, KOH, metil-litio, etil-litio, propil-litio, n-butil-litio, n-pentil-litio, n-hexil-litio, nitrato cerico amonico, ciclohexadieno/negro de Pd, H/Pd sobre carbono, TBAF y BF3'Et2O.30 32. Metodo segun la reivindicacion 30, en el que PG2 es 2-tetrahidropiranilo. - 33. Metodo segun la reivindicacion 30, en el que el compuesto 9 se prepara mediante la conversion de un compuesto 8 de formula:35
imagen9 en presencia de un acido seleccionado de acido trifluoroacetico y acido metanosulfonico en un disolvente seleccionado de metanol, alcohol isopropflico, anisol, y THF, o una mezcla de los mismos.40 34. Metodo segun la reivindicacion 33, en el que el acido es acido trifluoroacetico.10Metodo segun la reivindicacion 33 o la reivindicacion 34, en el que el compuesto 8 se prepara combinando el compuesto 7 de formula:imagen10 con n-hexil-litio, y anadiendo el compuesto 2 de formula:imagen11 en el que el compuesto 2 se combina previamente con reactivo de Grignard de isopropilo. - 36. Composicion farmaceutica que comprende un polimorfo de la forma C segun una cualquiera de las reivindicaciones 1 a 9, y uno o mas excipientes farmaceuticamente aceptables.15
- 37. Composicion farmaceutica segun la reivindicacion 36, en el que el uno o mas excipientes farmaceuticamente aceptables se seleccionan de celulosa microcristalina silicificada, lactosa, manitol, almidon, sorbitol, sacarosa, fosfato de dicalcio, celulosa microcristalina, crospovidona, croscarmelosa sodica y glicolato sodico de almidon, dioxido de silicio, dioxido de silicio, silicato de magnesio, talco,20 estearato de magnesio, estearil-fumarato de sodio, acido estearico, laurilsulfato de sodio, dodecilsulfato desodio, Tween® 80 y Lutrol®.
- 38. Composicion farmaceutica segun la reivindicacion 36 o la reivindicacion 37, que comprende ademas una forma amorfa de un compuesto de formula (I).25
- 39. Composicion farmaceutica segun la reivindicacion 36, la reivindicacion 37 o la reivindicacion 38, que comprende ademas al menos un polimorfo distinto de la forma C seleccionado de la forma A, la forma B, la forma D, la forma E, la forma F, la forma G, la forma H, la forma I, la forma J y una forma amorfa de un compuesto de formula (I) o una sal, un solvato o hidrato del mismo.30
- 40. Composicion farmaceutica segun la reivindicacion 39, que comprende polimorfo de la forma C y la forma A de polimorfo en una razon forma C:forma A mayor de aproximadamente 9:1.
- 41.35Polimorfo segun una cualquiera de las reivindicaciones 1 a 9, para su uso en un metodo de tratamiento de un trastorno mediado por Pl3K.
- 42. Polimorfo segun la reivindicacion 41, en el que el trastorno es cancer, una enfermedad inflamatoria o una enfermedad autoinmunitaria40 43.Polimorfo segun una cualquiera de las reivindicaciones 1 a 9, para su uso en un metodo de tratamiento de un cancer.Cuentas
imagen12 Fig. 1Cuentasimagen13 Fig. 2Cuentasimagen14 Fig. 3Cuentasimagen15 Fig. 4Cuentasimagen16 Fig. 5Cuentasimagen17 Fig. 6Cuentasimagen18 Posicion [°2 Theta] (Cobre (Cu)) Forma G de polimorfoFig. 7Cuentasimagen19 Fig. 8Cuentasimagen20 Fig. 9Cuentasimagen21 Fig. 10Intensidad (CPS)imagen22 imagen23 mW--2r-3-j'-4- - -7.32 mIntegralnormalizado -1.02 Jq A-1
- 277.77 °CImcio
- 280.23 °CPico10
- -340.80 mJIntegralnormalizado -47.57 JqA-1
- 232.22 °CInicio
- 238.88 °CPico2-Forma AFig. 12
imagen24 imagen25 InicioForma CFig. 14 - 253.44 °CPico extrapolmWValor de pico 0.58 mW
- 253.70 °CPicoPico extrapol. 208.44 CValor de pico -4.26 mW
- 207.78Pico10-Pico extrapol. 283.57 CValor de pico -13.22 mW
- 283.05Pico4-
imagen26 -6,62 mIntegralnormalizado -1.71 JgM - 281.48 CImcio
- 282.88 °CPico12-
- -290.13 mJIntegral-14-normalizado -75.05 JgA-1
- 257.9Imcio16-
- 260.40Pico-1840 60 80 100 120 140 160 180 200 220 240 260 280 300 320 340°CForma DFig. 15
imagen27 MCL-E-100(1) DSC, 09.04.2010 12:32:40mWHMCL-E-100(1) DSC, 3.5530 mgIntegral - 21.14 mJMetodo: 30-350/ 0normalizado
- 5.95 JgA-1
- 30.0-350.0
- 10.00 C/minImcio
- 264.85 °CPico
- 266.67mJ
- 48.6Integral
- 13.68 JgAnormalizado- 0.40 mJIntegral
- 107.66 °Cnicio
- -2.93 JgA-1normalizado37 X31Pico
- 257.74nicio
- 320.99 mJIntegral
- 262.90-Piconormalizado -90.34 JgA-1Inicio
- 281.10 CPico
- 282.07 C15-2040 60 80 100 120 140 160 180 200 220 240 260 280 300 320 340XForma EFig. 16
imagen28 - 8.95 mJIntegralnormalizado 20.41 JgA
- 252.25Imcio
- 266.36 °CPico3-
- 115.92 mJIntegralnormalizado -124.78 JgA-1
- 68.79 °CImcio
- 181.19 CPico
- 15.37 mJ
- -49.12 mIntegralIntegral16,54Jgfnormalizado -51.80 Jq -1normalizadoImcio
- 280.84 5C
- 258.59 SCImcio28225’CPico
- 260.04 °C40 60 80 100 120 140 160 180 200 220 240 260 280 300 °CForma FFig. 17
imagen29 - -210.15 mJIntegralnomnalizado -133.60 JgA-1
- 147.17 °CInicio
- 161.66Pico
- -107.12 mJIntegralnormalizado -58.10 JgA-1
- 278.68 °CInicio
- 281.18 °CPicoForma GFig. 18Integral
- 85.40 mJnormalizado 54.29 JgA-1Inicio
- 233.18 CPico
- 241.45 °C
imagen30 - -36.94 mJIntegralnormalizado -30.78 JgA-1
- 96. 3Imcio
- 27.92Pico
- 0.44 mIntegralnormalizado -8.70 JgAImcio28C.30 CPico
- 281.94 C
- -79.26 mJIntegralnormalizado -66.05 Jg A-1
- 253.86 °CImcio6-
- 258.0 °CPicoForma HFig. 19
imagen31 3-Integral -5.02 mJ4- - 205.21 °CInicio
- 208.01 °CPico5-Integral -62.50 mJInicio 258.45 °CPico 262.67 °CFormaFigia. 20
imagen32 2- - -20.45 mIntegralJgMnormalizado -26.
- 2.91 mJIntegralImcio
- 98.41normalizado -3.72 JgA-1
- 121.26 °CPico
- 72.80 °Cnicio
- 184.57 °CPico
- -0.46 mJIntegralnormalizado -0.59 Jg A-4-Integral
- 47.16 mJImcio
- 280.70normalizado -60.23 JgAPico
- 282.33Imcio
- 254.98 TPico
- 258.75Forma JFig. 21
imagen33 10020140160ISO200220I GA de formaFigIntegralnormaliiado9-imcioPico10- 748,00 mJIntegral-8737 JgMnormal izadoInitio - 238.29Pico
- 336.8512-DSC de forma A
imagen34 Initio 240j&7"C3-Integralnorma izado4-InicioPicoIntegralnormalizadoInicioIntegralPicanormalizadoInicio8-PicoDSC de forma CmWPico extrapol. 251 S3 C120 mWValor de picOnomnalizado -1.07wgM-2Inicio 193.07 C25 ,32VC4-Picd extrapol. - 204.74 tvalor de pico
- 6.33 mWnormalizadD-ZllWgA-1
- 205.350Pico12-Pico extrapol. 283.53 XValor depioo -15.71 mWH-narmalizado -5.24 Wq^283,40 CPico16-DSC do forma CFig. 23
imagen35 mwPico extra pol10-Valor de picanormalizadoPicoPico extrapolValor de piconormalizadoPicoPico exlrapolPico extrapolvalor de picoValor de piconormalizadoPiconormalrzadoPicoDSC de forma FmW.7-1.6 -1.5-1.4-1.3-1.2-40 60 80 100 120 140 160 180 200 220 PCTGA de forma FFig. 24169imagen36 n-BuOHAcetonaMEK DisolventeO; THF^ hContraion- ro i
- ■l
- 3 & i
- 3. 3' o D Ei
- fp ex
- 3 c
- CU 3 £
- if c
- Q W Cl ffl
- & □
- C a- Z
- s
- 3 L
- 8
. DMFhFig.25imagen37 imagen38 t-OEftfimagen39 2000 1500Nunnei'os de onda (cm-1)Fig. 271000800imagen40 imagen41 Fig. 29imagen42 % disuello % disueltoimagen43 Formula 11Leapsulas.dej QPrngimagen44 RgT31
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